Abstract: An onium salt compound consisting of a sulfonate anion having the structure that a polymerizable unsaturated bond is linked to an iodized aromatic group via a carbon chain of two or more carbon atoms and a sulfonium or iodonium cation is provided. A resist composition comprising a polymer comprising repeat units derived from the onium salt has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Abstract: Provided are: a resist material and patterning process having sensitivity, resolution, and dissolution contrast exceeding those of conventional positive-type resist materials, having reduced edge roughness and size variation, and having a good pattern shape after exposure. A resist material, including: (Ia) a polymer having a repeating unit (A) having a hydroxy group or a carboxy group; (II) a crosslinker having a structure represented by the following formula (1); (III) a thermal acid generator having a structure represented by the following formula (2); (IV) an organic solvent; and (V) a component to be decomposed by irradiation of active ray or radiation to generate an acid.