Patents by Inventor Tomonori FUTAI

Tomonori FUTAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist composition, resist pattern-forming method, and resist solvent
    Patent number: 9146466
    Abstract: A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: September 29, 2015
    Assignee: JSR CORPORATION
    Inventors: Yusuke Asano, Shin-ichi Nakamura, Tomonori Futai
  • RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT
    Publication number: 20140302438
    Abstract: A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.
    Type: Application
    Filed: April 8, 2014
    Publication date: October 9, 2014
    Applicant: JSR CORPORATION
    Inventors: Yusuke ASANO, Shin-ichi NAKAMURA, Tomonori FUTAI