Abstract: A component for a film formation apparatus or an etching apparatus used for manufacturing semiconductors, the component including a disk-shaped or ring-shaped SiC film having an outer diameter of 300 mm or more and a thickness of 3 mm or more. The component does not include an interface extending perpendicularly to a thickness direction of the SiC film on an exposed side surface of the SiC film.

Abstract: A method for producing a high silicate glass substrate, includes: (1) obtaining a glass precursor containing, as represented by mol % based on oxides, 60% to 75% of SiO2, 0% to 15% of Al2O3, 15% to 30% of B2O3, 0% to 3% of P2O5, and 1% to 10% in total of at least one selected from R2O and R?O; (2) applying first heat treatment to the glass precursor to cause phase separation so as to obtain a phase-separated glass; (3) applying acid treatment to the phase-separated glass to make the phase-separated glass porous so as to obtain a porous glass; (4) drying the porous glass so that a rate of change in mass reaches 10% to 50%; and (5) applying second heat treatment to the porous glass to sinter the porous glass so as to obtain a high silicate glass substrate.

Abstract: The present invention relates to a crystallized glass including a crystalline phase consisting of Ba—Si—O, in which the crystallized glass includes Li, and crystallinity of Li-based crystals contained in the crystalline phase is 20% or lower as represented by weight %, a high-frequency substrate including the crystallized glass, and a manufacturing method for a crystallized glass including a crystalline phase consisting of Ba—Si—O, the method including: obtaining an amorphous glass by melt-shaping a material containing BaO and SiO2; and crystallizing the amorphous glass by holding the amorphous glass at a treatment temperature of 600° C. or higher and lower than 1,000° C.

Abstract: A glass plate has a dielectric dissipation factor at 10 GHz of tan ?A and a glass transition temperature of Tg° C. The glass plate satisfies (tan ?100?tan ?A)?0.0004, where tan ?100 is a dielectric dissipation factor of the glass plate at 10 GHz after having been heated to (Tg+50)° C. and then cooled to (Tg?150)° C. at 100° C./min.

Abstract: A cross-linked rubber product is obtained by cross-linking an acrylic elastomer composition containing an acrylic elastomer obtained by copolymerization of an acrylate and a cross-linking site monomer. The molar fraction of an oxygen atom (a) in the acrylic elastomer is 11.3 mol % or less, the molar fraction of a nitrogen atom (b) in the acrylic elastomer is 0.5 mol % or less, and a volume change is from ?3 to 6% when the cross-linked rubber product is dipped in distilled water at 80° C. for 200 hours.

Abstract: A cross-linked rubber product is obtained by cross-linking an acrylic elastomer composition containing an acrylic elastomer obtained by copolymerization of an acrylate and a cross-linking site monomer. The molar fraction of an oxygen atom (a) in the acrylic elastomer is 11.3 mol % or less, the molar fraction of a nitrogen atom (b) in the acrylic elastomer is 0.5 mol % or less, and a volume change is from ?3 to 6% when the cross-linked rubber product is dipped in distilled water at 80° C. for 200 hours.

Abstract: An acrylic rubber contains (a) methyl methacrylate units, (b) ethyl acrylate units, (c) n-butyl acrylate units, (d) 2-methoxyethyl acrylate units, and (e) cross-linking site monomer units, in which the acrylic rubber contains 10 to 20% by weight of (a) the methyl methacrylate units, 15% by weight or less of (b) the ethyl acrylate units, 60 to 80% by weight of (c) the n-butyl acrylate units, 10 to 30% by weight of (d) the 2-methoxyethyl acrylate units, and 0.5 to 5% by weight of (e) the cross-linking site monomer units.

Abstract: An acrylic rubber contains (a) methyl methacrylate units, (b) ethyl acrylate units, (c) n-butyl acrylate units, (d) 2-methoxyethyl acrylate units, and (e) cross-linking site monomer units, in which the acrylic rubber contains 10 to 20% by weight of (a) the methyl methacrylate units, 15% by weight or less of (b) the ethyl acrylate units, 60 to 80% by weight of (c) the n-butyl acrylate units, 10 to 30% by weight of (d) the 2-methoxyethyl acrylate units, and 0.5 to 5% by weight of (e) the cross-linking site monomer units.

Abstract: The present invention relates to an imprint mold containing a transfer surface and a concave-convex pattern and an imprint method using the imprint mold, in which the concave-convex pattern contains at least one groove formed on the transfer surface, the groove has a side wall part and a bottom wall part, and an angle between the side wall part and the transfer surface is larger than 90° and 96° or smaller.

Abstract: A condensed heterocyclic compound which is shown by the following formula (I) and a composition containing an (a) organic material and (b) at least one type of the condensed heterocyclic compound are provided. (Y indicates a chemical single bond, —S(?O)—, or —SO2—. Ra and Rb indicate substitutable C1 to C30 organic groups. Za and Zb indicate chemical single bonds or —SO2—. X1 and X2 indicate hydrogen atoms etc. n and m respectively independently indicate integers of 0 to 2, where one of n and m is not 0).

Abstract: A condensed heterocyclic compound which is shown by the following formula (I) and a composition containing an (a) organic material and (b) at least one type of the condensed heterocyclic compound are provided. (Y indicates a chemical single bond, —S(?O)—, or —SO2—. Ra and Rb indicate substitutable C1 to C30 organic groups. Za and Zb indicate chemical single bonds or —SO2—. X1 and X2 indicate hydrogen atoms etc. n and m respectively independently indicate integers of 0 to 2, where one of n and m is not 0).

Abstract: There are provided a novel diarylamine compound represented by the following formula (I), (II) or (III), which has at least one signal attributable to the hydrogen of the N—H moiety at 8.30 ppm to 9.00 ppm when a deuterated dimethyl sulfoxide solution of the diarylamine compound is analyzed by 1H-NMR; and an aging inhibitor, a polymer composition, a crosslinked rubber product and a molded article thereof, and a method of producing a diarylamine compound. In the formulas, A1 to A6 each represent an aromatic group which may have a substituent; A represents an aromatic group or a cyclic aliphatic group, which may both have a substituent; L represents 1 or 2; and n represents 0 or 1.

Abstract: The present invention relates to an optical member including a TiO2-containing silica glass having: a TiO2 concentration of from 3 to 10% by mass; a Ti3+ concentration of 100 wt ppm or less; a thermal expansion coefficient at from 0 to 100° C., CTE0-100, of 0±150 ppb/° C.; and an internal transmittance in the wavelength range of 400 to 700 nm per a thickness of 1 mm, T400-700, of 80% or more, in which the optical member has a ratio of variation of Ti3+ concentration to an average value of the Ti3+ concentration, ?Ti3+/Ti3+, on an optical use surface, is 0.2 or less.

Abstract: An acrylic rubber composition which contains, with respect to 100 parts by weight of acrylic rubber, a compound which is expressed by the following general formula (1) in 0.1 to 50 parts by weight and a cross-linking agent in 0.05 to 20 parts by weight is provided. (where, in said general formula (1), Y indicates a chemical single bond or —SO2—. Ra and Rb respectively independently indicate substitutable C1 to C30 organic groups. Za and Zb respectively independently indicate chemical single bonds or —SO2—. n and m respectively independently are 0 or 1, at least one of n and m being 1).

Abstract: The present invention relates to a method for producing a silica glass body containing titania, containing: a flame hydrolysis step of feeding a silica (SiO2) precursor and a titania (TiO2) precursor into an oxyhydrogen flame and causing a hydrolysis reaction in the flame to form silica glass fine particles containing titania, in which in the flame hydrolysis step, a reaction rate of the hydrolysis reaction of the silica precursor is 80% or more.

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1?90(° C.) to T1?220(° C.) for 120 hours or more.

Abstract: The present invention relates to a method for producing a glass body containing: hydrolyzing a silicon compound and a compound containing a metal serving as a dopant, in a flame projected from a burner to form glass fine particles; and depositing and growing the formed glass fine particles on a base material, in which a raw material mixed gas containing a gas of the silicon compound, a gas of the compound containing a metal serving as a dopant, and either one of a combustible gas and a combustion supporting gas is fed into a central nozzle (A) positioning in the center of the burner; the other gas of the combustible gas and the combustion supporting gas is fed into a nozzle (B) different from the central nozzle (A) of the burner; a combustible gas or a combustion supporting gas is arbitrarily fed into a nozzle different from the nozzles (A) and (B); and a flow rate of the raw material mixed gas is 50% or more and not more than 90% of the largest flow rate among flow rate(s) of the combustible gas(ses) and the

Abstract: The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising: a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1 (° C.), heating the glass body after transparent vitrification at a temperature of T1+400° C. or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1?400 (° C.) from T1 (° C.) in an average temperature decreasing rate of 10° C./hr or less.

Abstract: The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.

Abstract: The present invention provides a synthetic silica glass for an optical member in which not only a fast axis direction in an optical axis direction is controlled, and a birefringence in an off-axis direction is reduced, but a magnitude of a birefringence in the optical axis direction is controlled to an arbitrary value, such that an average value of a value BR cos2?xy defined from a birefringence BR and a fast axis direction ?xy as measured from a parallel direction to the principal optical axis direction is defined as an average birefringence AveBR cos2?xy, and when a maximum value of a birefringence measured from a vertical direction to the principal optical axis direction of the optical member is defined as a maximum birefringence BRmax in an off-axis direction, the following expression (1-1) and expression (2-1) are established: ?1.0?AveBR cos2?xy<0.0??(1-1) 0.0?BRmax?1.0??(2-1).