Patents by Inventor Tomosaburo Aoki

Tomosaburo Aoki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photosensitive compositions for application of the lift-off technique and a method of forming patterns using the compositions
    Patent number: 6265129
    Abstract: Improved positive photosensitive composition for application of the lift-off technique comprises (A) an alkali-soluble resin and (B) a mixture of two photosensitive agents in admixture with the alkali-soluble resin, one being (i) a photosensitive agent which shows the tendency to form a resist pattern of a feature profile having a micro-groove upon exposure and the other being (ii) a photosensitive agent which does not show the stated tendency but shows the tendency to form a resist pattern having a rectangular or tapered cross-sectional feature profile upon exposure and using the composition, one can form half-a-micron meter and even finer conducting patterns, electrodes or insulation patterns in a highly reproducible manner.
    Type: Grant
    Filed: November 7, 1997
    Date of Patent: July 24, 2001
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Koichi Takahashi, Tetsuya Kato, Tomosaburo Aoki