Patents by Inventor Tomoya Tokuda

Tomoya Tokuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7422770
    Abstract: A method and apparatus of forming a microcrystalline thin film comprises supplying a first gas and a second gas into a chamber containing a substrate during a first process, and supplying the second gas but not the first gas into the chamber during a second process. The first and second processes are performed plural times to form the microcrystalline thin film.
    Type: Grant
    Filed: October 24, 2003
    Date of Patent: September 9, 2008
    Assignee: Chi Mei Optoelectronics Corp.
    Inventors: Takatoshi Tsujimura, Tomoya Tokuda
  • Publication number: 20040137146
    Abstract: A method and apparatus of forming a microcrystalline thin film comprises supplying a first gas and a second gas into a chamber containing a substrate during a first process, and supplying the second gas but not the first gas into the chamber during a second process. The first and second processes are performed plural times to form the microcrystalline thin film.
    Type: Application
    Filed: October 24, 2003
    Publication date: July 15, 2004
    Inventors: Takatoshi Tsujimura, Tomoya Tokuda