Patents by Inventor Tomoyasu Yashima

Tomoyasu Yashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRONIC DEVICE MANUFACTURING AQUEOUS SOLUTION, METHOD FOR MANUFACTURING RESIST PATTERN AND METHOD FOR MANUFACTURING DEVICE
    Publication number: 20230167383
    Abstract: [Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqueous solution comprising an alkylcarboxylic acid compound (A) and a solvent (B), wherein the alkylcarboxylic acid compound (A) is represented by the formula (a): A1-COOH (a), wherein A1 is C4-12 alkyl, and the solvent (B) comprises water.
    Type: Application
    Filed: April 1, 2021
    Publication date: June 1, 2023
    Inventors: Kazuma YAMAMOTO, Tomoyasu YASHIMA, Maki ISHII
  • Lithography composition, a method for forming resist patterns and a method for making semiconductor devices
    Patent number: 11156920
    Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: October 26, 2021
    Assignee: Merck Patent GmbH
    Inventors: Kazuma Yamamoto, Maki Ishii, Tomoyasu Yashima, Tatsuro Nagahara
  • A LITHOGRAPHY COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A METHOD FOR MAKING SEMICONDUCTOR DEVICES
    Publication number: 20190377263
    Abstract: The present invention relates to a new lithography composition, the forming of resist patterns using the lithography composition, and a semiconductor device manufacturing method using the lithography composition in a photolithography method.
    Type: Application
    Filed: November 21, 2017
    Publication date: December 12, 2019
    Inventors: Kazuma YAMAMOTO, Maki ISHII, Tomoyasu YASHIMA, Tatsuro NAGAHARA
  • Rinse composition, a method for forming resist patterns and a method for making semiconductor devices
    Patent number: 10451974
    Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: October 22, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Kazuma Yamamoto, Yuriko Matsuura, Tomoyasu Yashima, Tatsuro Nagahara
  • A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A METHOD FOR MAKING SEMICONDUCTOR DEVICES
    Publication number: 20190250515
    Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.
    Type: Application
    Filed: June 19, 2017
    Publication date: August 15, 2019
    Inventors: Kazuma YAMAMOTO, Yuriko MATSUURA, Tomoyasu YASHIMA, Tatsuro NAGAHARA