Patents by Inventor Tomoyuki Matsuda

Tomoyuki Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11478450
    Abstract: An edaravone suspension for human oral administration includes edaravone particles, a dispersant, and water.
    Type: Grant
    Filed: December 23, 2021
    Date of Patent: October 25, 2022
    Assignee: MITSUBISHI TANABE PHARMA CORPORATION
    Inventors: Tetsuo Hayama, Tomohiro Takahashi, Tomoyuki Omura, Kouji Hayashi, Munetomo Matsuda, Tadashi Miyazawa
  • Publication number: 20220267995
    Abstract: An engine control system controls a work machine including an engine, a fuel injection device that injects fuel into the engine, and a hydraulic pump that is driven by the engine. The rotation state amount specification unit specifies a rotation state amount related to rotation of the engine. The injection amount determination unit determines a fuel injection amount by the fuel injection device based on the rotation state amount.
    Type: Application
    Filed: September 18, 2020
    Publication date: August 25, 2022
    Applicant: Komatsu Ltd.
    Inventors: Tadashi Iijima, Tomoyuki Matsuda, Keiichi Arai
  • Publication number: 20180127655
    Abstract: A photo-aligning liquid crystal aligning agent for forming a liquid crystal alignment layer capable of materializing a liquid crystal display device, which has a high transmittance while maintaining a liquid crystal aligning property, a voltage holding ratio and the like, and in which flickering is inhibited from being caused after operating for a long time. The photo-aligning liquid crystal aligning agent contains [A] polyamic acid or a derivative thereof which is synthesized by reacting tetracarboxylic acid dianhydride and diamine, and [B] polyamic acid or a derivative thereof obtained by reacting tetracarboxylic acid dianhydride having no photoreactive structure and diamine having no photoreactive structure.
    Type: Application
    Filed: January 9, 2018
    Publication date: May 10, 2018
    Applicants: JNC CORPORATION, JNC PETROCHEMICAL CORPORATION
    Inventors: Youichiro Ooki, Yuko Katano, Tomoyuki Matsuda, Keisuke Izawa, Rika Hisada
  • Patent number: 9909065
    Abstract: A photo-aligning liquid crystal aligning agent for forming a liquid crystal alignment layer capable of materializing a liquid crystal display device, which has a high transmittance while maintaining a liquid crystal aligning property, a voltage holding ratio and the like, and in which flickering is inhibited from being caused after operating for a long time. The photo-aligning liquid crystal aligning agent contains [A] polyamic acid or a derivative thereof which is synthesized by reacting tetracarboxylic acid dianhydride and diamine, and [B] polyamic acid or a derivative thereof obtained by reacting tetracarboxylic acid dianhydride having no photoreactive structure and diamine having no photoreactive structure.
    Type: Grant
    Filed: April 10, 2013
    Date of Patent: March 6, 2018
    Assignees: JNC CORPORATION, JNC PETROCHEMICAL CORPORATION
    Inventors: Youichiro Ooki, Yuko Katano, Tomoyuki Matsuda, Keisuke Izawa, Rika Hisada
  • Publication number: 20170327744
    Abstract: A photo-aligning liquid crystal alignment layer formed by using a photo-aligning liquid crystal aligning agent containing polyamic acid or a derivative thereof which is synthesized by using tetracarboxylic acid dianhydride having no photoreactive structure having a specific structure and diamine having no photoreactive structure having a specific structure together with at least one of tetracarboxylic acid dianhydride having a photoreactive structure and diamine having a photoreactive structure can reduce storage of residual DC in a liquid crystal display device. Further, the above alignment layer can shorten the relaxation time and can prevent afterimages from being generated.
    Type: Application
    Filed: July 31, 2017
    Publication date: November 16, 2017
    Inventors: Youichiro OOKI, Yuko KATANO, Tomoyuki MATSUDA, Keisuke IZAWA, Rika HISADA
  • Patent number: 9796927
    Abstract: A photo-aligning liquid crystal alignment layer formed by using a photo-aligning liquid crystal aligning agent containing polyamic acid or a derivative thereof which is synthesized by using tetracarboxylic acid dianhydride having no photoreactive structure having a specific structure and diamine having no photoreactive structure having a specific structure together with at least one of tetracarboxylic acid dianhydride having a photoreactive structure and diamine having a photoreactive structure can reduce storage of residual DC in a liquid crystal display device. Further, the above alignment layer can shorten the relaxation time and can prevent afterimages from being generated.
    Type: Grant
    Filed: April 10, 2013
    Date of Patent: October 24, 2017
    Assignees: JNC CORPORATION, JNC PETROCHEMICAL CORPORATION
    Inventors: Youichiro Ooki, Yuko Katano, Tomoyuki Matsuda, Keisuke Izawa, Rika Hisada
  • Patent number: 9111972
    Abstract: The sizes required for maintenance are reduced and an occupying floor area is reduced. The substrate processing apparatus contains a load lock chamber 41 and a transfer chamber 24 respectively provided in order from the rear side within a case 11; and a processing chamber 53 provided above the load lock chamber 41 for processing wafers 1. An opening section 27A, and an opening and closing means 28A for opening and closing the opening section 27A are respectively provided in a location at the rear side of the transfer chamber 24 where the load lock chamber 41 is not arranged.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: August 18, 2015
    Assignee: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Mitsunori Takeshita, Tomoyuki Matsuda, Mitsuhiro Hirano, Akihiro Sato, Shinya Morita, Toshimitsu Miyata, Koji Shibata
  • Publication number: 20150119522
    Abstract: An object of the present invention is to provide a photo-aligning liquid crystal aligning agent for forming a liquid crystal alignment layer capable of materializing a liquid crystal display device which has a high transmittance while maintaining a liquid crystal aligning property, a voltage holding ratio and the like and in which flickering is inhibited from being caused after operated for a long time.
    Type: Application
    Filed: April 10, 2013
    Publication date: April 30, 2015
    Inventors: Youichiro Ooki, Yuko Katano, Tomoyuki Matsuda, Keisuke Izawa, Rika Hisada
  • Publication number: 20150105503
    Abstract: A photo-aligning liquid crystal alignment layer formed by using a photo-aligning liquid crystal aligning agent containing polyamic acid or a derivative thereof which is synthesized by using tetracarboxylic acid dianhydride having no photoreactive structure having a specific structure and diamine having no photoreactive structure having a specific structure together with at least one of tetracarboxylic acid dianhydride having a photoreactive structure and diamine having a photoreactive structure can reduce storage of residual DC in a liquid crystal display device. Further, the above alignment layer can shorten the relaxation time and can prevent afterimages from being generated.
    Type: Application
    Filed: April 10, 2013
    Publication date: April 16, 2015
    Inventors: Youichiro Ooki, Yuko Katano, Tomoyuki Matsuda, Keisuke Izawa, Rika Hisada
  • Patent number: 8851886
    Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a reaction tube; a heating device configured to heat the reaction tube; and a manifold installed outward as compared with the heating device and made of a non-metallic material. A first thickness of the manifold defined in a direction perpendicular to a center axis of the reaction tube is greater than a second thickness of the manifold defined at a position adjacent to the reaction tube in a direction parallel to the center axis of the reaction tube. The manifold includes a protrusion part of which at least a portion protrudes inward more than an inner wall of the reaction tube, and a gas supply unit disposed at at least the protrusion part for supplying gas to an inside of the reaction tube.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: October 7, 2014
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Shinya Morita, Akihiro Sato, Akinori Tanaka, Shigeo Nakada, Takayuki Nakada, Shuhei Saido, Tomoyuki Matsuda
  • Patent number: 8609261
    Abstract: There are provided titanium oxide particles capable of manifesting an unprecedented property, a manufacturing method thereof and a magnetic memory as well as a charge storage type memory employing the titanium oxide particles. Unlike-conventional bulk bodies phase-transited between nonmagnetic semiconductors and paramagnetic metals around about 460K, provided are titanium oxide particles 3 capable of manifesting an unprecedented property that Ti3O5 particles do not undergo phase transitions at room temperature and allow a paramagnetic metal property thereof to be consistently maintained in any temperature range.
    Type: Grant
    Filed: November 26, 2009
    Date of Patent: December 17, 2013
    Assignee: The University of Tokyo
    Inventors: Shin-ichi Ohkoshi, Tomoyuki Matsuda, Yoshihide Tsunobuchi, Kazuhito Hashimoto, Hiroko Tokoro
  • Patent number: 8591657
    Abstract: Metal corrosion and substrate contamination can be suppressed, and process quality and yield can be improved. A substrate processing apparatus comprises: a process chamber; a substrate holder; a cover part closing and opening the process chamber; a substrate holder stage; a rotary mechanism rotating the substrate holder stage; a rotation shaft inserted through the cover part and connected to the substrate holder stage and the rotary mechanism so that a first gas ejection port is formed therebetween; a first gas stagnant part surrounded by the rotary mechanism, the cover part, and the rotation shaft; a second gas ejection port formed at the substrate holder stage; a second gas stagnant part formed at the rotation shaft and communicating with the process chamber via the second gas ejection port; and a flow port formed at the rotation shaft for connecting the first and second gas stagnant parts.
    Type: Grant
    Filed: August 27, 2009
    Date of Patent: November 26, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Takayuki Nakada, Tomoyuki Matsuda, Shinya Morita
  • Patent number: 8529701
    Abstract: A substrate processing apparatus includes a reaction tube, the reaction tub including an inner tube made of quartz and an outer tube made of quartz; a manifold made of quartz disposed under the outer tube, a top surface of the manifold being in air-tight contact with a bottom surface of the outer tube via a sealing member; a seal cap cover made of quartz disposed under the manifold, a top surface of the seal cap cover being in air-tight contact with a bottom surface of the manifold via a sealing member; a seal cap covered by the seal cap cover, a top surface of the seal cap being in air-tight contact with a bottom surface of the seal cap cover via a sealing member; and at least one protrusion disposed at the bottom surface of one of the outer tube, the manifold, the seal cap cover, and combinations thereof.
    Type: Grant
    Filed: August 6, 2009
    Date of Patent: September 10, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Shinya Morita, Takayuki Nakada, Tomoyuki Matsuda, Keisuke Sakashita
  • Patent number: 8398771
    Abstract: A substrate processing apparatus in accordance with the present invention includes a process chamber configured to accommodate a substrate, a gas supply line configured to supply a gas to an inside of the process chamber, and an exhaust line configured to exhaust the inside of the process chamber. The gas supply line of the substrate processing apparatus includes a preheating unit preheating the gas supplied from a gas source, a metal pipeline having an angled section wherein the metal pipe line connects the preheating unit and the inside of the process chamber to supply the gas preheated by the preheating unit into the process chamber, and a heat dissipation member covering the angled section to dissipate heat from the angled section.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: March 19, 2013
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Takayuki Nakada, Koichi Sada, Tomoyuki Matsuda
  • Patent number: 8076615
    Abstract: A substrate processing apparatus comprises: an outer tube; a manifold connected to the outer tube and made of a non-metal material; an inner tube disposed in the manifold at a more inner side than the outer tube and configured to process a substrate therein; a heating device installed at a more outer side than the outer tube and configured to heat the inside of the outer tube; a lid configured to open and close an opening of the manifold, with a seal member intervened therebetween; and a heat absorption member installed in the manifold, with a bottom end of the inner tube intervened therebetween, and configured to absorb heat from the heating device, the heat absorption member being made of a non-metal material.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: December 13, 2011
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Shinya Morita, Koichi Sada, Takayuki Nakada, Tomoyuki Matsuda
  • Publication number: 20110204278
    Abstract: There are provided titanium oxide particles capable of manifesting an unprecedented property, a manufacturing method thereof and a magnetic memory as well as a charge storage type memory employing the titanium oxide particles. Unlike-conventional bulk bodies phase-transited between nonmagnetic semiconductors and paramagnetic metals around about 460K, provided are titanium oxide particles 3 capable of manifesting an unprecedented property that Ti3O5 particles do not undergo phase transitions at room temperature and allow a paramagnetic metal property thereof to be consistently maintained in any temperature range.
    Type: Application
    Filed: November 26, 2009
    Publication date: August 25, 2011
    Applicant: THE UNIVERSITY OF TOKYO
    Inventors: Shin-ichi Ohkoshi, Tomoyuki Matsuda, Yoshihide Tsunobuchi, Kazuhito Hashimoto, Hiroko Tokoro
  • Patent number: 7964623
    Abstract: This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof wherein R1 and R2 are independently of each other hydrogen atom, C1-6alkyl group or C6-14aryl group, R3 is hydrogen atom or C1-6alkylcarbonyloxy group, or together with R4 forms a bond, R4 is hydrogen atom, or together with R3 forms a bond, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R5 is hydrogen atom or C1-6alkyl group, R6 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, amino group, C1-6alkylamino group, di-C1-6alkylamino group, C6-14arylamino group, C2-9heteroarylamino group, C6-14aryl group, C2-9heteroaryl group or C2-9heterocyclyl group, A is 5-, 6- or 7-member ring fused with benzene ring, as constituent atom of the ring, oxygen atom, nitrogen atom or sulfur atom may be contained in the number of 1 to 3 alone or in a combination thereof, the number of unsaturated bond in the ring is 1, 2 or 3
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: June 21, 2011
    Assignee: Nissan Chemical Industries Ltd.
    Inventors: Kazuhiko Ohrai, Yukohiro Shigeta, Osamu Uesugi, Takumi Okada, Tomoyuki Matsuda
  • Patent number: 7781483
    Abstract: This invention relates to benzopyran compounds of formula (I) wherein X is NR6, Y is a bond, SO or SO2, Z is C1-4alkyl group or phenyl group, W is hydrogen atom, hydroxy group, C1-6 alkoxy group, a halogen atom, C1-4alkyl group or C1-6alkylsulfonylamino group, R1 and R2 are independently of each other C1-3alkyl group, R3 is hydrogen atom, hydroxy group or methoxy group, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R4 is hydrogen atom or C1-6alkyl group, R5 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, C6-14aryl group or C2-9heteroaryl group. These compounds are useful as an anti-arrhythmic agent.
    Type: Grant
    Filed: February 25, 2005
    Date of Patent: August 24, 2010
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Toru Tsukagoshi, Takayuki Nagatsuka, Tomoyuki Matsuda, Norio Hashimoto
  • Publication number: 20100069374
    Abstract: This invention relates to benzopyran derivatives of formula (I) or (II), or pharmaceutically acceptable salts thereof wherein R1 and R2 are independently of each other hydrogen atom, C1-6alkyl group or C6-14aryl group, R3 is hydrogen atom or C1-6alkylcarbonyloxy group, or together with R4 forms a bond, R4 is hydrogen atom, or together with R3 forms a bond, m is an integer of 0 to 4, n is an integer of 0 to 4, V is a single bond, CR7R8, NR9, O, S, SO or SO2, R5 is hydrogen atom or C1-6alkyl group, R6 is hydrogen atom, C1-6alkyl group, C3-8cycloalkyl group, C3-8cycloalkenyl group, amino group, C1-6alkylamino group, di-C1-6alkylamino group, C6-14arylamino group, C2-9heteroarylamino group, C6-14aryl group, C2-9heteroaryl group or C2-9heterocyclyl group, A is 5-, 6- or 7-member ring fused with benzene ring, as constituent atom of the ring, oxygen atom, nitrogen atom or sulfur atom may be contained in the number of 1 to 3 alone or in a combination thereof, the number of unsaturated bond in the ring is 1, 2 or 3
    Type: Application
    Filed: November 17, 2009
    Publication date: March 18, 2010
    Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Kazuhiko Ohrai, Yukohiro Shigeta, Osamu Uesugi, Takumi Okada, Tomoyuki Matsuda
  • Publication number: 20100055918
    Abstract: Metal corrosion and substrate contamination can be suppressed, and process quality and yield can be improved. A substrate processing apparatus comprises: a process chamber; a substrate holder; a cover part closing and opening the process chamber; a substrate holder stage; a rotary mechanism rotating the substrate holder stage; a rotation shaft inserted through the cover part and connected to the substrate holder stage and the rotary mechanism so that a first gas ejection port is formed therebetween; a first gas stagnant part surrounded by the rotary mechanism, the cover part, and the rotation shaft; a second gas ejection port formed at the substrate holder stage; a second gas stagnant part formed at the rotation shaft and communicating with the process chamber via the second gas ejection port; and a flow port formed at the rotation shaft for connecting the first and second gas stagnant parts.
    Type: Application
    Filed: August 27, 2009
    Publication date: March 4, 2010
    Inventors: Takayuki Nakada, Tomoyuki Matsuda, Shinya Morita