Abstract: To provide a judgment apparatus capable of achieving improved judgment accuracy, a judgment apparatus according to an embodiment judges a judgment target as pass or fail based on pass judgment characteristic information produced using characteristic amounts extracted from previously collected monitoring data items of judgment targets judged as pass. The pass/fail judgment processing includes extracting the characteristic amounts from monitoring data items of judgment targets sequentially input and successively performing pass/fail judgment of the judgment targets based on the pass judgment characteristic information. When one of the judgment targets is judged as pass in the successive pass/fail judgment, the characteristic amount of the judgment target judged as pass is used to update the pass judgment characteristic information. Pass/fail judgment of a judgment target subsequent to the judgment target judged as pass is performed based on the updated pass judgment characteristic information.

Abstract: A holder for a long member includes: a holding member that includes a frame-shaped body portion; an anti-vibration member that is made of an elastic material and includes a frame-shaped portion; and a fixing member that is provided with an insertion portion. The insertion portion includes an extension portion extending in an insertion direction in which the insertion portion is inserted into the frame-shaped portion. A pressing protrusion protrudes on an outer surface of the extension portion, and when the frame-shaped portion is inserted into the frame-shaped body portion and the insertion portion is inserted into the frame-shaped portion, the pressing protrusion presses an inner surface of the frame-shaped portion and an outer surface of the frame-shaped portion comes into pressing contact with an inner surface of the frame-shaped body portion.

Abstract: A cooling system is provided. Coil ends protrude outward from a first end of a stator core in a direction along a central axis. An imaginary straight line is orthogonal to both of a central axis of a core body and an axis extending in an up-down direction. Half the coil ends above the imaginary straight line are in a first portion. Each of the segment coils in the first portion includes an outer peripheral surface that faces in a direction opposite from the central axis. The outer peripheral surface of each of the segment coils includes a twisted surface. The direction in which the twisted surface faces becomes closer to the direction facing the stator core as the twisted surface extends toward the first end of the stator core.

Abstract: A digital twin simulation is executed. In this simulation, a personal relationship level between two workers included in multiple workers is calculated. Further, based on the personal relationship level between the two workers and data of work content of the work scheduled to be executed in a work line of a real space, an assignment pattern of workers satisfying a reference condition in which a work efficiency in a whole work line of a digital space is equal to or greater than a target value is searched.

Abstract: The operation management system manages an operation of a line composed of a plurality of cooperating work subjects. The operation management system performs: setting, for each work subject, an intensity that decreases at a speed corresponding to a work speed, recovers by a recovery action, and is given a lower limit value; receiving a target handling plan for the line; creating an operation plan including at least the working speed and a timing of the recovery action by using a simulation model obtained by modeling the line so that the target handling plan is achieved while maintaining the intensity of each work subject at the lower limit value or more; and allowing the intensity of each work subject to temporarily decrease to less than the lower limit value in creation of the operation plan in response to the target handling plan exceeding a predetermined reference value.

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3), and a photoacid generator (B). In the formulae (a1) to (a3), R12, R22, and R32 each independently represent an organic group having 1 to 10 carbon atoms; R21 represents a substituted or non-substituted alkyl group having 1 to 10 carbon atoms; R31 represents a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atoms, or a halogen atom; R13 and R23 each independently represent an acid dissociable group; R33 represents a hydroxyaryl group; and l, m and n independently represent an integer from 0 to 10.

Abstract: An object of the present invention is to provide a photosensitive composition capable of producing a pattern having a precise shape without causing curing defects of a coating film even when the time is required from exposure of the coating film to the next step. A photosensitive composition of the present invention contains a polymer (A), a polymerizable compound (B), a photoacid generator (C), and a solvent (D), in which the polymerizable compound (B) includes an epoxy compound (B-1) containing two or more groups represented by the following Formula (1) and a specific epoxy compound (B-2) other than the epoxy compound (B-1), and an epoxy compound containing an epoxy group fused to an alicyclic group is contained in an amount of 50 mass % or more with respect to a total of 100 mass % of the polymerizable compound (B).

Abstract: A holder for a long member includes: a holding member that includes a frame-shaped body portion; an anti-vibration member that is made of an elastic material and includes a frame-shaped portion; and a fixing member that is provided with an insertion portion. The insertion portion includes an extension portion extending in an insertion direction in which the insertion portion is inserted into the frame-shaped portion. A pressing protrusion protrudes on an outer surface of the extension portion, and when the frame-shaped portion is inserted into the frame-shaped body portion and the insertion portion is inserted into the frame-shaped portion, the pressing protrusion presses an inner surface of the frame-shaped portion and an outer surface of the frame-shaped portion comes into pressing contact with an inner surface of the frame-shaped body portion.

Abstract: A holder for a long member includes: a holding member that includes a frame-shaped body portion; an anti-vibration member that includes a frame-shaped portion; and a fixing member that is provided with an insertion portion, and a flange. The anti-vibration member includes a pair of extension pieces that protrude in a state where the frame-shaped portion is inserted into the frame-shaped body portion, and that are sandwiched between the frame-shaped body portion and the flange when the insertion portion is inserted into the frame-shaped portion. Clearance is provided between an inner surface of a frame-shaped body portion side wall that faces a first wall in which the pair of extension pieces of the anti-vibration member are not provided in the frame-shaped body portion, and an outer edge of the flange facing the frame-shaped body portion side wall.

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

Abstract: A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. R31 each independently represents a monovalent hydrocarbon group or a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group, and at least one R31 is a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group when p is 1 and when p is an integer of 2 or more and all of Z is an oxygen atom. R32 and R33 each independently represent a divalent hydrocarbon group, and R34 represents a glycoluril ring structure or an isocyanul ring structure.

Abstract: A method for producing a plated shaped structure, includes applying a photosensitive resin composition on a substrate to form a photosensitive resin coating film. The photosensitive resin composition includes: (A) a resin whose solubility in alkali is capable of being increased by an action of an acid; (B) a photoacid generator; and (C) a compound which is capable of being decomposed by an action of an acid to form a primary or secondary amine. The photosensitive resin coating film is exposed to light. The photosensitive resin coating film is developed after the exposing to light to form a resist pattern. A plating process is performed using the resist pattern as a mask.

Abstract: A method for producing a plated formed product includes: a step (1) of forming on a substrate of the substrate having a metal film a resin film of a photosensitive resin composition containing a sulfur-containing compound having at least one selected from a mercapto group, a sulfide bond, and a polysulfide bond; a step (2) of exposing the resin film; a step (3) of developing the exposed resin film to form a resist pattern film; a step (4) of performing plasma treatment of a substrate having the resist pattern film on the metal film with oxygen-containing gas; and a step (5) of performing, after the plasma treatment, plating treatment with the resist pattern film as a mold.

Abstract: An object of the present invention is to provide a photosensitive resin composition for suppressing standing wave traces and forming a resist pattern film having a rectangular cross section. The photosensitive resin composition of the present invention contains polymer (A) having an acid dissociative group; photoacid generator (B); carbamic acid ester (C) having a hydroxyl group; and solvent (D), the solvent (D) containing at least one solvent (D1) selected from, for example, propylene glycol monomethyl ether acetate and at least one solvent (D2) selected from, for example, dipropylene glycol dimethyl ether.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3), and a photoacid generator (B). In the formulae (a1) to (a3), R12, R22, and R32 each independently represent an organic group having 1 to 10 carbon atoms; R21 represents a substituted or non-substituted alkyl group having 1 to 10 carbon atoms; R31 represents a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atoms, or a halogen atom; R13 and R23 each independently represent an acid dissociable group; R33 represents a hydroxyaryl group; and l, m and n independently represent an integer from 0 to 10.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.

Abstract: There is provided a hose clamp. A clamp has a clamp body. On one end portion of the clamp body, a slit is provided and a first grip piece is formed. On the other end portion of the clamp body, a second grip piece is formed. A holder is provided with a holding groove and a grip portion. The holding groove has an insertion opening opened in a direction intersecting with an axial direction of the clamp body, and a side opening opened on at least one end side in the axial direction of the clamp body. A protrusion is provided on at least one of opposing inner surfaces of the holding groove. When the pair of grip pieces are inserted in the holding groove, the protrusion can be arranged inside a part of the slit located in the first grip piece.

Abstract: A method for producing a plated shaped structure, includes applying a photosensitive resin composition on a substrate to form a photosensitive resin coating film. The photosensitive resin composition includes: (A) a resin whose solubility in alkali is capable of being increased by an action of an acid; (B) a photoacid generator; and (C) a compound which is capable of being decomposed by an action of an acid to form a primary or secondary amine. The photosensitive resin coating film is exposed to light. The photosensitive resin coating film is developed after the exposing to light to form a resist pattern. A plating process is performed using the resist pattern as a mask.

Abstract: In a blood purification device containing a blood purifier, a blood circuit, a blood pump, and a dialysate line having a fresh dialysate supply line and a used dialysate discharge line, a pair of plunger pumps are disposed in the dialysate line. The pair of plunger pumps are synchronized so that delivery of a fresh dialysate from one plunger pump and suction of a used dialysate into the other plunger pump simultaneously occur and the stroke of at least one of the pair of plunger pumps is made variable.