Abstract: The present invention addresses the problem of providing; a water absorbent resin powder having a reduced amount of fine powder generated and a reduced amount of fine powder recovered; and a production method for the water absorbent resin. The production method of the present invention includes a drying step and a fine powder granulation step. The drying step is for obtaining a dried polymer by drying a particulate water-containing gel crosslinked polymer which is obtained using an acid group-containing unsaturated monomer as a main component. The fine powder granulation step is for obtaining a fine powder granulated product by adding a binder and an adhesion control agent to a fine powder made of a water absorbent resin. In this production method, the obtained fine powder granulated product is recovered in the drying step or in any step before the drying step.

Abstract: A power supply control device includes: a controller configured to perform a diagnosis of a degree of deterioration of a backup power supply that supplies electric power to a load of a vehicle when a main power supply that supplies electric power to the load fails. The controller is configured to start the diagnosis before a user gets in the vehicle, when detecting an occurrence of an event indicating that the user is to get in the vehicle.

Abstract: A digital twin simulation is performed. In this simulation, combinations of workers and mounting fixtures worn by the workers are assigned to each of multiple works to be performed in a work line of a digital space based on data related to work contents of the multiple works to be performed in the work line of a real space, and data related to multiple workers arranged in the work line and data related to mounting fixtures worn by the multiple workers. Then, based on the assigned combinations, a group of combinations of the multiple workers and the mounting fixtures worn by the respective multiple workers in a case where a reference condition is satisfied are searched.

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

Abstract: A work line includes: a first work carried out by a first target worker; and a second work carried out by a second target worker on a resultant product of the first work. A first model motion is a model motion when the first target worker passes the resultant product of the first work to the second target worker. A second model motion is a model motion when the second target worker receives the resultant product of the first work from the first target worker. When the first target worker carries out the first work in a virtual space, a simulation system draws a first model worker performing the first model motion in the virtual space. When the second target worker carries out the second work in the virtual space, the simulation system draws a second model worker performing the second model motion in the virtual space.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3), and a photoacid generator (B). In the formulae (a1) to (a3), R12, R22, and R32 each independently represent an organic group having 1 to 10 carbon atoms; R21 represents a substituted or non-substituted alkyl group having 1 to 10 carbon atoms; R31 represents a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atoms, or a halogen atom; R13 and R23 each independently represent an acid dissociable group; R33 represents a hydroxyaryl group; and l, m and n independently represent an integer from 0 to 10.

Abstract: There is provided an imaging device including a semiconductor substrate and a plurality of imaging elements that are arrayed in a matrix in a first direction and a second direction on the semiconductor substrate and perform photoelectric conversion on incident light. Each of the plurality of imaging elements includes a plurality of pixels that are provided in a predetermined unit region of the semiconductor substrate to be adjacent to each other and contains impurities of a first conductivity type, a separation section that separates the plurality of pixels, two first element separation walls that are provided along two first side surfaces extending in the second direction of the predetermined unit region to pierce through at least a part of the semiconductor substrate, and a first diffusion region provided in the semiconductor substrate around the first element separation wall and the separation section and containing impurities of a second conductivity type.

Abstract: To provide a cell evaluation device capable of evaluating cells and a secretory substance emitted from the cells accurately and precisely. Provided is a cell evaluation device including a first capturing unit that captures a secretory substance secreted by cells, and an image acquisition unit that acquires an image obtained by imaging observation light of the cells and light emitted from a luminescent substance bonded to the secretory substance, in which the image acquisition unit and the first capturing unit are disposed in this order, and the image acquisition unit acquires position information for the cells and the secretory substance.

Abstract: Synthetic resin leather includes a base material, and a skin layer that is stacked on the base material and is made of a synthetic resin capable of being elastically deformed. Multiple micro recess parts are intermittently and regularly formed on a surface of the skin layer. The multiple micro recess parts form multiple bottom face parts that are located at a substantially constant depth from the surface of the skin layer, and multiple inner side face parts that extend from the surface of the skin layer to the multiple bottom face parts and are capable of being elastically deformed.

Abstract: There is provided an imaging device including a first semiconductor layer formed on a semiconductor substrate, a second semiconductor layer formed on the first semiconductor layer and having an opposite conductivity type to the first semiconductor layer, a pixel separation portion that demarcates a pixel region including the first semiconductor layer and the second semiconductor layer, a first electrode connected to the first semiconductor layer from one surface side of the semiconductor substrate, and a metal layer connected to the second semiconductor layer from a light irradiation surface side which is the other surface of the semiconductor substrate and buried in the pixel separation portion in at least a part of the semiconductor substrate in a thickness direction.

Abstract: An object of the present invention is to provide a photosensitive composition capable of producing a pattern having a precise shape without causing curing defects of a coating film even when the time is required from exposure of the coating film to the next step. A photosensitive composition of the present invention contains a polymer (A), a polymerizable compound (B), a photoacid generator (C), and a solvent (D), in which the polymerizable compound (B) includes an epoxy compound (B-1) containing two or more groups represented by the following Formula (1) and a specific epoxy compound (B-2) other than the epoxy compound (B-1), and an epoxy compound containing an epoxy group fused to an alicyclic group is contained in an amount of 50 mass % or more with respect to a total of 100 mass % of the polymerizable compound (B).

Abstract: A holder for a long member includes: a holding member that includes a frame-shaped body portion; an anti-vibration member that is made of an elastic material and includes a frame-shaped portion; and a fixing member that is provided with an insertion portion. The insertion portion includes an extension portion extending in an insertion direction in which the insertion portion is inserted into the frame-shaped portion. A pressing protrusion protrudes on an outer surface of the extension portion, and when the frame-shaped portion is inserted into the frame-shaped body portion and the insertion portion is inserted into the frame-shaped portion, the pressing protrusion presses an inner surface of the frame-shaped portion and an outer surface of the frame-shaped portion comes into pressing contact with an inner surface of the frame-shaped body portion.

Abstract: A holder for a long member includes: a holding member that includes a frame-shaped body portion; an anti-vibration member that includes a frame-shaped portion; and a fixing member that is provided with an insertion portion, and a flange. The anti-vibration member includes a pair of extension pieces that protrude in a state where the frame-shaped portion is inserted into the frame-shaped body portion, and that are sandwiched between the frame-shaped body portion and the flange when the insertion portion is inserted into the frame-shaped portion. Clearance is provided between an inner surface of a frame-shaped body portion side wall that faces a first wall in which the pair of extension pieces of the anti-vibration member are not provided in the frame-shaped body portion, and an outer edge of the flange facing the frame-shaped body portion side wall.

Abstract: A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

Abstract: A photosensitive resin composition contains at least one compound selected from the group consisting of compound (C1) represented by formula (C1), compound (C2) represented by formula (C2), and a multimer of the compound (C2). Z each independently represents an oxygen atom or a sulfur atom. R31 each independently represents a monovalent hydrocarbon group or a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group, and at least one R31 is a group obtained by substituting at least one hydrogen atom in the monovalent hydrocarbon group with a mercapto group when p is 1 and when p is an integer of 2 or more and all of Z is an oxygen atom. R32 and R33 each independently represent a divalent hydrocarbon group, and R34 represents a glycoluril ring structure or an isocyanul ring structure.

Abstract: A method for producing a plated shaped structure, includes applying a photosensitive resin composition on a substrate to form a photosensitive resin coating film. The photosensitive resin composition includes: (A) a resin whose solubility in alkali is capable of being increased by an action of an acid; (B) a photoacid generator; and (C) a compound which is capable of being decomposed by an action of an acid to form a primary or secondary amine. The photosensitive resin coating film is exposed to light. The photosensitive resin coating film is developed after the exposing to light to form a resist pattern. A plating process is performed using the resist pattern as a mask.

Abstract: A method for producing a plated formed product includes: a step (1) of forming on a substrate of the substrate having a metal film a resin film of a photosensitive resin composition containing a sulfur-containing compound having at least one selected from a mercapto group, a sulfide bond, and a polysulfide bond; a step (2) of exposing the resin film; a step (3) of developing the exposed resin film to form a resist pattern film; a step (4) of performing plasma treatment of a substrate having the resist pattern film on the metal film with oxygen-containing gas; and a step (5) of performing, after the plasma treatment, plating treatment with the resist pattern film as a mold.

Abstract: An object of the present invention is to provide a photosensitive resin composition for suppressing standing wave traces and forming a resist pattern film having a rectangular cross section. The photosensitive resin composition of the present invention contains polymer (A) having an acid dissociative group; photoacid generator (B); carbamic acid ester (C) having a hydroxyl group; and solvent (D), the solvent (D) containing at least one solvent (D1) selected from, for example, propylene glycol monomethyl ether acetate and at least one solvent (D2) selected from, for example, dipropylene glycol dimethyl ether.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3), and a photoacid generator (B). In the formulae (a1) to (a3), R12, R22, and R32 each independently represent an organic group having 1 to 10 carbon atoms; R21 represents a substituted or non-substituted alkyl group having 1 to 10 carbon atoms; R31 represents a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atoms, or a halogen atom; R13 and R23 each independently represent an acid dissociable group; R33 represents a hydroxyaryl group; and l, m and n independently represent an integer from 0 to 10.

Abstract: The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.