Abstract: A gas supplying method of supplying a process gas containing a gas of at least one gaseous species into a process space in a semiconductor manufacturing apparatus includes supplying the process gas by controlling a flow rate value of the gas to be a first value during a first period; supplying the process gas by controlling the flow rate value of the gas to be a second value smaller than the first value during a second period; supplying the process gas by controlling the flow rate value of the gas to be a third value greater than the first value during a third period; and supplying the process gas by controlling the flow rate value of the gas to be a fourth value smaller than the second value during a fourth period, wherein these steps are periodically repeated in a predetermined order.

Abstract: In the exemplary embodiment, a method for supplying a gas is provided. This method includes: supplying a processing gas to each of a central gas inlet portion and a peripheral gas inlet portion through a first branch line and a second branch line; closing a valve at a downstream side in a gas line for an additional gas, and filling the additional gas in a tube between the valve and an upstream flow rate controller; opening the valve after filling the additional gas, and supplying a high frequency power to one of an upper electrode and a lower electrode from a high frequency power supply after opening the valve.

Abstract: In the exemplary embodiment, a method for supplying a gas is provided. This method includes supplying a processing gas to each of a central gas inlet portion and a peripheral gas inlet portion through a first branch line and a second branch line; closing a valve at a downstream side in a gas line for an additional gas, and filling the additional gas in a tube between the valve and an upstream flow rate controller; opening the valve after filling the additional gas, and supplying a high frequency power to one of an upper electrode and a lower electrode from a high frequency power supply after opening the valve.

Abstract: A plasma etching apparatus of the present disclosure etches a substrate by plasma of a processing gas. The plasma etching apparatus includes a processing container; a holding unit configured to hold a substrate; and an electrode plate. The plasma etching apparatus further includes configured to supply the processing gas to a space between the holding unit and the electrode plate and disposed in n (n is a natural number of two or more) regions of the substrate divided concentrically in a radial direction, respectively. In addition, the plasma etching apparatus further includes a high frequency power source configured to supply a high frequency power to at least one of the holding unit and the electrode plate so as to generate plasma. The plasma etching apparatus controls a flow rate of the processing gas.

Abstract: In the exemplary embodiment, a method for supplying a gas is provided. This method includes supplying a processing gas to each of a central gas inlet portion and a peripheral gas inlet portion through a first branch line and a second branch line; closing a valve at a downstream side in a gas line for an additional gas, and filling the additional gas in a tube between the valve and an upstream flow rate controller; opening the valve after filling the additional gas, and supplying a high frequency power to one of an upper electrode and a lower electrode from a high frequency power supply after opening the valve.

Abstract: A plasma etching apparatus of the present disclosure etches a substrate by plasma of a processing gas. The plasma etching apparatus includes a processing container; a holding unit configured to hold a substrate; and an electrode plate. The plasma etching apparatus further includes configured to supply the processing gas to a space between the holding unit and the electrode plate and disposed in n (n is a natural number of two or more) regions of the substrate divided concentrically in a radial direction, respectively. In addition, the plasma etching apparatus further includes a high frequency power source configured to supply a high frequency power to at least one of the holding unit and the electrode plate so as to generate plasma. The plasma etching apparatus controls a flow rate of the processing gas.

Abstract: A gas supplying method of supplying a process gas containing a gas of at least one gaseous species into a process space in a semiconductor manufacturing apparatus includes supplying the process gas by controlling a flow rate value of the gas to be a first value during a first period; supplying the process gas by controlling the flow rate value of the gas to be a second value smaller than the first value during a second period; supplying the process gas by controlling the flow rate value of the gas to be a third value greater than the first value during a third period; and supplying the process gas by controlling the flow rate value of the gas to be a fourth value smaller than the second value during a fourth period, wherein these steps are periodically repeated in a predetermined order.

Abstract: A control device includes: a detection section configured to detect setting to a predetermined imaging mode; and a control section configured to set a predetermined method of zooming in response to the setting to the imaging mode, and to perform zoom control with a subject distance fixed.

Abstract: An imaging device includes an imaging section and a light-emitting section, and an imaging direction of the imaging section and a direction in which a light is projected by light emission of the light-emitting section are different directions.

Abstract: A constant amount of new portion of image data as still images is always stored on a memory in an image taking operation. In response to a shutter release operation, the image data stored on the memory is recorded onto a recording medium. A next new portion of the image data generated subsequent to the shutter release operation is then recorded on the recording medium to provide a photo opportunity slip prevention function. An operation is performed to modify a pixel count of the image data to be recorded in the photo opportunity slip prevention function. A user can multi-shot photograph with a pixel count of images captured within a unit time increased or with a higher priority placed on image quality.

Abstract: A constant amount of new portion of image data as still images is always stored on a memory in an image taking operation. In response to a shutter release operation, the image data stored on the memory is recorded onto a recording medium. A next new portion of the image data generated subsequent to the shutter release operation is then recorded on the recording medium. A predetermined pixel count, smaller than a standard pixel count set in the image data subsequent to the shutter release operation, is set in the image data prior to the shutter release operation. Process time for multi-shot operation is shortened in order to prevent photo opportunity missing. The pixel count in the image data subsequent to the shutter release operation remains unchanged so that the image data of high image quality is acquired.

Abstract: An information processing apparatus, an imaging apparatus and an information processing method, and a computer program are provided. An information processing apparatus includes: a state detecting part which detects physical fluctuations that are generated in association with a user carrying the information processing apparatus; and a control part which receives detection information of the state detecting part, and which shifts a state to a hot standby state in which a system startup process necessary prior to data processing in the information processing apparatus is completed, or which executes a process to continue the hot standby state, based on determination that the information processing apparatus is being carried by the user.

Abstract: A constant amount of new portion of image data as still images is always stored on a memory in an image taking operation. In response to a shutter release operation, the image data stored on the memory is recorded onto a recording medium. A next new portion of the image data generated subsequent to the shutter release operation is then recorded on the recording medium. A predetermined pixel count, smaller than a standard pixel count set in the image data subsequent to the shutter release operation, is set in the image data prior to the shutter release operation. Process time for multi-shot operation is shortened in order to prevent photo opportunity missing. The pixel count in the image data subsequent to the shutter release operation remains unchanged so that the image data of high image quality is acquired.

Abstract: A constant amount of new portion of image data as still images is always stored on a memory in an image taking operation. In response to a shutter release operation, the image data stored on the memory is recorded onto a recording medium. A next new portion of the image data generated subsequent to the shutter release operation is then recorded on the recording medium to provide a photo opportunity slip prevention function. An operation is performed to modify a pixel count of the image data to be recorded in the photo opportunity slip prevention function. A user can multi-shot photograph with a pixel count of images captured within a unit time increased or with a higher priority placed on image quality.

Abstract: An information processing apparatus, an imaging apparatus and an information processing method, and a computer program are provided. An information processing apparatus includes: a state detecting part which detects physical fluctuations that are generated in association with a user carrying the information processing apparatus; and a control part which receives detection information of the state detecting part, and which shifts a state to a hot standby state in which a system startup process necessary prior to data processing in the information processing apparatus is completed, or which executes a process to continue the hot standby state, based on determination that the information processing apparatus is being carried by the user.

Abstract: An object of this invention is to efficiently transmit control information within a short time in a system for controlling a digital camera by a PC through a 1394 bus. To achieve this object, the PC transmits power-off inhibition control data through the 1394 bus before transmitting photographing mode control data to the digital camera. In accordance with this, the digital camera inhibits power-off.

Abstract: A flow sensor for detecting flow of fluid includes a thin film portion. The thin film portion has a heater and a detector for detecting temperature around the heater. The heater is made of semiconductor. This flow sensor has high sensor sensitivity with low energy consumption. Further, the sensor has high detection accuracy, and the thin film portion has high endurance. Furthermore, the flow sensor with a passivation film has appropriate thickness so as to improve strength of a thin film portion.

Abstract: A flow sensor for detecting flow of fluid includes a thin film portion. The thin film portion has a heater and a detector for detecting temperature around the heater. The heater is made of semiconductor. This flow sensor has high sensor sensitivity with low energy consumption. Further, the sensor has high detection accuracy, and the thin film portion has high endurance. Furthermore, the flow sensor with a passivation film has appropriate thickness so as to improve strength of a thin film portion.