Patents by Inventor Tomoyuki OHKUBO
Tomoyuki OHKUBO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11920077Abstract: No studies have been made regarding what kinds of refrigerants should be used in a refrigeration cycle device for a vehicle. An air conditioner (1) for a vehicle includes a refrigerant circuit (10) and a refrigerant that is sealed in the refrigerant circuit (10). The refrigerant circuit (10) includes a compressor (80), a first heat exchanger (85), which serves as a heat dissipater in a dehumidifying heating mode, an outside-air heat exchanger (82), a cooling control valve (87), and a second heat exchanger (86), which serves as an evaporator in the dehumidifying heating mode. The refrigerant is a refrigerant having a low GWP.Type: GrantFiled: July 16, 2019Date of Patent: March 5, 2024Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Eiji Kumakura, Kazuhiro Furusho, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Tatsumi Tsuchiya, Kenji Gobou, Hitomi Kuroki, Daisuke Karube, Tatsuya Takakuwa, Tetsushi Tsuda
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Patent number: 11912922Abstract: A showcase includes a refrigerant circuit and a refrigerant enclosed in the refrigerant circuit. The refrigerant circuit includes a compressor (121), a radiator (122), an expansion valve (123), and an evaporator (124). The refrigerant is a low-GWP refrigerant.Type: GrantFiled: July 16, 2019Date of Patent: February 27, 2024Assignee: DAIKIN INDUSTRIES, LTD.Inventors: Shinichi Fujinaka, Masaru Tanaka, Shun Ohkubo, Mitsushi Itano, Yuuki Yotsumoto, Akihito Mizuno, Tomoyuki Gotou, Yasufu Yamada, Hitomi Kuroki, Tatsumi Tsuchiya, Kenji Gobou, Daisuke Karube, Tatsuya Takakuwa
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Patent number: 10651049Abstract: A laser annealing device includes: a CW laser device configured to emit continuous wave laser light caused by continuous oscillation to preheat the amorphous silicon; a pulse laser device configured to emit the pulse laser light toward the preheated amorphous silicon; an optical system configured to guide the continuous wave laser light and the pulse laser light to the amorphous silicon; and a control unit configured to control an irradiation energy density of the continuous wave laser light so as to preheat the amorphous silicon to have a predetermined target temperature less than a melting point thereof, and configured to control at least one of a fluence and a number of pulses of the pulse laser light so as to crystallize the preheated amorphous silicon.Type: GrantFiled: August 6, 2018Date of Patent: May 12, 2020Assignees: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, Gigaphoton Inc.Inventors: Hiroshi Ikenoue, Tomoyuki Ohkubo, Osamu Wakabayashi
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Patent number: 10629438Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.Type: GrantFiled: April 24, 2019Date of Patent: April 21, 2020Assignees: Kyushu University, Gigaphoton Inc.Inventors: Tomoyuki Ohkubo, Hiroshi Ikenoue, Akihiro Ikeda, Tanemasa Asano, Osamu Wakabayashi
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Publication number: 20190252190Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.Type: ApplicationFiled: April 24, 2019Publication date: August 15, 2019Applicants: Kyushu University, Gigaphoton Inc.Inventors: Tomoyuki OHKUBO, Hiroshi IKENOUE, Akihiro IKEDA, Tanemasa ASANO, Osamu WAKABAYASHI
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Publication number: 20190252846Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.Type: ApplicationFiled: April 26, 2019Publication date: August 15, 2019Applicants: National University Corporation Nagaoka University of Technology, Gigaphoton Inc.Inventors: Weihua JIANG, Hiroshi UMEDA, Hakaru MIZOGUCHI, Takashi MATSUNAGA, Hiroaki TSUSHIMA, Tomoyuki OHKUBO
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Publication number: 20180350622Abstract: A laser annealing device includes: a CW laser device configured to emit continuous wave laser light caused by continuous oscillation to preheat the amorphous silicon; a pulse laser device configured to emit the pulse laser light toward the preheated amorphous silicon; an optical system configured to guide the continuous wave laser light and the pulse laser light to the amorphous silicon; and a control unit configured to control an irradiation energy density of the continuous wave laser light so as to preheat the amorphous silicon to have a predetermined target temperature less than a melting point thereof, and configured to control at least one of a fluence and a number of pulses of the pulse laser light so as to crystallize the preheated amorphous silicon.Type: ApplicationFiled: August 6, 2018Publication date: December 6, 2018Applicants: KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION, GIGAPHOTON INC.Inventors: Hiroshi IKENOUE, Tomoyuki OHKUBO, Osamu WAKABAYASHI
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Patent number: 10096966Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.Type: GrantFiled: October 11, 2016Date of Patent: October 9, 2018Assignee: Gigaphoton Inc.Inventors: Akira Suwa, Kouji Kakizaki, Hiroaki Tsushima, Tomoyuki Ohkubo, Hiroshi Umeda, Hisakazu Katsuumi
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Publication number: 20180019141Abstract: A laser system may serve as a light source of a laser annealing apparatus that irradiates a workpiece with a pulse laser beam. The laser system may include: a laser apparatus configured to generate the pulse laser beam; a time-domain pulse waveform changing apparatus configured to change time-domain pulse waveform of the pulse laser beam; and a controller configured to receive at least one parameter for generating the time-domain pulse waveform from the laser annealing apparatus and to control the time-domain pulse waveform changing apparatus.Type: ApplicationFiled: August 16, 2017Publication date: January 18, 2018Applicants: Kyushu University, Gigaphoton Inc.Inventors: Tomoyuki OHKUBO, Hiroshi IKENOUE, Kouji KAKIZAKI, Yasuhiro KAMBA, Osamu WAKABAYASHI
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Publication number: 20170365475Abstract: The laser doping apparatus may irradiate a predetermined region of a semiconductor material with a pulse laser beam to perform doping. The laser doping apparatus may include: a solution supplying system configured to supply dopant-containing solution to the predetermined region, and a laser system including at least one laser device configured to output the pulse laser beam to be transmitted by the dopant-containing solution, and a time-domain pulse waveform changing apparatus configured to control a time-domain pulse waveform of the pulse laser beam.Type: ApplicationFiled: August 16, 2017Publication date: December 21, 2017Applicants: Kyushu University, Gigaphoton Inc.Inventors: Tomoyuki OHKUBO, Hiroshi IKENOUE, Akihiro IKEDA, Tanemasa ASANO, Osamu WAKABAYASHI
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Publication number: 20170338618Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively.Type: ApplicationFiled: August 8, 2017Publication date: November 23, 2017Applicants: National University Corporation Nagaoka University of Technology, Gigaphoton Inc.Inventors: Weihua JIANG, Hiroshi UMEDA, Hakaru MIZOGUCHI, Takashi MATSUNAGA, Hiroaki TSUSHIMA, Tomoyuki OHKUBO
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Publication number: 20170033527Abstract: A gas laser device may include: a laser chamber containing laser gas; a first discharge electrode disposed in the laser chamber; a second discharge electrode disposed to face the first discharge electrode in the laser chamber; and a condenser including a polyimide dielectric and configured to supply power to between the first discharge electrode and the second discharge electrode.Type: ApplicationFiled: October 11, 2016Publication date: February 2, 2017Applicant: Gigaphoton Inc.Inventors: Akira SUWA, Kouji KAKIZAKI, Hiroaki TSUSHIMA, Tomoyuki OHKUBO, Hiroshi UMEDA, Hisakazu KATSUUMI