Patents by Inventor Tomoyuki Toda

Tomoyuki Toda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230340167
    Abstract: A polymerization catalyst composition contains a rare earth element carboxylate, a phosphate ester represented by the following general formula (1): (wherein Rs are each independently an alkyl group having 5 to 20 carbon atoms), and water.
    Type: Application
    Filed: August 27, 2021
    Publication date: October 26, 2023
    Applicants: DIC Corporation, National University Corporation Nagaoka University of Technology
    Inventors: Akinori Takahashi, Hiroaki Nakano, Katsuhiko Takenaka, Tomoyuki Toda
  • Patent number: 9150759
    Abstract: A chemical mechanical polishing composition for polishing silicon wafers is provided, containing: water, optionally, an abrasive; a cation according to formula (I); piperazine or a piperazine derivative according to formula (II); and, a quaternary ammonium compound; wherein the chemical mechanical polishing composition exhibits a pH of 9 to 12. Also provided are methods of making and using the chemical mechanical polishing composition.
    Type: Grant
    Filed: September 27, 2013
    Date of Patent: October 6, 2015
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc, Nitta Haas Incorporated
    Inventors: Yasuyuki Itai, Naresh Kumar Penta, Naoko Kawai, Hiroyuki Nakano, Shinichi Haba, Yoshiharu Ota, Takayuki Matsushita, Masashi Teramoto, Sakiko Nakashima, Tomoyuki Toda, Koichi Yoshida, Lee Melbourne Cook
  • Publication number: 20150093900
    Abstract: A chemical mechanical polishing composition for polishing silicon wafers is provided, containing: water, optionally, an abrasive; a cation according to formula (I); piperazine or a piperazine derivative according to formula (II); and, a quaternary ammonium compound; wherein the chemical mechanical polishing composition exhibits a pH of 9 to 12. Also provided are methods of making and using the chemical mechanical polishing composition.
    Type: Application
    Filed: September 27, 2013
    Publication date: April 2, 2015
    Inventors: Yasuyuki Itai, Naresh Kumar Penta, Naoko Kawai, Hiroyuki Nakano, Shinichi Haba, Yoshiharu Ota, Takayuki Matsushita, Masashi Teramoto, Sakiko Nakashima, Tomoyuki Toda, Koichi Yoshida, Lee Melbourne Cook
  • Publication number: 20130059991
    Abstract: A stereoselective olefin polymerization catalyst contains a complex represented by Formula (1): wherein n is 2 or 3; R1 and R2 are independently an optionally substituted alkyl group or a halogen atom; L is a ligand represented by CH2R3, a halogen atom, OR4, or NR5R6; R3 is a hydrogen atom, an aromatic group, or a trialkylsilyl group; R4 is a lower alkyl group having 1 to 6 carbon atoms; and R5 and R6 are independently a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms. A method for manufacturing stereoselective polyolefin, includes polymerizing an olefin in the presence of the catalyst. The present invention provides a catalyst which enables highly isoselective polymerization generating a polymer having significantly high molecular weight and also can prepare stereoselective polyolefin with a narrow dispersity (Mw/Mn) or with a sharp molecular weight distribution, and provides a method for manufacturing stereoselective polyolefin with the catalyst.
    Type: Application
    Filed: February 10, 2011
    Publication date: March 7, 2013
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY
    Inventors: Akihiko Ishii, Norio Nakata, Tomoyuki Toda, Tsukasa Matsuo
  • Publication number: 20130035462
    Abstract: A catalyst for homopolymerization of ethylene or copolymerization of ethylene and an ?-olefin comprises a complex represented by Formula (1): wherein n is 2 or 3; R1 and R2 are independently an optionally substituted alkyl group or a halogen atom; L is a ligand represented by CH2R3, a halogen atom, OR4, or NR5R6; R3 is a hydrogen atom, an aromatic group, or a trialkylsilyl group; R4 is a lower alkyl group having 1 to 6 carbon atoms; and R5 and R6 are independently a hydrogen atom or a lower alkyl group having 1 to 6 carbon atoms. A method for manufacturing an ethylenic polymer involves homopolymerization of ethylene or copolymerization of ethylene and an ?-olefin in the presence of the catalyst. The present invention provides a highly active tetradentate post-metallocene complex for ethylenic polymerization and a method for manufacturing the ethylenic polymer using the catalyst containing the complex.
    Type: Application
    Filed: February 10, 2011
    Publication date: February 7, 2013
    Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED, NATIONAL UNIVERSITY CORPORATION SAITAMA UNIVERSITY
    Inventors: Akihiko Ishi, Norio Nakata, Tomoyuki Toda