Patents by Inventor Tomoyuki Yuba

Tomoyuki Yuba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240067822
    Abstract: A problem to be solved by the present invention is to provide a resin composition suitable for spinning, particularly electrospinning, and in addition, to provide a heat-resistant non-woven fabric having excellent strength and a method of producing the same. A main object of the present invention is: to provide a resin composition including: (a) at least one heat-resistant resin or a precursor thereof, the heat-resistant resin being selected from the group consisting of a heat-resistant resin containing a nitrogen atom and a heat-resistant resin containing, in the main chain, a group selected from the group consisting of ether group, ketone group, sulfone group, and sulfide group; (b) a solvent; and (c) a surfactant having a fluoroalkyl group; and to form a non-woven fabric using the resin composition by an electrospinning method.
    Type: Application
    Filed: October 27, 2021
    Publication date: February 29, 2024
    Applicant: Toray Industries, Inc.
    Inventors: Shuhei Tanabe, Tomoyuki Yuba, Natsuko Tobata
  • Patent number: 11333976
    Abstract: A resin having a small linear thermal expansion coefficient and a low absorbance is provided.
    Type: Grant
    Filed: January 25, 2016
    Date of Patent: May 17, 2022
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tomoyuki Yuba, Yuki Masuda, Jiake Jin, Ping Li
  • Patent number: 10703850
    Abstract: A resin composition contains: (a) a resin which constitutes a polymer having a structure represented by any one of the following general formulae (1) to (3) below and/or a copolymer having the structure; and (b) a basic compound, wherein R1 is a C4-C30 organic group, R2 is a divalent C4-C30 organic group, X is a sulfonic group, hydroxy group, or carboxy group, p is 1 to 4, and n is 2 to 100,000; wherein R3 is a C4-C30 organic group, R4 is a divalent C4-C30 organic group, Y is a sulfonic group, hydroxy group, or carboxy group, q is 1 to 4, and m is 2 to 100,000; wherein R5 represents a C4-C30 organic group, R6 is a divalent C4-C30 organic group, Z is a sulfonic group, hydroxy group, or carboxy group, r is 1 to 4, and l is 2 to 100,000.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: July 7, 2020
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Natsuko Chayama, Tomoyuki Yuba, Yuma Sugisaki
  • Patent number: 10669377
    Abstract: The present invention provides a polyimide solution which does not require a ring-closing process at a high temperature for obtaining a heat-resistant polyimide non-woven fabric and which is hardly affected by atmosphere humidity in fiber production by electrospinning, so that a fiber with a stable diameter can be obtained in any circumstance. A polyimide solution including: (a) a resin containing 50 mol % or more, based on the total amount of the resin, of a structural unit represented by the general formula (1); and (b) a solvent.
    Type: Grant
    Filed: October 2, 2015
    Date of Patent: June 2, 2020
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Natsuko Chayama, Masao Tomikawa, Tomoyuki Yuba
  • Publication number: 20200131314
    Abstract: An object of the present invention is to provide a resin composition containing: (a) a resin containing at least one of a polyimide, a polyamideimide, and a polybenzoxazole, having at least one acidic functional group among a phenolic hydroxyl group, a carboxyl group, and a sulfonic acid group in a side chain, and having an acidic functional group concentration of 3.4 mol/kg or more; and (b) a basic compound. The resin composition has high long-term stability in the form of an aqueous solution while having high strength and high modulus, has good dispersibility of a filler, and has a good binding property as a binder.
    Type: Application
    Filed: June 26, 2018
    Publication date: April 30, 2020
    Applicant: TORAY Industries, Inc.
    Inventors: Natsuko CHAYAMA, Tomoyuki YUBA
  • Publication number: 20200131366
    Abstract: A problem addressed by the present invention is to provide a resin out of which a heat-resistant non-woven fabric having a fine fiber diameter can be made by an electrospinning method.
    Type: Application
    Filed: June 14, 2018
    Publication date: April 30, 2020
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Natsuko CHAYAMA, Tomoyuki YUBA
  • Patent number: 10418521
    Abstract: A method of producing a patterned substrate includes the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: September 17, 2019
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Hideyuki Kobayashi, Tomoyuki Yuba
  • Publication number: 20180371146
    Abstract: An object of the present invention is to provide a resin which can be used as an aqueous binder and has sufficient binding properties.
    Type: Application
    Filed: December 19, 2016
    Publication date: December 27, 2018
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Natsuko CHAYAMA, Tomoyuki YUBA, Yuma SUGISAKI
  • Publication number: 20180309022
    Abstract: A method of producing a patterned substrate includes the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.
    Type: Application
    Filed: October 27, 2016
    Publication date: October 25, 2018
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Hideyuki Kobayashi, Tomoyuki Yuba
  • Patent number: 9991510
    Abstract: The present invention provides a negative electrode material for a lithium ion secondary battery, a composite negative electrode material for a lithium ion secondary battery, a resin composition for a lithium ion secondary battery negative electrode, and a negative electrode for a lithium ion secondary electrode, which may provide high charge/discharge capacity, and excellent initial charge-discharge characteristics and capacity retention.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: June 5, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tetsuo Yamashita, Natsuko Chayama, Tomoyuki Yuba, Eiichiro Tamaki, Yasuo Kubota, Toshiyuki Nonaka
  • Publication number: 20180011402
    Abstract: A resin having a small linear thermal expansion coefficient and a low absorbance is provided.
    Type: Application
    Filed: January 25, 2016
    Publication date: January 11, 2018
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tomoyuki YUBA, Yuki MASUDA, Jiake JIN, Ping LI
  • Patent number: 9865879
    Abstract: The present invention is directed to a binder for a lithium ion battery electrode, comprising a polyimide precursor having a tetracarboxylic acid residue and a diamine residue and/or a polyimide, the polyimide precursor having a residue of a tetracarboxylic dianhydride selected from those represented by the following general formulas (1) and (2) as the tetracarboxylic acid residue, and a residue of a diamine selected from those represented by the following general formulas (3) and (4) as the diamine residue, the content of the acid residue being from 0.90 to 0.95 moles based on 1 mole of the diamine residue.
    Type: Grant
    Filed: November 28, 2011
    Date of Patent: January 9, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Masao Tomikawa, Tomoyuki Yuba, Natsuko Chayama
  • Publication number: 20170342214
    Abstract: The present invention provides a polyimide solution which does not require a ring-closing process at a high temperature for obtaining a heat-resistant polyimide non-woven fabric and which is hardly affected by atmosphere humidity in fiber production by electrospinning, so that a fiber with a stable diameter can be obtained in any circumstance. A polyimide solution including: (a) a resin containing 50 mol % or more, based on the total amount of the resin, of a structural unit represented by the general formula (1); and (b) a solvent.
    Type: Application
    Filed: October 2, 2015
    Publication date: November 30, 2017
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Natsuko CHAYAMA, Masao TOMIKAWA, Tomoyuki YUBA
  • Patent number: 9188860
    Abstract: Disclosed is a method for producing polyamide, wherein a diimidazolide compound represented by the general formula (1) shown below is reacted with a diamine compound represented by the general formula (2) shown below. The present invention provides a method for producing a chlorine-free high molecular weight alkali-soluble polyamide by simple process.
    Type: Grant
    Filed: September 4, 2008
    Date of Patent: November 17, 2015
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tomoyuki Yuba, Masao Tomikawa
  • Publication number: 20150325848
    Abstract: The present invention provides a negative electrode material for a lithium ion secondary battery, a composite negative electrode material for a lithium ion secondary battery, a resin composition for a lithium ion secondary battery negative electrode, and a negative electrode for a lithium ion secondary electrode, which may provide high charge/discharge capacity, and excellent initial charge-discharge characteristics and capacity retention.
    Type: Application
    Filed: June 28, 2013
    Publication date: November 12, 2015
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tetsuo Yamashita, Natsuko Chayama, Tomoyuki Yuba, Eiichiro Tamaki, Yasuo Kubota, Toshiyuki Nonaka
  • Publication number: 20150017534
    Abstract: Disclosed is a resin composition for positive electrodes of lithium ion cells, which imparts strong adhesiveness and electrolyte injectability and shows good discharge and charge characteristics and input-output characteristics with smaller amount of a binder. The resin composition for positive electrodes of lithium ion cells is a resin composition for positive electrodes of lithium ion cells, which comprises a polyimide precursor whose average thermal linear expansion coefficient in the range of 20° C. to 200° C. after being imidized is 3 to 50 ppm, and/or a polyimide whose average thermal linear expansion coefficient in the range of 20° C. to 200° C. is 3 to 50 ppm, and a positive electrode active compound, wherein the positive electrode active compound is one obtained by coating the surface of a composite oxide containing lithium with a lithium ion conductive material.
    Type: Application
    Filed: January 30, 2013
    Publication date: January 15, 2015
    Inventors: Takuhiro Miyuki, Yasue Okuyama, Tetsuo Sakai, Tomoyuki Yuba, Natsuko Chayama, Masao Tomikawa
  • Publication number: 20130260020
    Abstract: The present invention is directed to a binder for a lithium ion battery electrode, comprising a polyimide precursor having a tetracarboxylic acid residue and a diamine residue and/or a polyimide, the polyimide precursor having a residue of a tetracarboxylic dianhydride selected from those represented by the following general formulas (1) and (2) as the tetracarboxylic acid residue, and a residue of a diamine selected from those represented by the following general formulas (3) and (4) as the diamine residue, the content of the acid residue being from 0.90 to 0.95 moles based on 1 mole of the diamine residue.
    Type: Application
    Filed: November 28, 2011
    Publication date: October 3, 2013
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Masao Tomikawa, Tomoyuki Yuba, Natsuko Chayama
  • Patent number: 7977028
    Abstract: The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: July 12, 2011
    Assignee: Toray Industries, Inc.
    Inventors: Tomoyuki Yuba, Yoji Fujita, Masao Tomikawa
  • Publication number: 20100285404
    Abstract: Disclosed is a method for producing polyamide, wherein a diimidazolide compound represented by the general formula (1) shown below is reacted with a diamine compound represented by the general formula (2) shown below. The present invention provides a method for producing a chlorine-free high molecular weight alkali-soluble polyamide by simple process.
    Type: Application
    Filed: September 4, 2008
    Publication date: November 11, 2010
    Inventors: Tomoyuki Yuba, Masao Tomikawa
  • Publication number: 20090123867
    Abstract: The present invention provides a photosensitive resin composition comprising (a) an alkali-soluble resin, (b) a silicon compound having a secondary aromatic amino group and an alkoxy group, and (c) at least one selected from a photopolymerization initiator, a photo acid generator and a photo base generator. According to the present invention, it is possible to obtain a photosensitive resin composition which remarkably enhances the adhesion property with a substrate after curing without deteriorating storage stability of a solution, and does not cause peeling of a fine pattern even upon development.
    Type: Application
    Filed: April 18, 2006
    Publication date: May 14, 2009
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Tomoyuki Yuba, Yoji Fujita, Masao Tomikawa