Patents by Inventor Ton Aantjes

Ton Aantjes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 7113262
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.
    Type: Grant
    Filed: June 22, 2004
    Date of Patent: September 26, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Tjarko Adriaan Rudolf Van Empel, Aschwin Lodewijk Hendricus Johannes Van Meer, Koen Jacobus Johannes Maria Zaal, Ton Aantjes
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20050024620
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.
    Type: Application
    Filed: June 22, 2004
    Publication date: February 3, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Tjarko Van Empel, Aschwin Lodewijk Van Meer, Koen Jacobus Zaal, Ton Aantjes