Patents by Inventor Ton De Groot

Ton De Groot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100315610
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Application
    Filed: June 22, 2010
    Publication date: December 16, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everadus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7764356
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: July 27, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090033891
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Application
    Filed: September 26, 2008
    Publication date: February 5, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Johannes Hultermans, Ton DE Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7446850
    Abstract: An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
    Type: Grant
    Filed: December 3, 2004
    Date of Patent: November 4, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Johannes Hultermans, Ton De Groot, Jacobus Johannus Leonardus Hendricus Verspay, Gerardus Everardus Marie Hannen
  • Lithographic apparatus and device manufacturing method
    Patent number: 6815699
    Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
    Type: Grant
    Filed: December 9, 2002
    Date of Patent: November 9, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Ton De Groot
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030132400
    Abstract: A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
    Type: Application
    Filed: December 9, 2002
    Publication date: July 17, 2003
    Applicant: ASML NETHERLANDS, B.V.
    Inventors: Hernes Jacobs, Harmen Klaas Van Der Schoot, Petrus Matthijs Henricus Vosters, Ton De Groot