Abstract: A display substrate and a related device, and belongs to the field of display technology. The display substrate includes first subpixels, a second subpixels and third subpixels. In a first direction, the first subpixels and the third subpixels are arranged alternately to form a plurality of first subpixel rows, the second subpixels form a plurality of second subpixel rows, the first subpixel rows and the second subpixel rows are arranged alternately in a second direction, lines connecting centers of two first subpixels and two third subpixels in two adjacent rows and two adjacent columns form a first virtual quadrilateral, the two first subpixels are arranged at two opposite vertices of the first virtual quadrilateral, the first virtual quadrilateral includes an interior angle a not equal to 90°, and the second subpixel is arranged within the first virtual quadrilateral.

Abstract: A display substrate and related devices are provided. The display substrate includes a plurality of first sub-pixels, second sub-pixels and third sub-pixels. In a first direction, the first sub-pixels and the third sub-pixels are arranged alternately to form a plurality of first sub-pixel rows, the second sub-pixels form a plurality of second sub-pixel rows, the first sub-pixel rows and the second sub-pixel rows are arranged alternately in a second direction, connection lines of center points of two first sub-pixels and two third sub-pixels form a first virtual quadrilateral, the two first sub-pixels are located at two vertex angles of the first virtual quadrilateral which are opposite to each other, one second sub-pixel is located within the first virtual quadrilateral, and the first virtual quadrilateral includes two interior angles each being equal to 90° and two interior angles each being not equal to 90°.

Abstract: A mask sheet for evaporation on a substrate is provided, and the mask sheet includes: a plurality of first ribs extending in a first direction; and a plurality of second ribs extending in a second direction intersecting the first direction, the mask sheet includes a first region for an evaporation of a first exposure region of the substrate and a second region for an evaporation of a second exposure region of the substrate, a third rib is provided at a boundary of the first region and the second region so as to shield an overlapping exposure region between the first exposure region and the second exposure region, the third rib includes a first sub-rib, a second sub-rib, and a spacer for separating the first sub-rib and the second sub-rib, and the third rib has a width greater than that of the first rib.

Abstract: Embodiments described herein provide dynamic blocking, a decoding algorithm which enables large-scale pretrained language models to generate high-quality paraphrases in an un-supervised setting. Specifically, in order to obtain an alternative surface form, when the language model emits a token that is present in the source sequence, the language model is prevented from generating the next token that is the same as the subsequent source token in the source sequence at the next time step. In this way, the language model is forced to generate a paraphrased sequence of the input source sequence, but with mostly different wording.

Abstract: A mask, a manufacturing method thereof, a fine metal mask, a mask device and a use method thereof are provided. The mask includes at least one opening region and a shielding part surrounding and defining the at least one opening region. The shielding part includes a main part and at least one protrusion, in each opening region, the protrusion is protruded towards the opening region on a side of the main part facing the opening region; the main part includes an edge disposed on a side of the protrusion opposite to the opening region and with an extension direction being a same with an extension direction of the protrusion, he protrusion and a portion of the main part disposed between the edge and the protrusion includes a thinning portion with a thickness being less than a thickness of other portions of the shielding part.

Abstract: The present disclosure relates to a mask, a mask device and a mask design method. The mask includes: a pattern area, wherein the pattern area includes a plurality of openings, among which adjacent openings are spaced apart by a first rib, and at least one of the plurality of openings has a non-straight side, two first straight sides intersecting with the non-straight side, and a second straight side opposite to the non-straight side and intersecting with the first straight sides; and a second rib located at an edge of the pattern area, wherein the second rib is provided with a cutout for compensating for stretch deformation of the non-straight side, extending lines of the two first straight sides extending toward the second rib along a first direction intersect with the second rib to obtain a first area, and the cutout is located at least within the first area.

Abstract: Embodiments described herein adopts a k nearest neighbor (kNN) mechanism over a model's hidden representations to identify training examples closest to a given test example. Specifically, a training set of sequences and a test sequence are received, each of which is mapped to a respective hidden representation vector using a base model. A set of indices for each sequence index that minimizes a distance between the respective hidden state vector and a test hidden state vector is then determined A weighted k-nearest neighbor probability score can then be computed from the set of indices to generate a probability distribution over labels for the test sequence.

Abstract: Embodiments described herein provide a provide a fully unsupervised model for text compression. Specifically, the unsupervised model is configured to identify an optimal deletion path for each input sequence of texts (e.g., a sentence) and words from the input sequence are gradually deleted along the deletion path. To identify the optimal deletion path, the unsupervised model may adopt a pretrained bidirectional language model (BERT) to score each candidate deletion based on the average perplexity of the resulting sentence and performs a simple greedy look-ahead tree search to select the best deletion for each step.