Abstract: The instant disclosure relates to a direction-adjustable jig, which includes a base, a sliding member, and a hinge member. The base is topped with a platform having a pair of guide rails. The two guide rails extend in opposite directions and are parallel to each other. The sliding member is disposed on the platform and capable of reciprocating motion. The hinge member is disposed on the platform and pivotally connected to one end of the sliding member. The hinge member is rotatable above the base. The hinge member further has a pair of protruding guide teeth. The guide teeth are perpendicular to each other and insertable into the guide rails. Through the motion of the sliding member on the platform, the guide teeth of the hinge member can be inserted into respective guide rails, such that the hinge member can rotate above the base and change its direction.

Abstract: The instant disclosure relates to a direction-adjustable jig capable of translating an artifact between two mutually perpendicular planes in a three-dimensional space. The jig includes a base, a sliding member, and a hinge member. The base has a pair of side walls each having a first guiding portion. The first guiding portion has a lower guiding portion and an upper guiding portion in communication with each other. The lower guiding portion and the upper guiding portion are formed at different height vertically. The sliding member is disposed reciprocatingly on the base and in between the side walls. The hinge member is pivotally connected to the sliding member and has a pair of second guiding portions for engaging the first guiding portions. The reciprocating motion of the sliding member allows the hinge member to rotate above the base and change its direction.

Abstract: The instant disclosure relates to a direction-adjustable jig, which includes a base, a sliding member, and a hinge member. The base is topped with a platform having a pair of guide rails. The two guide rails extend in opposite directions and are parallel to each other. The sliding member is disposed on the platform and capable of reciprocating motion. The hinge member is disposed on the platform and pivotally connected to one end of the sliding member. The hinge member is rotatable above the base. The hinge member further has a pair of protruding guide teeth. The guide teeth are perpendicular to each other and insertable into the guide rails. Through the motion of the sliding member on the platform, the guide teeth of the hinge member can be inserted into respective guide rails, such that the hinge member can rotate above the base and change its direction.

Abstract: A display device includes a window panel including a display area and a non-display area including a first non-display area and a second non-display area and a display panel including a pixel area generating an image to be displayed in the display area and a non-pixel area surrounding the pixel area. The window panel includes a window glass, decoration printed layers disposed on the window glass in the first and second non-display areas, and a light-blocking printed layer disposed on the window glass and the decoration printed layers to cover the decoration printed layers in the first non-display area and having a black color. A boundary line corresponding to a boundary between the display area and the non-display area is an inner surface of the light-blocking printed layer and the display area corresponds to the pixel area at the boundary line.

Abstract: An etching system. An etching chamber includes an exhaust port. A gas input pipe is connected to the etching chamber, inputting etching process gas thereinto. A top RF electrode is disposed above the etching chamber. A bottom RF electrode is disposed under the etching chamber and opposite the top RF electrode. The etching process gas is transformed into plasma by operation of the top and bottom RF electrodes. An exhaust pump is connected to the exhaust port, expelling the plasma from the etching chamber. A base is disposed in the etching chamber. A focus ring is disposed on the base, accommodating a wafer. The wafer is etched by the plasma. A barricade is disposed on the focus ring and corresponds to the exhaust port, regulating the plasma flowing through the wafer.

Abstract: An etching system. An etching chamber includes an exhaust port. A gas input pipe is connected to the etching chamber, inputting etching process gas thereinto. A top RF electrode is disposed above the etching chamber. A bottom RF electrode is disposed under the etching chamber and opposite the top RF electrode. The etching process gas is transformed into plasma by operation of the top and bottom RF electrodes. An exhaust pump is connected to the exhaust port, expelling the plasma from the etching chamber. A base is disposed in the etching chamber. A focus ring is disposed on the base, accommodating a wafer. The wafer is etched by the plasma. A barricade is disposed on the focus ring and corresponds to the exhaust port, regulating the plasma flowing through the wafer.

Abstract: An etching system. An etching chamber includes an exhaust port. A gas input pipe is connected to the etching chamber, inputting etching process gas thereinto. A top RF electrode is disposed above the etching chamber. A bottom RF electrode is disposed under the etching chamber and opposite the top RF electrode. The etching process gas is transformed into plasma by operation of the top and bottom RF electrodes. An exhaust pump is connected to the exhaust port, expelling the plasma from the etching chamber. A base is disposed in the etching chamber. A focus ring is disposed on the base, accommodating a wafer. The wafer is etched by the plasma. A barricade is disposed on the focus ring and corresponds to the exhaust port, regulating the plasma flowing through the wafer.

Abstract: An etching system. An etching chamber includes an exhaust port. A gas input pipe is connected to the etching chamber, inputting etching process gas thereinto. A top RF electrode is disposed above the etching chamber. A bottom RF electrode is disposed under the etching chamber and opposite the top RF electrode. The etching process gas is transformed into plasma by operation of the top and bottom RF electrodes. An exhaust pump is connected to the exhaust port, expelling the plasma from the etching chamber. A base is disposed in the etching chamber. A focus ring is disposed on the base, accommodating a wafer. The wafer is etched by the plasma. A barricade is disposed on the focus ring and corresponds to the exhaust port, regulating the plasma flowing through the wafer.

Abstract: This present invention relates to an installation structure of the indoor floating decoration floorboards and the installation method thereof, and the installation structure comprises a floor main body by joining several floorboards together, a telescopic space which is equipped with mechanical elastic telescopic parts links astride the floor main body and the adjoining wall, and the parts are existed between the floor main body and the adjoining wall, and the method comprises joining the floorboards one by one to form the floor main body according to the shape and size of the floor of one room, pre-reserving a telescopic space between the floor main body and the adjoining wall, and fixing astride parts between the floor main body and the adjoining wall. The present invention can avoid various crevices, so the floor is firm and durable, and can bring high quality enjoyment to people's home life and office work.