Abstract: A system for precision displacement measurement based on a self-traceable grating interference includes a coherent light source, a photoelectric detection module, a self-traceable grating and a signal processing module. The self-traceable grating is arranged on a to-be-measured displacement motion platform. The coherent light source, the photoelectric detection module and the signal processing module are sequentially connected. Laser generated by the coherent light source propagates through the photoelectric detection module and is incident on the self-traceable grating, diffracts with the self-traceable grating, returns to the photoelectric detection module to continue propagating and enters the signal processing module. The signal processing module collects an interference signal to obtain a motion displacement and a motion direction.

Abstract: A system for precision displacement measurement based on a self-traceable grating interference includes a coherent light source, a photoelectric detection module, a self-traceable grating and a signal processing module. The self-traceable grating is arranged on a to-be-measured displacement motion platform. The coherent light source, the photoelectric detection module and the signal processing module are sequentially connected. Laser generated by the coherent light source propagates through the photoelectric detection module and is incident on the self-traceable grating, diffracts with the self-traceable grating, returns to the photoelectric detection module to continue propagating and enters the signal processing module. The signal processing module collects an interference signal to obtain a motion displacement and a motion direction.

Abstract: A method for manufacturing grating reference materials having a self-traceability includes: acquiring a mask substrate including a window region and a non-window region; fabricating, a self-traceability mask on the mask substrate by using a laser-focused atomic deposition technique; acquiring a photoresist sample including an extreme ultraviolet photoresist and a second substrate; exposing the extreme ultraviolet photoresist by combining the self-traceability mask with the soft x-ray interference lithography, and then performing a development process after exposing to obtain a photoresist grating structure; and transferring the photoresist grating structure to the second substrate to obtain the grating reference materials.