Patents by Inventor Tonghui Wang

Tonghui Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240072112
    Abstract: The present disclosure provides a manufacturing method of a semiconductor structure and a semiconductor structure and relates to the technical field of semiconductors. The manufacturing method of a semiconductor structure includes: providing a substrate, where the substrate includes a first region and a second region, the first region includes a plurality of independent first active regions, adjacent two of the first active regions are isolated by a first trench, and an isolating lamination layer is formed in the first trench; forming a barrier layer covering a top surface of the second region; forming an epitaxial layer covering a top surface of the first active region; and etching off the barrier layer and part of the isolating lamination layer in the first region, where joints of top surfaces of layers in the isolating lamination layer retained in the first region are basically consistent in height.
    Type: Application
    Filed: August 2, 2023
    Publication date: February 29, 2024
    Inventor: Tonghui WANG
  • Publication number: 20230249173
    Abstract: The present subject matter relates to systems and methods for the formulation of inks from stock solutions in which a liquid handler is configured to draw samples from a plurality of solution components and mix the components together to create one or more ink formulations, and a dispensing robot is configured to transfer the one or more ink formulations to a common substrate to form one or more material samples or a coating element in communication with the liquid handler is configured to transfer the one or more ink formulations to a common substrate to form one or more material samples. A controller in communication with each of the liquid handler and the dispensing robot can be configured to coordinate the creation and transfer of the one or more ink formulations. In addition, the one or more material samples can be analyzed using one or more characterization instrument configured to characterize the material samples on the common substrate.
    Type: Application
    Filed: February 6, 2023
    Publication date: August 10, 2023
    Inventors: Aram Amassian, Tonghui Wang, Jacob Mauthe
  • Publication number: 20220227712
    Abstract: A cholinesterase inhibitor polymorph, wherein specifically disclosed are a octahydroaminoacridine succinate polymorph, a corresponding crystal composition and pharmaceutical composition, and applications thereof. The compound octahydroaminoacridine succinate is used for screening and studying polymorphs, and the discovered polymorphs are appraised and evaluated; crystal forms having better physical and chemical properties are determined for subsequent development and study, and crystal forms having good stability and an excellent therapeutic effect are obtained.
    Type: Application
    Filed: January 21, 2020
    Publication date: July 21, 2022
    Applicants: CHANGCHUN HUAYUAN HIGH-SCIENCE AND TECHNOLOGY CO., LTD., JIANGSU SHENERYANG HIGH-SCIENCE AND TECHNOLOGY CO., LTD.
    Inventors: Tonghui WANG, Ju ZHANG, Lihua WANG, Depu WANG, Yaxin ZHANG, Qinghua YU, Qi ZHANG, Mingze LI
  • Patent number: 11271012
    Abstract: The disclosure provides a FDSOI semiconductor structure and methods to fabricate it. The structure includes source and drain regions and gates respectively in an NMOS area and a PMOS area, a first oxide film layer formed on sidewalls of the source and drain contact holes, a metal layer deposited to fill the source and drain contact holes, a second oxide film layer formed on sidewalls of the gate contact holes, a metal layer deposited to fill the gate contact holes. Further the method includes growing an oxide film layer on the sidewalls of the contact holes between completing the contact etching process and filling the contact holes with the metal layer, followed by removing with etching the oxide film layer from the gates. Sizes of contact holes can be adjusted thereby.
    Type: Grant
    Filed: November 3, 2020
    Date of Patent: March 8, 2022
    Assignee: SHANGHAI HUALI INTEGRATED CIRCUIT CORPORATION
    Inventors: Tonghui Wang, Changfeng Wang, Duanquan Liao
  • Publication number: 20220068971
    Abstract: The disclosure provides a FDSOI semiconductor structure and methods to fabricate it. The structure includes source and drain regions and gates respectively in an NMOS area and a PMOS area, a first oxide film layer formed on sidewalls of the source and drain contact holes, a metal layer deposited to fill the source and drain contact holes, a second oxide film layer formed on sidewalls of the gate contact holes, a metal layer deposited to fill the gate contact holes. Further the method includes growing an oxide film layer on the sidewalls of the contact holes between completing the contact etching process and filling the contact holes with the metal layer, followed by removing with etching the oxide film layer from the gates. Sizes of contact holes can be adjusted thereby.
    Type: Application
    Filed: November 3, 2020
    Publication date: March 3, 2022
    Inventors: Tonghui WANG, Changfeng WANG, Duanquan LIAO
  • Patent number: 8722701
    Abstract: Disclosed are 1,2,3,4,5,6,7,8-octohydro-9-phenylacetamidoacridine and the salt thereof, as well as the preparation method and medical use thereof. The compound can be useful for the preparation of medicaments for treating cardiovascular diseases, especially arrhythmia.
    Type: Grant
    Filed: September 2, 2011
    Date of Patent: May 13, 2014
    Assignees: Changchun Huayang High Technology, Inc., Jiangsu Shen ER Yang High Technology Co., Ltd.
    Inventor: Tonghui Wang
  • Publication number: 20130158065
    Abstract: Disclosed are 1,2,3,4,5,6,7,8-octohydro-9-phenylacetamidoacridine and the salt thereof, as well as the preparation method and medical use thereof. The compound can be useful for the preparation of medicaments for treating cardiovascular diseases, especially arrhythmia.
    Type: Application
    Filed: September 2, 2011
    Publication date: June 20, 2013
    Applicants: JIANGSU SHEN ER YANG HIGH TECHNOLOGY CO., LTD, CHANGCHUN HUAYANG HIGH TECHNOLOGY CO., LTD
    Inventor: Tonghui Wang