Patents by Inventor Tony Komasa
Tony Komasa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9627244Abstract: Apparatuses and methods for supporting a workpiece such as a semiconductor wafer. A support system is configured to support the workpiece while allowing thermally-induced motion of the workpiece, which may include thermal bowing or thermal bending. The system may include a support member having a moveable engagement portion engageable with the workpiece, the engagement portion being moveable to allow the thermally-induced motion of the workpiece while supporting the workpiece. The moveable engagement portion may include a plurality of moveable engagement portions of a plurality of respective support members, which may be resiliently engageable with the workpiece. The support members may include flexible support members each having an unconstrained portion and a constrained portion, and the moveable engagement portions may include the unconstrained portions.Type: GrantFiled: December 19, 2003Date of Patent: April 18, 2017Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
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Patent number: 8434341Abstract: An apparatus for supporting a semiconductor workpiece includes a heating system configured to cause thermally-induced motion of the semiconductor workpiece by heating a surface of the workpiece relative to a bulk of the workpiece. The thermally-induced motion includes vertical motion of an outer edge region of the workpiece and a center of the workpiece relative to each other. The apparatus further includes a support system configured to allow the thermally-induced motion including the vertical motion of the outer edge region of the workpiece and the center of the workpiece relative to each other while supporting the workpiece.Type: GrantFiled: January 27, 2012Date of Patent: May 7, 2013Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
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Patent number: 8384274Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: GrantFiled: July 13, 2010Date of Patent: February 26, 2013Assignee: Mattson Technology, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
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Publication number: 20120118867Abstract: An apparatus for supporting a semiconductor workpiece includes a heating system configured to cause thermally-induced motion of the semiconductor workpiece by heating a surface of the workpiece relative to a bulk of the workpiece. The thermally-induced motion includes vertical motion of an outer edge region of the workpiece and a center of the workpiece relative to each other. The apparatus further includes a support system configured to allow the thermally-induced motion including the vertical motion of the outer edge region of the workpiece and the center of the workpiece relative to each other while supporting the workpiece.Type: ApplicationFiled: January 27, 2012Publication date: May 17, 2012Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere
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Publication number: 20100276611Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: ApplicationFiled: July 13, 2010Publication date: November 4, 2010Applicant: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
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Patent number: 7781947Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: GrantFiled: February 12, 2004Date of Patent: August 24, 2010Assignee: Mattson Technology Canada, Inc.Inventors: David Malcolm Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
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Publication number: 20050179354Abstract: An apparatus for producing electromagnetic radiation includes a flow generator configured to generate a flow of liquid along an inside surface of an envelope, first and second electrodes configured to generate an electrical arc within the envelope to produce the electromagnetic radiation, and an exhaust chamber extending outwardly beyond one of the electrodes, configured to accommodate a portion of the flow of liquid. In another aspect, the flow generator is electrically insulated. In another aspect, the electrodes are configured to generate an electrical discharge pulse to produce an irradiance flash, and the apparatus includes a removal device configured to remove particulate contamination from the liquid, the particulate contamination being released during the flash and being different than that released by the electrodes during continuous operation.Type: ApplicationFiled: February 12, 2004Publication date: August 18, 2005Inventors: David Camm, Chee Chin, Rick Doolan, Tony Hewett, Arne Kjorvel, Tony Komasa, Mike Krasnich, Steve McCoy, Joseph Reyers, Igor Rudic, Ludmila Shepelev, Greg Stuart, Tilman Thrum, Alex Viel
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Publication number: 20040178553Abstract: Apparatuses and methods for supporting a workpiece such as a semiconductor wafer. A support system is configured to support the workpiece while allowing thermally-induced motion of the workpiece, which may include thermal bowing or thermal bending. The system may include a support member having a moveable engagement portion engageable with the workpiece, the engagement portion being moveable to allow the thermally-induced motion of the workpiece while supporting the workpiece. The moveable engagement portion may include a plurality of moveable engagement portions of a plurality of respective support members, which may be resiliently engageable with the workpiece. The support members may include flexible support members each having an unconstrained portion and a constrained portion, and the moveable engagement portions may include the unconstrained portions.Type: ApplicationFiled: December 19, 2003Publication date: September 16, 2004Inventors: David Malcolm Camm, Guillaume Sempere, Ljubomir Kaludjercic, Gregory Stuart, Mladen Bumbulovic, Tim Tran, Sergiy Dets, Tony Komasa, Marc Rudolph, Joseph Cibere