Abstract: Method and apparatus for processing semiconductor wafers in a vacuum chamber in which a plurality of wafers are stored in a cassette outside the chamber, wafers are transferred between the cassette and a staging station inside the chamber with a transfer mechanism located outside the chamber, and wafers are transferred between the staging station and a processing station within the chamber with a transfer mechanism located inside the chamber. In some embodiments, the staging station moves back and forth between the processing chamber and a load lock, with a closure connected to the staging station sealing off the processing chamber when the staging station is in the load lock and wafers are being transferred between the staging station and the cassette.

Abstract: Plasma reactor having a generally cylindrical reaction chamber which is substantially greater in diameter than in height, a generally cylindrical waveguide which is aligned axially with the reaction chamber, and a window which separates the waveguide from the reaction chamber and permits microwave energy to pass from the waveguide to chamber to ionize gas and form a plasma in the chamber. In some embodiments, the microwave energy is applied initially in pulses and thereafter as a continuous wave in order to avoid the need for retuning upon ignition of the plasma, and in others the need for retuning is avoided by the use of fins which lock in a desired mode of operation.