Patents by Inventor Tony Zemlock

Tony Zemlock has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gas delivery system
    Patent number: 10957561
    Abstract: A gas delivery system for a substrate processing system includes a first manifold and a second manifold. A gas delivery sub-system selectively delivers gases from gas sources. The gas delivery sub-system delivers a first gas mixture to the first manifold and a second gas mixture. A gas splitter includes an inlet in fluid communication with an outlet of the second manifold, a first outlet in fluid communication with an outlet of the first manifold, and a second outlet. The gas splitter splits the second gas mixture into a first portion at a first flow rate that is output to the first outlet and a second portion at a second flow rate that is output to the second outlet. First and second zones of the substrate processing system are in fluid communication with the first and second outlets of the gas splitter, respectively.
    Type: Grant
    Filed: November 19, 2015
    Date of Patent: March 23, 2021
    Assignee: Lam Research Corporation
    Inventors: John Drewery, Yoshie Kimura, James Adams, Yoko Yamaguchi Adams, Tony Zemlock
  • GAS DELIVERY SYSTEM
    Publication number: 20170032982
    Abstract: A gas delivery system for a substrate processing system includes a first manifold and a second manifold. A gas delivery sub-system selectively delivers gases from gas sources. The gas delivery sub-system delivers a first gas mixture to the first manifold and a second gas mixture. A gas splitter includes an inlet in fluid communication with an outlet of the second manifold, a first outlet in fluid communication with an outlet of the first manifold, and a second outlet. The gas splitter splits the second gas mixture into a first portion at a first flow rate that is output to the first outlet and a second portion at a second flow rate that is output to the second outlet. First and second zones of the substrate processing system are in fluid communication with the first and second outlets of the gas splitter, respectively.
    Type: Application
    Filed: November 19, 2015
    Publication date: February 2, 2017
    Inventors: John Drewery, Yoshie Kimura, James Adams, Yoko Yamaguchi Adams, Tony Zemlock
  • Gas transport delay resolution for short etch recipes
    Patent number: 8794267
    Abstract: In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
    Type: Grant
    Filed: December 17, 2008
    Date of Patent: August 5, 2014
    Assignee: Lam Research Corporation
    Inventors: Iqbal Shareef, Mark Taskar, Tony Zemlock
  • GAS TRANSPORT DELAY RESOLUTION FOR SHORT ETCH RECIPES
    Publication number: 20110005601
    Abstract: In one embodiment, an apparatus for providing a gas mixture of a plurality of gases, may have a plurality of mass flow controllers (MFCs), a mixing manifold in fluid connection with each plurality of MFCs, a plurality of mixing manifold exits positioned on the mixing manifold; and an isolation device in fluid connection with each of the plurality of mixing manifold exits.
    Type: Application
    Filed: December 17, 2008
    Publication date: January 13, 2011
    Applicant: LAM RESEARCH CORPORATION
    Inventors: Iqbal Shareef, Mark Taskar, Tony Zemlock