Abstract: A washing device includes a temperature adjuster that is configured to at least one of: heat a first fluid for washing a container for storing a substrate; or cool a second fluid for washing the container, so as to supply the first fluid having a first temperature and the second fluid having a second temperature lower than the first temperature; and a washer that is configured to: supply the first fluid to a first surface of the container to heat and wash the container; and supply the second fluid to a second surface of the container to cool and wash the container.

Abstract: A substrate treatment device includes an EFEM unit, a cleaning and drying unit, and at least one load port unit, and the cleaning and drying unit includes a wafer holding mechanism, a transfer arm, a cleaning liquid supply nozzle, and a gas supply nozzle. The EFEM unit includes a transfer robot and a transfer arm capable of transferring a wafer between a load port unit of the at least one load port unit and the cleaning and drying unit, and the cleaning and drying unit is coupled to the EFEM unit in series with the load port unit.