Patents by Inventor Tooru Nagasaka

Tooru Nagasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090107339
    Abstract: An apparatus for treating gas by using a filler is provided, for example, using an agent for detoxicating a waste gas which includes toxic substances such as silane, phosphine, hydrogen chloride, dichlorosilane, ammonia and/or various gases used in a semiconductor manufacturing process, a liquid crystal display element manufacturing process or the like. A detoxicating agent layer is provided in a flow path within a gas treating column, and ring-shaped baffle plates are provided so as to contact the upstream surface and the downstream surface of the detoxicating agent layer, with the outer edge of the baffle plate making contact with the wall of the flow path. A width of the baffle plate is set to not smaller than five times the outer diameter of the filler and not larger than 9% of the inner diameter of the gas treating column when the outer diameter di of the filler and inner diameter D of the gas treating column satisfy a relation of 5di?0.
    Type: Application
    Filed: March 24, 2006
    Publication date: April 30, 2009
    Inventors: Yukihiro Aizawa, Tooru Nagasaka
  • Patent number: 7300497
    Abstract: A gas separation method is provided in which, when separating a first component and a second component from a mixed gas containing a plurality of components by using a pressure swing adsorption method, these components can be efficiently recovered and cost reduction can be achieved. Between an adsorption step and a regeneration process step, which use a first adsorption column containing a first adsorbent on which the first component is less readily adsorbable and the second component is absorbable, and a second adsorption column containing a second adsorbent on which the first component is readily adsorbable and the second component is less readily adsorbable, an equalization depressurization step and an equalization pressurization process step, in which the pressure of the first and second adsorption columns is equalized, is carried out.
    Type: Grant
    Filed: April 11, 2003
    Date of Patent: November 27, 2007
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Tatsushi Urakami, Tooru Nagasaka, Masato Kawai, Akihiro Nakamura
  • Publication number: 20050199122
    Abstract: A gas separation method is provided in which, when separating a first component and a second component from a mixed gas containing a plurality of components by using a pressure swing adsorption method, these components can be efficiently recovered and cost reduction can be achieved. Between an adsorption step and a regeneration process step, which use a first adsorption column containing a first adsorbent on which the first component is less readily adsorbable and the second component is absorbable, and a second adsorption column containing a second adsorbent on which the first component is readily adsorbable and the second component is less readily adsorbable, an equalization depressurization step and an equalization pressurization process step, in which the pressure of the first and second adsorption columns is equalized, is carried out.
    Type: Application
    Filed: April 11, 2003
    Publication date: September 15, 2005
    Applicant: NIPPON SANSO CORPORATION
    Inventors: Tatsushi Urakami, Tooru Nagasaka, Masato Kawai, Akihiro Nakamura
  • Patent number: 6923844
    Abstract: A gas separation method and apparatus that recovers efficiently principal gas components from a feed gas that includes a plurality of components, and enables supplying the product gases continuously at a stable flow rate and component concentration. A first separation step using a first adsorption column and a second separation step using a second adsorption column are provided, a circulating feed gas, consisting of the recovered exhaust gases discharged in each of the steps and the feed gas, is used as a gas to be separated. The outflow rate and component concentration of a second gas product are maintained constant by controlling the outflow rate of the first gas product.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: August 2, 2005
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Tatsushi Urakami, Tooru Nagasaka, Masato Kawai, Akihiro Nakamura
  • Publication number: 20050000355
    Abstract: The invention provides a gas separation method and apparatus that can recover efficiently principal gas components from a feed gas that includes a plurality of components, and enables supplying the product gases continuously at a stable flow rate and component concentration. In the present invention, a first separation step using a first adsorption column and a second separation step using a second adsorption column are provided, a circulating feed gas, which is consisting of the recovered exhaust gases discharged in each of the steps and the feed gas, is used as a gas to be separated, the outflow rate and component concentration of a second gas product are maintained at a constant by controlling the outflow rate of the first gas product.
    Type: Application
    Filed: November 21, 2002
    Publication date: January 6, 2005
    Inventors: Tatsushi Urakami, Tooru Nagasaka, Masato Kawai, Akihiro Nakamura
  • Patent number: 6752851
    Abstract: The gas separation and purification process can recover efficiently a valuable gas such as krypton and xenon to be used as an atmospheric gas in a semiconductor manufacturing equipment etc. by means of PSA process. In the process for separating a valuable gas in the form of purified product from a mixed gas, used as a raw gas, containing the valuable gas by means of pressure swing adsorption process, the valuable gas is separated and purified by using as the pressure swing adsorption process a combination of equilibrium pressure swing adsorption process for separating gas components based on the difference in equilibrium adsorption and rate-dependent pressure swing adsorption process for separating the gas components based on the difference in adsorption rates.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: June 22, 2004
    Assignee: Nippon Sanso Corporation
    Inventors: Masato Kawai, Akihiro Nakamura, Tooru Nagasaka, Shigeru Hayashida
  • Publication number: 20030000385
    Abstract: The gas separation and purification process can recover efficiently a valuable gas such as krypton and xenon to be used as an atmospheric gas in a semiconductor manufacturing equipment etc. by means of PSA process. In the process for separating a valuable gas in the form of purified product from a mixed gas, used as a raw gas, containing the valuable gas by means of pressure swing adsorption process, the valuable gas is separated and purified by using as the pressure swing adsorption process a combination of equilibrium pressure swing adsorption process for separating gas components based on the difference in equilibrium adsorption and rate-dependent pressure swing adsorption process for separating the gas components based on the difference in adsorption rates.
    Type: Application
    Filed: June 19, 2002
    Publication date: January 2, 2003
    Inventors: Masato Kawai, Akihiro Nakamura, Tooru Nagasaka, Shigeru Hayashida