Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a high valent metal fluoride, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a high valent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: Tetrafluorosilane is produced by a process comprising a step (1) of heating a hexafluorosilicate, a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas, a step (2-2) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a highvalent metal fluoxide, or a step (2-1) of reacting a tetrafluorosilane gas containing hexafluorodisiloxane produced in the step (1) with a fluorine gas and a step (2-3) of reacting a tetrafluorosilane gas produced in the step (2-1) with a highvalent metal fluoride. Further, impurities in high-purity tetrafluorosilane are analyzed.

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

Abstract: A method for decomposing nitrogen fluoride or sulfur fluoride, comprising contacting gaseous nitrogen fluoride or sulfur fluoride with a solid reagent comprising elemental carbon, one or more of the alkaline earth metal elements and optionally one or more of the alkali metal elements, to fix the fluorine component in the nitrogen fluoride or sulfur fluoride in said reagent.

Abstract: A reactive agent for decomposing fluorine compounds comprising alumina and an alkaline earth metal compound; a process for decomposing fluorine compounds, comprising contacting the reactive agent with a fluorine compound at a temperature of 200° C. or more; and a process for manufacturing a semiconductor device, comprising an etching or cleaning and a decomposing using the reactive agent.

Abstract: Fluorocarbons including perfluorocarbons and hydrofluorocarbons are highly efficiently decomposed by contacting a gaseous fluorocarbon with a reagent comprising carbon and an alkaline earth metal or carbon, an alkaline earth metal and an alkali metal at an elevated temperature, the decomposed halogen being fixed to the reagent.

Abstract: A method for decomposing nitrogen fluoride or sulfur fluoride, comprising contacting gaseous nitrogen fluoride or sulfur fluoride with a solid reagent comprising elemental carbon, one or more of the alkaline earth metal elements and optionally one or more of the alkali metal elements, to fix the fluorine component in the nitrogen fluoride or sulfur fluoride in said reagent.

Abstract: A process for decomposing nitrogen fluoride, comprising contacting gaseous nitrogen fluoride with a solid reactive agent for decomposition at 200.degree. C. or more to fix the fluorine component in the nitrogen fluoride to the reactive agent and at the same time control generation of nitrogen oxides, fluorocarbon and carbon monoxide as by-products, the reactive agent containing elemental carbon; aluminum compound, iron compound, manganese compound and/or alkaline earth metal; alkali metal compound; and nickel compound, tin compound and/or copper compound.

Abstract: Fluorocarbons including perfluorocarbons and hydrofluorocarbons are highly efficiently decomposed by contacting a gaseous fluorocarbon with a reagent comprising carbon and an alkaline earth metal or carbon, an alkaline earth metal and an alkali metal at an elevated temperature, the decomposed halogen being fixed to the reagent.