Patents by Inventor Torbjöm Hedeväm

Torbjöm Hedeväm has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern generation systems and high bandwidth focus control system with suppressed reaction forces and noise
    Publication number: 20110051211
    Abstract: A pattern generation system includes an optical system and a rotor. The optical system is configured to project a laser image onto an optical scanner. The rotor has a plurality of optical arms arranged at a first angle relative to one another, and further includes the optical scanner. The laser image is sequentially reflected by the optical scanner into each of the plurality of optical arms of the rotor to generate a pattern on a workpiece.
    Type: Application
    Filed: September 1, 2010
    Publication date: March 3, 2011
    Applicant: Micronic Mydata AB
    Inventors: Jonas Walther, Torbjöm Hedeväm