Patents by Inventor Torbjörn Ling

Torbjörn Ling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7687007
    Abstract: Method for manufacturing a mold tool (1), devised for forming a structured nanoscale pattern on an object (24) and having a layer (16) which is anti-adhesive with regard to the object (24). A stamp blank (2) is provided with a structured pattern (4) on a surface (8). The patterned surface (8) is coated with a layer (6) of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer (6) is oxidized for forming of an oxide film (10). The oxide film (10) is exposed to a reagent comprising molecule chains (18), each of which has a linkage group (20) which bonds to the oxide film (10) by chemical bonding, wherein the molecule chains (18) either at the outset comprise at least a group (22) comprising fluorine, or in a subsequent step is provided with at least one such group (22).
    Type: Grant
    Filed: June 16, 2003
    Date of Patent: March 30, 2010
    Assignee: Obducat AB
    Inventors: Torbjörn Ling, Lars Montelius, Matthias Keil, Marc Beck
  • Patent number: 7137336
    Abstract: A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain.
    Type: Grant
    Filed: July 4, 2002
    Date of Patent: November 21, 2006
    Assignee: Obducat AB
    Inventors: Babak Heidari, Torbjörn Ling
  • Publication number: 20050287820
    Abstract: A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The later was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.
    Type: Application
    Filed: June 16, 2003
    Publication date: December 29, 2005
    Inventors: Torbjorn Ling, Lars Montelius, Matthias Keil, Marc Beck
  • Patent number: 6923930
    Abstract: A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: August 2, 2005
    Assignee: Obducat Aktiebolag
    Inventors: Torbjörn Ling, Lars Montelius, Babak Heidari
  • Publication number: 20050039618
    Abstract: A stamp for use in transferring a pattern in nano-scale has a monomolecular antisticking layer. The anti-sticking layer comprises molecular chains, which are covalently bound to the surface of the stamp and which each comprise at least one fluorine-containing group. Each molecular chain contains a group Q, which comprises a bond which is weaker than the other bonds in the molecular chain as well as the covalent bond that binds the molecular chain to the surface of the stamp. Splitting of said bond in the group Q creates a group Q1, which is attached to the part of the molecular chain being left on the surface of the stamp and which is capable of reacting with a fluorine-containing compound to restore the antisticking layer. In a method of manufacturing a stamp for use in transferring a pattern in nanoscale, the stamp is provided with the above-mentioned molecular chain.
    Type: Application
    Filed: July 4, 2002
    Publication date: February 24, 2005
    Inventors: Babak Heidari, Torbjorn Ling