Abstract: A rotor disk for an exhaust turbocharger is mounted in a housing of the exhaust turbocharger able to rotate about an axis of rotation. The rotor disk has a disk hub comprising a disk back and a disk front remote from the disk back. A plurality of rotor disk blades are formed on the disk hub in a manner extending between the disk back and the disk front. A balancing mark is arranged in a blade channel formed between a first blade of the plurality of rotor disk blades and a second blade, arranged adjacent to the first blade, of the plurality of rotor disk blades. A width of the balancing mark is less than a length of the balancing mark. The disclosure also relates to an exhaust turbocharger comprising such a rotor disk and to a method for balancing a rotor assembly for such an exhaust turbocharger.

Abstract: A rotor disk for an exhaust turbocharger is mounted in a housing of the exhaust turbocharger so as to be able to rotate about an axis of rotation. The rotor disk has a disk hub including a disk back and a disk front facing away from the disk back. A plurality of rotor disk blades are formed on the disk hub in a manner extending between the disk back and the disk front. A balancing mark is arranged in a blade channel formed between a first blade of the plurality of rotor disk blades and a second blade, arranged adjacent to the first blade, of the plurality of rotor disk blades. The balancing mark is triangle-like. The disclosure also relates to an exhaust turbocharger comprising such a rotor disk and to a method for balancing a rotor assembly for such an exhaust turbocharger.

Abstract: A rotor disk for an exhaust turbocharger is mounted in a housing of the exhaust turbocharger able to rotate about an axis of rotation. The rotor disk has a disk hub comprising a disk back and a disk front remote from the disk back. A plurality of rotor disk blades are formed on the disk hub in a manner extending between the disk back and the disk front. A balancing mark is arranged in a blade channel formed between a first blade of the plurality of rotor disk blades and a second blade, arranged adjacent to the first blade, of the plurality of rotor disk blades. A width of the balancing mark is less than a length of the balancing mark. The disclosure also relates to an exhaust turbocharger comprising such a rotor disk and to a method for balancing a rotor assembly for such an exhaust turbocharger.

Abstract: A bearing device for an exhaust gas turbocharger, comprising a first radial bearing and a second radial bearing, the radial bearings radially support a shaft with an axis of rotation of the exhaust gas turbocharger, and wherein a first outflow gap and a second outflow gap, respectively, are formed between the first radial bearing and a radially extending first supporting wall of the turbocharger, which faces a turbine wheel of the exhaust gas turbocharger for axially supporting the first radial bearing, and the second radial bearing and a radially extending second supporting wall of the turbocharger, which faces a compressor wheel of the exhaust gas turbocharger for axially supporting the second radial bearing. The first outflow gap and/or the second outflow gap is configured inclined or curved relative to the axis of rotation for the axial and simultaneously radial support and/or for the backup of the radial support.

Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions. The following are provided according to the present invention: a retention system (4), displaceable on a linear guidance system (3), for receiving the substrate, the guidance direction of the linear guidance system (3) being oriented parallel or substantially parallel to the Y coordinate of an X, Y, Z spatial coordinate system; drives for limited modification of the inclination of the guidance direction relative to the Y coordinate; drives for limited rotation of the linear guidance system (3), including the retention system (4), about the guidance direction; and drives for parallel displacement of the linear guidance system (3), including the retention system (4), in the direction of the X coordinate, the Y coordinate, and/or the Z coordinate.

Abstract: The invention refers to an arrangement for positioning substrates, in particular for positioning wafers, within a device that is provided for exposure of the substrates and/or for measurement on the substrates by means of radiation under high-vacuum conditions.