Patents by Inventor Torsten Harzendorf

Torsten Harzendorf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical Arrangement for Spectral Decomposition of Light
    Publication number: 20180011334
    Abstract: An optical arrangement for spectral decomposition of light is disclosed. In an embodiment the optical arrangement includes a reflection diffraction grating, a first medium with a refractive index nin arranged on a light incidence side of the reflection diffraction grating; and a second medium with a refractive index nG arranged on a side of the reflection diffraction grating that faces away from the light incidence side, with nin>nG, wherein the optical arrangement is configured in such a way that light impinges on the reflection diffraction grating from the first medium at an angle of incidence ?, wherein a condition sin(?)>nG/nin is satisfied, wherein the reflection diffraction grating comprises a layer system with at least one unstructured layer and at least one structured layer, wherein the at least one structured layer has a periodic structure with a period p in lateral direction, and wherein the period p meets the following conditions: p<?/[nin*sin(?)+nG] and p>?/[nin*sin(?)+nin].
    Type: Application
    Filed: July 7, 2017
    Publication date: January 11, 2018
    Inventors: Uwe Detlef Zeitner, Thomas Flügel-Paul, Dirk Michaelis, Torsten Harzendorf
  • Lithographic apparatus and sensor therefor
    Patent number: 8629418
    Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
    Type: Grant
    Filed: November 2, 2006
    Date of Patent: January 14, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Marcus Adrianus Van De Kerkhof, Haico Victor Kok, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Werner Weissbrodt, Manfred Helmut Gustav Wilhelm Johannes Schrenk, Torsten Harzendorf
  • Sensor for use in a lithographic apparatus
    Patent number: 7453078
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: November 18, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Sensor for use in a lithographic apparatus
    Publication number: 20080007844
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: September 7, 2007
    Publication date: January 10, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Sensor for use in a lithographic apparatus
    Patent number: 7282701
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Grant
    Filed: February 28, 2005
    Date of Patent: October 16, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Haico Victor Kok, Marcus Adrianus Van De Kerhof, Borgert Kruizinga, Timotheus Franciscus Sengers, Bearrach Moest, Marc Antonius Maria Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf
  • Sensor for use in a lithographic apparatus
    Publication number: 20070108377
    Abstract: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
    Type: Application
    Filed: November 2, 2006
    Publication date: May 17, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Haico Kok, Marcus Van De Kerkhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Antonius Haast, Peter Weissbrodt, Manfred Helmut Gustav Schrenk, Torsten Harzendorf
  • Sensor for use in a lithographic apparatus
    Publication number: 20060192093
    Abstract: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
    Type: Application
    Filed: February 28, 2005
    Publication date: August 31, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Haico Kok, Marcus Van De Kerhof, Borgert Kruizinga, Timotheus Sengers, Bearrach Moest, Marc Haast, Peter Weissbrodt, Manfred Schrenk, Torsten Harzendorf