Patents by Inventor Toru Hirabayashi

Toru Hirabayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REDUCTION MATERIAL, COMPOSITE BODY AND REDUCTION METHOD
    Publication number: 20220144653
    Abstract: A reducing material including a two-dimensional hydrogen boride-containing sheet having a two-dimensional network composed of (BH)n (n?4). A composite including a two-dimensional hydrogen boride-containing sheet having a two-dimensional network composed of (BH)n (n?4) and a metal nanoparticle. A reduction method including: a step of dispersing the reducing material according to any one of Claims 1 to 5 in an organic solvent to prepare a dispersion liquid containing the reducing material; and a step of reducing a metal ion having a redox potential which is given as a standard electrode potential of ?0.26 V/SHE or higher by mixing the dispersion liquid with the metal ion.
    Type: Application
    Filed: March 3, 2020
    Publication date: May 12, 2022
    Inventors: Takahiro KONDO, Asahi FUJINO, Ryota ISHIBIKI, Taiga GOTO, Masahiro MIYAUCHI, Reiya KAWAMURA, Toru HIRABAYASHI, Shin-ichi ITO
  • Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method
    Patent number: 6714277
    Abstract: An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a mechanism for setting an inert gas atmosphere in the chamber, and a closed vessel which surrounds the chamber. The purity of inert gas in the chamber is higher than a purity of inert gas in the closed vessel.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: March 30, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinichi Hara, Yutaka Tanaka, Kazuyuki Kasumi, Toru Hirabayashi
  • Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method
    Publication number: 20010035942
    Abstract: An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a closed vessel which surrounds the chamber, and a pump for reducing the internal pressure of the chamber. The pressure of the closed vessel is also reduced when the internal pressure of the chamber is reduced.
    Type: Application
    Filed: March 28, 2001
    Publication date: November 1, 2001
    Inventors: Shinichi Hara, Yutaka Tanaka, Kazuyuki Kasumi, Toru Hirabayashi