Patents by Inventor Toru Nishikawa

Toru Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5865365
    Abstract: A method of soldering used in fabricating an electronic circuit device employs an organic material supplied to at least one of the connecting members to be bonded. The connecting members are positioned in an oxidizing atmosphere, and heated in a nonoxidizing atmosphere to remove oxide and/or contamination layers present on the surface of presoldered portions or metallized bonding portions. By this method, fluxless soldering is performed, positional shifts are reduced, and high reliability of the soldering connections with reduction in residues after reflow are obtained.
    Type: Grant
    Filed: December 6, 1996
    Date of Patent: February 2, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toru Nishikawa, Ryohei Satoh, Masahide Hara, Tetsuya Hayashida, Mitugu Shirai, Osamu Yamada, Hiroko Takehara, Yasuhiro Iwata, Mitsunori Tamura, Masahito Ijuin
  • Patent number: 5816473
    Abstract: An apparatus comprises a sputter cleaning device, an alignment device operable in atmospheric condition and a heating and soldering device in the form of a belt furnace operable in non-oxidizing or reducing environment. Instead of the sputter cleaning device, a mechanical polishing or cutting device can be used to clean a surface of solder or a member to be bonded or a solder ball plated with gold may be used. An alignment between two members to be bonded is provided by an alignment mark means which comprises a protrusion on a surface of one member and a complimentary recess formed at a center portion of a protrusion means formed on a corresponding surface of the other member.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: October 6, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toru Nishikawa, Ryohei Satoh, Masahide Harada, Tetsuya Hayashida, Mitugu Shirai
  • Patent number: 5516031
    Abstract: In order to remove oxide film and contamination film on members to be bonded by soldering and solder material therefor corresponding to variation of thickness thereof by sputter-etching in a fluxless bonding method and apparatus therefor, substance emitted from the solder material under sputter-etching using atom or ion is detected and determined whether it is from the solder material or from the oxide film thereon. The sputter-etching is controlled on the basis of the determination to remove the oxide film. Then, the members are aligned in oxidizing atmosphere and soldered in non-oxidizing atmosphere.
    Type: Grant
    Filed: May 2, 1994
    Date of Patent: May 14, 1996
    Assignee: Hitachi, Ltd.
    Inventors: Toru Nishikawa, Masahito Ijuin, Ryohei Sato, Mitsugu Shirai
  • Patent number: 5341980
    Abstract: In a method of soldering for use in fabricating electronic circuit device, after an oxide layer and/or contaminated layer on a surface of a soldering material and members to be soldered thereby is removed by sputter-cleaning with atom or ion, the members are aligned in an oxidizing atmosphere within a predetermined time period and, then, the soldering material is heated in non-oxidizing atmosphere to performe soldering. An apparatus for performing the above method comprises a sputter cleaning device, an alignment device operable in atmospheric condition and a heating and soldering device in the form of a belt furnace operable in non-oxidizing or reducing environment. Instead of the sputter cleaning device, a mechanical polishing or cutting device can be used to cleaning a surface of solder or a member to be bonded or a solder ball plated with gold may be used.
    Type: Grant
    Filed: May 29, 1992
    Date of Patent: August 30, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Toru Nishikawa, Ryohei Satoh, Masahide Harada, Tetsuya Hayashida, Mitugu Shirai