Patents by Inventor Toru Nonaka

Toru Nonaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11965224
    Abstract: This steel sheet for a can is a steel sheet for a can containing, by mass %, C: 0.010% to 0.050%, Si: 0.020% or less, Mn: 0.10% to 0.60%, P: 0.020% or less, S: 0.020% or less, Al: 0.050% or less, N: 0.0100% or less, Nb: 0% to 0.03%, Ti: 0% to 0.03%, B: 0% to 0.0020%, and a remainder including Fe and unavoidable impurities, in which, when the number of carbides having an equivalent circle diameter of 2 ?m or more and 5 ?m or less is indicated by a, and the number of carbides having an equivalent circle diameter of 0.1 ?m or more and less than 2 ?m is indicated by b, a/b satisfies a range of the following formula (1), a fracture strain is 1.6 or more, and a sheet thickness is 0.10 to 0.30 mm a/b<0.12??. . . (1).
    Type: Grant
    Filed: February 17, 2020
    Date of Patent: April 23, 2024
    Assignee: NIPPON STEEL CORPORATION
    Inventors: Toshiki Nonaka, Toru Yonebayashi
  • Publication number: 20030104322
    Abstract: A photoresist developer which is excellent in the wettability of a non-soluble portion of a photoresist after exposure and the solubility of a soluble portion and controls the dissolving speed of the non-soluble portion effectively.
    Type: Application
    Filed: May 21, 2002
    Publication date: June 5, 2003
    Inventors: Yoshifumi Yamashita, Satoshi Kawada, Toru Nonaka
  • Patent number: 6197733
    Abstract: A photoresist ashing residue cleaning agent used after the ashing of the photoresist in the production of a semiconductor circuit pattern. The photoresist ashing residue cleaning agent comprises an aqueous solution containing: a) an ammonium fluoride compound; and b) an amphoteric surfactant of which the cationic group is an ammonium salt and of which the anionic group is a carboxylate.
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: March 6, 2001
    Assignee: Tokuyama Corporation
    Inventors: Ichiro Mikami, Yoshifumi Yamashita, Toru Nonaka
  • Patent number: 4788043
    Abstract: Disclosed is a process for washing a semiconductor substrate with an organic solvent, which comprises the first stage of supplying an organic solvent to be used for the organic solvent washing of a semiconductor substrate to a washing device and washing the semiconductor substrate, the second stage of supplying the organic solvent containing water, electrolytes and particulate or clustery suspended substances, which has been withdrawn from the first stage, to a pervaporation device and separating and removing mainly water, and the third stage of supplying the organic solvent withdrawn from the second stage to a distillation device to obtain the organic solvent as a distillate and recycling the distillate as the organic solvent to the first stage, the three stages being combined to form a continuous circulation systems.
    Type: Grant
    Filed: April 17, 1986
    Date of Patent: November 29, 1988
    Assignee: Tokuyama Soda Kabushiki Kaisha
    Inventors: Yasuhiro Kagiyama, Koichi Doi, Toru Nonaka, Yuji Ishiyama, Shigeo Komatsubara
  • Patent number: D293713
    Type: Grant
    Filed: July 16, 1985
    Date of Patent: January 12, 1988
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Keiichi Morita, Toru Nonaka, Shinji Watanabe, Takuma Watanabe