Abstract: A semiconductor manufacturing apparatus includes: an electrostatic chuck that is installed in a chamber and over which a semiconductor wafer to be subjected to plasma processing is to be mounted; and an observation device for observing a change in a signal waveform occurring in the electrostatic chuck during the plasma processing. The observation device determines abnormal discharge in a processing chamber based on a change pattern of the signal waveform.

Abstract: A method of increasing the yield of product semiconductor substrates includes the step of: (a) providing a monitor wafer over which a laminated film, which is similar to that over a product wafer and includes a conductor film such as an Al film, is formed; (b) etching the laminated film over the monitor wafer in a state where a photoresist film is not formed over the laminated film; and (c) irradiating the monitor wafer, placed over a stage of a foreign matter inspection apparatus, with laser light such that an etch residue (defect) is detected by its scattered light.

Abstract: The present invention makes it possible to increase the reliability of a semiconductor device. A manufacturing method of a semiconductor device according to the present invention includes a step of removing a patterned resist film and the step of removing a patterned resist film includes the steps of: (A) introducing at least a gas containing oxygen into a processing room; (B) starting electric discharge for transforming the gas containing oxygen into plasma; and (C) introducing a water vapor or an alcohol vapor into the processing room. On this occasion, the step (C) is applied either simultaneously with or after the step (B).

Abstract: The present invention makes it possible to increase the reliability of a semiconductor device. A manufacturing method of a semiconductor device according to the present invention includes a step of removing a patterned resist film and the step of removing a patterned resist film includes the steps of: (A) introducing at least a gas containing oxygen into a processing room; (B) starting electric discharge for transforming the gas containing oxygen into plasma; and (C) introducing a water vapor or an alcohol vapor into the processing room. On this occasion, the step (C) is applied either simultaneously with or after the step (B).