Abstract: There is provided a pellicle container for storing a pellicle used in lithography, having a tray and a cover between which the pellicle is stored, and the tray has a pellicle mount section on which the pellicle is used to be mounted, but the tray of this container further has a plane plate, preferably a quartz plane plate, having a flatness of 10 micrometers or smaller provided on top of the pellicle mount so as to stabilize the flatness of the pellicle, especially its agglutinant layer.

Abstract: A fuel supply apparatus comprises a filler neck body including a hollow fuel passage-forming structure configured to form a fuel passage and a fuel vapor port branched off from the fuel passage-forming structure; and a nozzle guide formed in a tubular shape to introduce a fueling nozzle. The nozzle guide includes a vapor flow path portion configured to introduce fuel vapor flowing into the fuel vapor port in a tank direction. The vapor flow path portion has a slow-down portion configured to slow down the fuel vapor introduced in the tank direction.

Abstract: There is provided a pellicle for EUV lithography, which has a filter attached to a vent hole made through a pellicle frame bar for air pressure adjustment, and this filter is designed to be heat-resistant by being made of either a metal or a ceramic material, and is adhered to the pellicle frame by weldering or soldering, and also the filter has a filtration accuracy of 0.1 through 0.3 ?m.

Abstract: An object is to provide a fuel supply apparatus that is configured to cause fuel vapor generated by vaporization of a fuel circulated in a fuel tank to be smoothly joined with the supplied fuel. The fuel supply apparatus comprises a filler neck body that is configured to include a hollow fuel passage-forming portion arranged to define a fuel passage and a breather port; a nozzle guide that is placed inside of the fuel passage-forming portion and is configured to introduce a fueling nozzle; a guide portion that is configured to introduce an inflow gas flowing in from the breather port, to the fuel passage via an outer circumferential space; and a rib that is provided between the guide portion and a lower end in the first direction of the nozzle guide and is configured to divide the inflow gas introduced through the fuel passage.

Abstract: There is provided a pellicle wherein the pellicle frame is formed with a protrusion which extends either inward or outward from the pellicle frame so that an air passage (vent hole) can extend in it to turn upward or downward to open in the atmosphere or in the pellicle closed space (the space interior to the pellicle frame) so that it is possible to secure a wider opening area for filtration to enable prompt air ventilation whereby the pellicle membrane does not undergo extreme inflation or deflation and thus the pellicle membrane is protected from damages.

Abstract: A fuel supply apparatus comprises a filler neck body including a hollow fuel passage-forming structure configured to form a fuel passage and a fuel vapor port branched off from the fuel passage-forming structure; and a nozzle guide formed in a tubular shape to introduce a fueling nozzle. The nozzle guide includes a vapor flow path portion configured to introduce fuel vapor flowing into the fuel vapor port in a tank direction. The vapor flow path portion has a slow-down portion configured to slow down the fuel vapor introduced in the tank direction.

Abstract: There is provided a pellicle wherein the pellicle frame is formed with a protrusion which extends either inward or outward from the pellicle frame so that an air passage (vent hole) can extend in it to turn upward or downward to open in the atmosphere or in the pellicle closed space (the space interior to the pellicle frame) so that it is possible to secure a wider opening area for filtration to enable prompt air ventilation whereby the pellicle membrane does not undergo extreme inflation or deflation and thus the pellicle membrane is protected from damages.

Abstract: An object is to provide a fuel supply apparatus that is configured to cause fuel vapor generated by vaporization of a fuel circulated in a fuel tank to be smoothly joined with the supplied fuel. The fuel supply apparatus comprises a filler neck body that is configured to include a hollow fuel passage-forming portion arranged to define a fuel passage and a breather port; a nozzle guide that is placed inside of the fuel passage-forming portion and is configured to introduce a fueling nozzle; a guide portion that is configured to introduce an inflow gas flowing in from the breather port, to the fuel passage via an outer circumferential space; and a rib that is provided between the guide portion and a lower end in the first direction of the nozzle guide and is configured to divide the inflow gas introduced through the fuel passage.

Abstract: There is provided a pellicle container for storing a pellicle used in lithography, having a tray and a cover between which the pellicle is stored, and the tray has a pellicle mount section on which the pellicle is used to be mounted, but the tray of this container further has a plane plate, preferably a quartz plane plate, having a flatness of 10 micrometers or smaller provided on top of the pellicle mount so as to stabilize the flatness of the pellicle, especially its agglutinant layer.

Abstract: There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the pellicle membrane when slackened does not touch the lower ridge of the slight chamfer.

Abstract: There is provided a pellicle wherein the frame is cut with one or more slight-chamfers, and in particular the one cut along the inner edge of the upper annular face of the frame, to which the pellicle membrane is glued, has a slope greater than 45 degrees so that the pellicle membrane when slackened does not touch the lower ridge of the slight chamfer.

Abstract: A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the pellicle is attached so that pattern transferred scarcely undergoes deformation; in particular the agglutinant layer has a Young's modulus of 0.02 to 0.08 MPa and a tensile bond strength of 0.04 to 0.08 N/mm2.

Abstract: There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform.

Abstract: A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive adhesion layer for adhering the pellicle frame to a mask, the pressure-sensitive adhesion layer being provided on an inner peripheral face of the pellicle frame, and the pressure-sensitive adhesion layer being capable of adhering to a side face of a mask having a mask image on a front face.

Abstract: A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm2. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.

Abstract: A pellicle 10 for lithography includes a pellicle frame 3, a pellicle membrane 1 adhered onto the upper end surface of the pellicle frame 3 and an agglutinant layer 4 formed on the lower surface of the pellicle frame 3 and the agglutinant layer 4 is formed by hardening a curable composition containing a straight chain perfluoro compound having a perfluoro structure in a main chain. The thus constituted pellicle 10 generates only a small amount of a decomposition gas even when it is used for a long time, thereby preventing solid-like foreign materials from separating out on a pattern region of a photomask 5 and can suppress degradation of an the agglutinant agent contained in an agglutinant layer 4 to be used for fixing a photomask 5 to the pellicle frame 3. Further, this pellicle 10 can be easily peeled off from a photomask 5 and replaced with a new one.

Abstract: There is provided a pellicle in which the adhesive layer bearing the pellicle membrane is molded so flatly that the flatness of the pellicle as measured across the membrane is 10 micrometers or smaller, and this is preferably accompanied by an improved flatness of mask-bonding adhesive layer (agglutinant layer), which can be 15 micrometers to 10 micrometers or even smaller.

Abstract: A lithographic pellicle comprises a pellicle film (1), a pellicle frame (3), and a PSA layer (4). The pellicle film (1) is stretched across and mounted to the pellicle frame (3) at its top end. The PSA layer (4) is disposed on the bottom end of the frame (3) and is capable of attaching the frame (3) to a substrate (5). An inner PSA layer (8) made of a curable composition comprising a perfluoro compound having a perfluoro structure backbone is disposed on the inner wall of the frame (3).

Abstract: Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pellicle 1 for lithography is comprised of a frame-like pellicle frame 4 having one open frame on one side of the pellicle frame and another open frame on another side of the pellicle frame; and a laser beam transmissive pellicle film 2 for lithography, which is attached to the one side of the pellicle frame. The another open frame is capable of attaching to a photomask 10 and the pellicle film has a venting hole 7 having a hole size through which a gas molecule 15 can pass but not a foreign particle 16.

Abstract: A handling tool for handling a pellicle which is used in the lithography carried out in a manufacturing process of semiconductor devices, comprising a handle, a main shaft connected with a fore-end of the handle to form a T-shaped part, two parallel arms protruding forward from the both ends of the said main shaft orthogonally to form a U-shaped part, and four pellicle frame holders of which two are each provided on the inward side surface of each arm respectively, wherein the arms are designed in a manner such that they are both capable of moving towards and away from each other so as to be able to adjust the arm-to-arm distance, and the said holders are provided so that they can grasp the frame's side surfaces at the four corners of the pellicle frame when the said arms are closed.