Patents by Inventor Toru Tokimitsu

Toru Tokimitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9696464
    Abstract: The invention relates to a mold having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; an optical article having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; a method for manufacturing an optical article having an irregularly uneven surface structure by transferring an uneven structure of a mold; a transparent substrate for a surface light emitter which uses an optical article having an irregularly uneven surface structure; and a surface light emitter having a transparent substrate for a surface light emitter.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: July 4, 2017
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Yumiko Saeki, Toshiaki Hattori, Toru Tokimitsu
  • Publication number: 20140117397
    Abstract: The invention relates to a mold having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; an optical article having an irregularly uneven surface structure in which an average inclination angle is from 20 to 80 degrees; a method for manufacturing an optical article having an irregularly uneven surface structure by transferring an uneven structure of a mold; a transparent substrate for a surface light emitter which uses an optical article having an irregularly uneven surface structure; and a surface light emitter having a transparent substrate for a surface light emitter.
    Type: Application
    Filed: June 15, 2012
    Publication date: May 1, 2014
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Yumiko Saeki, Toshiaki Hattori, Toru Tokimitsu
  • Patent number: 7795348
    Abstract: Disclosed is a primer composition for coating having excellent adhesion properties to a substrate and comprising a polyolefin resin or acrylic resin, without the use of a chlorine-containing compound, which primer composition essentially comprises a polymer (A) having at least a unit of a (meth)acrylic ester monomer (a) in which acryloyloxy group or methacryloyloxy group is bonded to secondary carbon atom or tertiary carbon atom.
    Type: Grant
    Filed: February 8, 2008
    Date of Patent: September 14, 2010
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tetsuya Noda, Toru Tokimitsu
  • Publication number: 20080139748
    Abstract: Disclosed is a primer composition for coating having excellent adhesion properties to a substrate and comprising a polyolefin resin or acrylic resin, without the use of a chlorine-containing compound, which primer composition essentially comprises a polymer (A) having at least a unit of a (meth)acrylic ester monomer (a) in which acryloyloxy group or methacryloyloxy group is bonded to secondary carbon atom or tertiary carbon atom.
    Type: Application
    Filed: February 8, 2008
    Publication date: June 12, 2008
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Tetsuya Noda, Toru Tokimitsu
  • Publication number: 20070106029
    Abstract: One object of the present invention is to provide an unchlorinated type modified polyolefin resin which has excellent adhesion properties to a substrate comprising a resin having a low- or non-polarity and exhibiting hardly adherable properties, such as a polyolefin type resin, has an excellent solubility in a solvent, and has an excellent water resistance. The present invention provides a modified polyolefin resin produced by subjecting a polyolefin resin (A) to a graft modification by vinyl monomer(s) (B) comprising at least one (meth)acrylate monomer (b) in which an acryloyloxy group or methacryloyloxy group is bonded to a secondary carbon atom or tertiary carbon atom.
    Type: Application
    Filed: June 25, 2004
    Publication date: May 10, 2007
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Hiroki Nakamura, Toru Tokimitsu, Atsunori Koshirai
  • Publication number: 20060052539
    Abstract: Disclosed is a primer composition for coating having excellent adhesion properties to a substrate and comprising a polyolefin resin or acrylic resin, without the use of a chlorine-containing compound, which primer composition essentially comprises a polymer (A) having at least a unit of a (meth)acrylic ester monomer (a) in which acryloyloxy group or methacryloyloxy group is bonded to secondary carbon atom or tertiary carbon atom.
    Type: Application
    Filed: August 22, 2003
    Publication date: March 9, 2006
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Tetsuya Noda, Toru Tokimitsu
  • Patent number: 6927011
    Abstract: A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: August 9, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose
  • Publication number: 20030148214
    Abstract: A resist resin containing a monomer unit selected from the group consisting of the following Formulas (I) and (II): 1
    Type: Application
    Filed: January 13, 2003
    Publication date: August 7, 2003
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose
  • Patent number: 6262214
    Abstract: A copolymer having low birefringence substantially consisting of a repeating unit represented by the following general formula (1) and a repeating unit of a (meth)acrylate: wherein, R1 represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms, an alicyclic hydrocarbon group or a substituted hydrocarbon group.). This copolymer has low birefringence and low hydrophilia, is excellent in transparency, heat-resistance and mechanical strength, and can be applied to lenses, optical disks, optical fibers and the like.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: July 17, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Akira Yanagase, Seiji Tone, Toru Tokimitsu
  • Patent number: 6160070
    Abstract: Disclosed is a process for the preparation of a poly-(meth)acrylate ester, which comprises, upon polymerization of a (meth)acrylate ester by using an organometallic compound ((C.sub.5 Me.sub.5).sub.2 SmMe(thf) or the like) having at least one polymerization initiating site, carrying out the polymerization in the presence of a compound (acetophenone, 4-methyl-2-pentanone or the like), which contains in the molecule thereof a reactive hydrogen atom, as a chain transfer agent. The above-described process makes it possible to control the molecular weight easily, reduce the using amount of the organometallic compound, prevent the coloring of the poly(meth)acrylate ester and improve thermal decomposition resistance.
    Type: Grant
    Filed: January 25, 1999
    Date of Patent: December 12, 2000
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Akira Yanagase, Seiji Tone, Toru Tokimitsu, Mitsufumi Nodono
  • Patent number: 5919867
    Abstract: An A-B-A type of block copolymer consisting of polymer block A of (meth)acrylate and polymer block B of olefin, having a Mw/Mn of 1.0 to 2.5, is disclosed. This block copolymer can be produced by polymerizing an olefin using a particular rare earth compound as an initiator, and then polymerizing the formed polymer with a (meth)acrylate.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: July 6, 1999
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hajime Yasuda, Eiji Ihara, Akira Yanagase, Hitoshi Ige, Seiji Tone, Toru Tokimitsu