Abstract: An invisible antenna with excellent antenna characteristics that cannot be visually recognized by naked eyes. A pair of linear conductors 11 are connected to a feeding line 12, and a plurality of the linear conductors 11 are disposed on and/or within a transparent insulating layer 14. The linear conductor 11 cannot be visually recognized by human naked eyes.

Abstract: An invisible antenna with excellent antenna characteristics that cannot be visually recognized by naked eyes. A pair of linear conductors 11 are connected to a feeding line 12, and a plurality of the linear conductors 11 are disposed on and/or within a transparent insulating layer 14. The linear conductor 11 cannot be visually recognized by human naked eyes.

Abstract: A method for vacuum drying of a substrate which can eliminate not only the moisture adhered to the substrate surface but also the moisture impregnated inside of the films which form the devices in a shot time without deforming nor deteriorating the devices formed on the substrate in the drying. The method for vacuum drying of a substrate, concerning a method for drying a substrate by processing the substrate surface in a desired condition, cleaning the processed substrate with cleaning liquid, and drying the cleaned substrate, comprises the steps of heating the substrate surface to a predetermined temperature to vaporize the moisture of the surface as vapor and thereby detach the moisture from the substrate to outside, and vacuuming the detached vapor at a predetermined vacuum pressure to eliminate the moisture from the wafer.

Abstract: A method for vacuum drying of a substrate which can eliminate not only the moisture adhered to the substrate surface but also the moisture impregnated inside of the films which form the devices in a shot time without deforming nor deteriorating the devices formed on the substrate in the drying. The method for vacuum drying of a substrate, concerning a method for drying a substrate by processing the substrate surface in a desired condition, cleaning the processed substrate with cleaning liquid, and drying the cleaned substrate, comprises the steps of heating the substrate surface to a predetermined temperature to vaporize the moisture of the surface as vapor and thereby detach the moisture from the substrate to outside, and vacuuming the detached vapor at a predetermined vacuum pressure to eliminate the moisture from the wafer.

Abstract: A fire resistant refractory leakage coaxial cable assembly formed by placing a sheet of heat resistant organic film between the internal conductor and the external conductor of a leakage coaxial cable. The seam formed by the two edges of the film is positioned upwardly, so that molten insulated material will be contained by the film without flowing through the seam.