Patents by Inventor Toshiaki Aso

Toshiaki Aso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070094936
    Abstract: To provide an abrasive slurry having high dispersion stability, including: abrasive fine particles made of one or more kinds of oxides; colloidal fine particles made of colloidal oxide with an average particle size smaller than an average particle size of the abrasive fine particles; and a dispersion medium in which the abrasive fine particles and the colloidal fine particles are dispersed, and a manufacturing method for a substrate as an inorganic substrate, including polishing the substrate using the abrasive slurry. An abrasive slurry according to the present invention keeps high dispersion stability for a long time and shows a satisfactory redispersion property, which can eliminate a problem about precipitation/aggregation as much as possible and can be used as a dispersant-free abrasive containing absolutely no organic dispersant.
    Type: Application
    Filed: October 31, 2006
    Publication date: May 3, 2007
    Applicant: TAMA CHEMICALS CO., LTD.
    Inventors: Toshitsura Cho, Akira Iwashiro, Toshiaki Aso
  • Patent number: 7157544
    Abstract: A process for producing an aromatic polycarbonate oligomer according to an interfacial polymerization method comprising reacting an aqueous solution of a bisphenol compound and phosgene in the presence of an organic solvent in a reactor, removing reaction heat by cooling, utilizing vaporization latent heat of the organic solvent to be used, cooling vaporized organic solvent through a condenser and returning an exhaust gas from the condenser to the reactor and a process for producing an aromatic polycarbonate resin used the same.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: January 2, 2007
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuhiro Andou, Kazuaki Shiomi, Toshiaki Aso
  • Publication number: 20040221516
    Abstract: To provide an abrasive slurry having high dispersion stability, including: abrasive fine particles made of one or more kinds of oxides; colloidal fine particles made of colloidal oxide with an average particle size smaller than an average particle size of the abrasive fine particles; and a dispersion medium in which the abrasive fine particles and the colloidal fine particles are dispersed, and a manufacturing method for a substrate as an inorganic substrate, including polishing the substrate using the abrasive slurry. An abrasive slurry according to the present invention keeps high dispersion stability for a long time and shows a satisfactory redispersion property, which can eliminate a problem about precipitation/aggregation as much as possible and can be used as a dispersant-free abrasive containing absolutely no organic dispersant.
    Type: Application
    Filed: February 18, 2004
    Publication date: November 11, 2004
    Inventors: Toshitsura Cho, Akira Iwashiro, Toshiaki Aso
  • Publication number: 20040162439
    Abstract: A process for producing an aromatic polycarbonate oligomer according to an interfacial polymerization method comprising reacting an aqueous solution of a bisphenol compound and phosgene in the presence of an organic solvent in a reactor, removing reaction heat by cooling, utilizing vaporization latent heat of the organic solvent to be used, cooling vaporized organic solvent through a condenser and returning an exhaust gas from the condenser to the reactor and a process for producing an aromatic polycarbonate resin used the same.
    Type: Application
    Filed: December 17, 2003
    Publication date: August 19, 2004
    Inventors: Kazuhiro Andou, Kazuaki Shiomi, Toshiaki Aso
  • Patent number: 5118726
    Abstract: A polycarbonate resin composition for radiation sterilization, comprising an aromatic polycarbonate resin having structural units derived from a halogenated bisphenol, and a polyalkylene compound selected from poly(alkylene glycol), its ether, silyl ether or ester. Molded articles produced from the composition do not substantially undergo yellowing when exposed to radiation in air or under a substantially oxygen-free atmosphere, and can be advantageously employed in medical appliances.
    Type: Grant
    Filed: December 28, 1989
    Date of Patent: June 2, 1992
    Assignee: Mitsubishi Gas Chemical Co., Ltd.
    Inventors: Makoto Mizutani, Satoshi Nagai, Mitsuhiko Masumoto, Toshiaki Aso