Patents by Inventor Toshiaki Enomoto

Toshiaki Enomoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11674793
    Abstract: A residual thermal strain distribution measurement method of measuring a residual thermal strain distribution as residual thermal deformation in a sample generated under application of a thermal load, comprises recording images of a periodic pattern present on the surface of the sample by an image recording unit at a first temperature and a sample formation temperature at which the sample is formed, generating moire fringes based on each recorded image of the periodic pattern, calculating a phase of the moire fringes for the sample at the first temperature, calculating a phase of the moire fringes for the sample at the sample formation temperature, acquiring a phase difference of the moire fringes at the sample formation temperature with respect to the first temperature, and calculating a residual thermal strain of the sample at the first temperature with respect to the sample formation temperature based on the acquired phase difference.
    Type: Grant
    Filed: February 19, 2018
    Date of Patent: June 13, 2023
    Assignee: NAMICS CORPORATION
    Inventors: Qinghua Wang, Shien Ri, Toshiaki Enomoto
  • Publication number: 20200056880
    Abstract: A residual thermal strain distribution measurement method of measuring a residual thermal strain distribution as residual thermal deformation in a sample generated under application of a thermal load, comprises recording images of a periodic pattern present on the surface of the sample by an image recording unit at a first temperature and a sample formation temperature at which the sample is formed, generating moire fringes based on each recorded image of the periodic pattern, calculating a phase of the moire fringes for the sample at the first temperature, calculating a phase of the moire fringes for the sample at the sample formation temperature, acquiring a phase difference of the moire fringes at the sample formation temperature with respect to the first temperature, and calculating a residual thermal strain of the sample at the first temperature with respect to the sample formation temperature based on the acquired phase difference.
    Type: Application
    Filed: February 19, 2018
    Publication date: February 20, 2020
    Inventors: Qinghua WANG, Shien RI, Toshiaki ENOMOTO
  • Patent number: 10388583
    Abstract: Provided is a thermosetting resin composition, which can be used as underfill for obtaining favorable solder connectivity while suppressing the formation of voids in the case of treating under heating conditions required by the underfill in a semiconductor chip thermocompression bonding step using the thermal compression bonding technique. The thermosetting resin composition contains a thermosetting resin, a curing agent and a fluxing agent, and the temperature at which the rate of temperature change of viscosity when temperature is increased according to a prescribed heating profile reaches 30 Pa·s/° C. is 200° C. to 250° C.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: August 20, 2019
    Assignee: NAMICS CORPORATION
    Inventors: Masaaki Hoshiyama, Toyokazu Hotchi, Toshiaki Enomoto
  • Publication number: 20170301597
    Abstract: Provided is a thermosetting resin composition, which can be used as underfill for obtaining favorable solder connectivity while suppressing the formation of voids in the case of treating under heating conditions required by the underfill in a semiconductor chip thermocompression bonding step using the thermal compression bonding technique. The thermosetting resin composition contains a thermosetting resin, a curing agent and a fluxing agent, and the temperature at which the rate of temperature change of viscosity when temperature is increased according to a prescribed heating profile reaches 30 Pa·s/° C. is 200° C. to 250° C.
    Type: Application
    Filed: October 8, 2015
    Publication date: October 19, 2017
    Inventors: Masaaki Hoshiyama, Toyokazu Hotchi, Toshiaki Enomoto
  • Patent number: 9417228
    Abstract: A method of predicting viscosity behavior of a thermosetting resin is provided that is capable of predicting viscosity behavior of a thermosetting resin and void generation in the underfill is suppressed while good solder connection is obtained.
    Type: Grant
    Filed: April 18, 2014
    Date of Patent: August 16, 2016
    Assignee: Namics Corporation
    Inventors: Toshiaki Enomoto, Arata Hayashigaki, Masaaki Hoshiyama, Toyokazu Hotchi, Toshiyuki Sato
  • Publication number: 20140316102
    Abstract: A method of predicting viscosity behavior of a thermosetting resin is provided that is capable of predicting viscosity behavior of a thermosetting resin and void generation in the underfill is suppressed while good solder connection is obtained.
    Type: Application
    Filed: April 18, 2014
    Publication date: October 23, 2014
    Inventors: Toshiaki Enomoto, Arata Hayashigaki, Masaaki Hoshiyama, Toyokazu Hotchi, Toshiyuki Sato
  • Patent number: 6408761
    Abstract: A melting/vaporization substance 2 is melted and vaporized by supplying an electric energy of a predetermined amount from an electric energy supply circuit to the melting/vaporization substance 2. An explosive blasting substance 3 is exploded by a phenomenon caused in a process of melting and vaporization of the melting/vaporization substance 2, so that a to-be-blasted object 4 is blasted by that explosive force.
    Type: Grant
    Filed: September 9, 1999
    Date of Patent: June 25, 2002
    Assignee: Hitachi Zosen Corporation
    Inventors: Hiroaki Arai, Hidehiko Maehata, Hajime Yoshii, Toshiaki Enomoto, Taisuke Ishihara