Patents by Inventor Toshiaki Fujimura

Toshiaki Fujimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240109317
    Abstract: A liquid discharge head includes: a first substrate having a joint region; a sheet member having a first face joined to the first substrate with a joining agent applied to the joint region of the first substrate; and a second substrate joined to a second face opposite to the first face of the sheet member and the first substrate, the sheet member interposed between the first substrate and the second substrate, wherein the second substrate has a gap facing the second face of the sheet member opposite to a portion of the first face of the sheet member joined to the joint region of the first substrate across the sheet member.
    Type: Application
    Filed: August 17, 2023
    Publication date: April 4, 2024
    Inventors: Yuki FUJIMURA, Toshiaki MASUDA
  • Patent number: 6333134
    Abstract: A multilayered photopolymer element made up of at least a support, a photosensitive layer and a cover film. The photosensitive layer is composed of at least two layers and the uppermost layer in the photosensitive layer contains a sensitivity controlling agent bonded with a polymer. The shape of the shoulder at a relief top is made sharp-edged whereby a printing plate having excellent print quality without being thickened by impression is prepared.
    Type: Grant
    Filed: July 11, 2000
    Date of Patent: December 25, 2001
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Yuji Taguchi, Toshiaki Fujimura, Hajime Kouda
  • Patent number: 5780202
    Abstract: An antistatic photosensitive multilayered structure of the present invention has at least a photosensitive layer and an antistatic cover film on a substrate in this order.
    Type: Grant
    Filed: April 6, 1995
    Date of Patent: July 14, 1998
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Shigenori Nagahara, Toshiaki Fujimura, Shinichi Tanaka
  • Patent number: 5204223
    Abstract: A photosensitive resin composition which is excellent in flexibility and impact resilience, which is less affected by humidity is provided. This composition comprises a soluble synthetic polymer, a photo-polymerizable unsaturated compound, and a photo-polymerization initiator, wherein the soluble synthetic polymer comprises an addition polymer obtained by the reaction between a diamine compound having amino groups selected from primary and secondary amino groups and having no amide bonds in its molecule and a diisocyanate compound; and the addition polymer contains a polyoxyalkylene glycol component in an amount of 20 to 80% by weight.
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: April 20, 1993
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Yuji Taguchi, Toshiaki Fujimura
  • Patent number: 4758804
    Abstract: A high-frequency oscillator having a high-frequency oscillation circuit formed through use of a microstripline. The high-frequency oscillation circuit has a resonator and a transistor connected to a reference potential and coupled with the resonator through a first capacitor. A first electrode of the transistor is connected with the resonator through the first capacitor. A second electrode of the transistor is connected to the reference potential and a third electrode thereof is adapted to derive an output. A substrate is provided with a land portion to be connected with the first electrode of the transistor, and a capacitor electrode is formed on the opposite surface of the substrate to be opposite to the first electrode connection land portion through the substrate. The capacitor electrode, the first electrode connection land portion and the substrate form a second capacitor, which is connected to the reference potential between the first capacitor and the first electrode of the transistor.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: July 19, 1988
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Atsushi Inoue, Tsukasa Senba, Toshiaki Fujimura
  • Patent number: 4699859
    Abstract: A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.
    Type: Grant
    Filed: September 7, 1984
    Date of Patent: October 13, 1987
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Toshiaki Fujimura, Yoshio Katoh, Satoshi Imahashi, Koichi Seto, Shinichi Tanaka
  • Patent number: 4544624
    Abstract: The invention provides a photosensitive resin composition containing a soluble synthetic linear high-molecular compound in an amount of 25 to 95 weight percent based on the whole composition, a monomer having at least one photopolymerizable unsaturated bond and a photopolymerization initiator and characterized in that part or all of the soluble synthetic linear high-molecular compound is an addition polymer of an organic diisocyanate compound with an amide compound, both terminals of the amide compound being either primary or secondary amide groups and the equivalent ratio of amino groups to isocyanate groups in the addition polymer is not less than 1.0. The high-molecular weight compound makes up at least 50% by weight base on the total amount of the polymer material present in the composition.
    Type: Grant
    Filed: January 2, 1985
    Date of Patent: October 1, 1985
    Assignee: Toyo Boseki Kabnushiki Kaisha
    Inventors: Masaru Nanpei, Akira Tomita, Toshiaki Fujimura, Kuniomi Etoh
  • Patent number: 4188221
    Abstract: Photosensitive polyamide resin composition which can be developed with water to give a relief printing plate having an excellent moisture resistance, comprising 30 to 90% by weight of a water-soluble polyamide having ammonium type nitrogen atoms and 5 to 70% by weight of a photopolymerizable unsaturated compound prepared by reacting (meth)acrylic acid (I) and a polyglycidyl ether of an aliphatic polyvalent alcohol (II) in an equivalent ratio of 0.5.ltoreq.(I)/(II).ltoreq.2.0, and 0.01 to 10% by weight of a photopolymerization initiator.
    Type: Grant
    Filed: May 8, 1978
    Date of Patent: February 12, 1980
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Masaru Nanpei, Toshiaki Fujimura, Hajime Kouda, Yoshihiro Kasho, Kuniomi Etoh