Patents by Inventor Toshiaki Ikemura

Toshiaki Ikemura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation sensitive resin composition
    Patent number: 6235446
    Abstract: A radiation sensitive resin composition comprising (A) a copolymer possessing recurring units of the formulas (1), (2), and (3), which turns alkali soluble in the presence of acid and (B) a photosensitive acid generator. Because the composition can resolve line-and-space patterns, isolated patterns, and contact hole patterns with satisfactory appearance and high resolution, it is useful as a chemically amplified positive resist for use in the manufacture of semiconductor devices.
    Type: Grant
    Filed: August 14, 1998
    Date of Patent: May 22, 2001
    Assignee: JSR Corporation
    Inventors: Toshiaki Ikemura, Eiichi Kobayashi, Takayoshi Tanabe, Shin-ichiro Iwanaga