Patents by Inventor Toshiaki Kimura

Toshiaki Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240243109
    Abstract: A light-emitting device according to an embodiment of the present disclosure includes: a substrate having a first surface and a second surface that are opposed to each other; a plurality of light-emitting elements arranged in an array on the first surface side of the substrate; a partition wall formed above the plurality of light-emitting elements using a metal material and having an opening for each of the plurality of light-emitting elements; and a wavelength conversion layer that is provided in the opening and converts a wavelength of light outputted from the plurality of light-emitting elements.
    Type: Application
    Filed: February 18, 2022
    Publication date: July 18, 2024
    Applicants: SONY GROUP CORPORATION, SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Toshihiko WATANABE, Hiroyuki KASHIHARA, Toshihiro MIURA, Toshiaki HASEGAWA, Toru SASAKI, Tetsuo MINAMI, Kei KIMURA, Toshio FUJINO
  • Patent number: 11977789
    Abstract: A display screen generation apparatus includes: an acquisition portion acquiring for each of a plurality of print products produced through a plurality of processes, progress of the processes; and a display portion generating a display screen that displays for each of the plurality of print products, the process waiting to be executed, the process being executed, the process already executed, and the process not intended to be executed in a distinguishable manner from each other.
    Type: Grant
    Filed: August 17, 2022
    Date of Patent: May 7, 2024
    Assignee: Seiko Epson Corporation
    Inventors: Tetsuyuki Minamihara, Kana Ogawa, Toshiaki Kimura, Yoshiki Katsuma, Yuto Fukuchi, Ayako Kobayashi, Satoru Ono, Yuichi Sugiyama
  • Patent number: 11762605
    Abstract: A display apparatus includes: a first acquisition portion acquiring progress of a plurality of processes for print product produced through the processes based on information transmitted from a printer; a second acquisition portion acquiring the progress in response to an operation of a user to proceed with the production; and a display portion displaying in a distinguishable manner on a display, an automatic transition process and a manual transition process included in the processes, the automatic transition process automatically transitioning to the subsequent process based on the information transmitted from the printer and a manual transition process manually transitioning to the subsequent process in response to the operation.
    Type: Grant
    Filed: August 18, 2022
    Date of Patent: September 19, 2023
    Assignee: Seiko Epson Corporation
    Inventors: Tetsuyuki Minamihara, Kana Ogawa, Toshiaki Kimura, Yoshiki Katsuma, Yuto Fukuchi, Ayako Kobayashi, Satoru Ono, Yuichi Sugiyama
  • Publication number: 20230059926
    Abstract: A display screen generation apparatus includes: an acquisition portion acquiring for each of a plurality of print products produced through a plurality of processes, progress of the processes; and a display portion generating a display screen that displays for each of the plurality of print products, the process waiting to be executed, the process being executed, the process already executed, and the process not intended to be executed in a distinguishable manner from each other.
    Type: Application
    Filed: August 17, 2022
    Publication date: February 23, 2023
    Inventors: Tsuzuki MINAMIHARA, Kana OGAWA, Toshiaki KIMURA, Yoshiki KATSUMA, Yuto FUKUCHI, Ayako KOBAYASHI, Satoru ONO, Yuichi SUGIYAMA
  • Publication number: 20220405025
    Abstract: A display apparatus includes: a first acquisition portion acquiring progress of a plurality of processes for print product produced through the processes based on information transmitted from a printer; a second acquisition portion acquiring the progress in response to an operation of a user to proceed with the production; and a display portion displaying in a distinguishable manner on a display, an automatic transition process and a manual transition process included in the processes, the automatic transition process automatically transitioning to the subsequent process based on the information transmitted from the printer and a manual transition process manually transitioning to the subsequent process in response to the operation.
    Type: Application
    Filed: August 18, 2022
    Publication date: December 22, 2022
    Inventors: Tetsuyuki MINAMIHARA, Kana OGAWA, Toshiaki KIMURA, Yoshiki KATSUMA, Yuto FUKUCHI, Ayako KOBAYASHI, Satoru ONO, Yuichi SUGIYAMA
  • Publication number: 20220212173
    Abstract: Provided are an exhaust gas purifying catalyst structure that inhibits foil elongation and improves structural durability and a production method therefor. The exhaust gas purifying catalyst structure has a metal support configured by using an mantle and a metal foil provided in the mantle and forming an exhaust gas flow path, and a catalyst layer provided on a surface forming the flow path of the metal foil, wherein the catalyst layer contains a noble metal, an OSC material containing cerium and a rare earth element other than cerium (non-Ce rare earth element), and alumina, and a content of the non-Ce rare earth element with respect to 100% by mass of the catalyst layer is 2.52% by mass or more and 4.62% by mass or less in terms of an oxide.
    Type: Application
    Filed: May 13, 2020
    Publication date: July 7, 2022
    Inventors: Toshiaki KIMURA, Koji UENO, Takeshi ENDO, Akiko IWASA, Shumpei SUZUKI, Toshiharu MORIYA, Ohki HOUSHITO, Yunosuke NAKAHARA
  • Patent number: 11208932
    Abstract: Provided is a catalyst device that can equalize the strength of a carrier in the direction of the flow of exhaust gas. According to the present invention, a flat plate and a corrugated plate have a plurality of holes. When the flat plate and the corrugated plate are in a flat state before being made into a carrier, the plurality of holes form: a plurality of first rows that run along a first direction that is parallel to the axial direction of the carrier; and a plurality of second rows that run along a second direction that is orthogonal to the first direction. As seen from the second direction, the holes in one second row and the holes in the other second row of adjacent second rows have portions that overlap each other.
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: December 28, 2021
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Kazuhisa Maeda, Hiroyuki Horimura, Toshiaki Kimura
  • Publication number: 20210310396
    Abstract: Provided is a catalyst device that can equalize the strength of a carrier in the direction of the flow of exhaust gas. According to the present invention, a flat plate (52) and a corrugated plate (54) have a plurality of holes (64). When the flat plate (52) and the corrugated plate (54) are in a flat state before being made into a carrier (42), the plurality of holes (64) form: a plurality of first rows (66) that run along a first direction (D1) that is parallel to the axial direction of the carrier (42); and a plurality of second rows (68) that run along a second direction (D2) that is orthogonal to the first direction (D1). As seen from the second direction (D2), the holes (64) in one second row (68) and the holes (64) in the other second row (68) of adjacent second rows (68) have portions (64p) that overlap each other.
    Type: Application
    Filed: August 6, 2019
    Publication date: October 7, 2021
    Inventors: Kazuhisa Maeda, Hiroyuki Horimura, Toshiaki Kimura
  • Patent number: 10022705
    Abstract: To reduce an OSC material, while maintaining necessary OSC capacity; and to improve heat resistance and reactivity of a precious metal. Proposed is an exhaust gas purifying catalyst which comprises a first catalyst layer that is formed on the surface of a substrate that is formed of a ceramic or a metal, and a second catalyst layer that is formed on the upper side of the first catalyst layer. The first catalyst layer comprises a precious metal, an OSC material and an alumina, and the OSC material and the alumina are comprised at a mass ratio of OSC material:alumina=1:7 to 1:3. The second catalyst layer comprises a precious metal, an OSC material and an alumina, and the OSC material and the alumina are comprised at a mass ratio of OSC material:alumina=1:1 to 10:0.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: July 17, 2018
    Assignees: HONDA MOTOR CO., LTD., Mitsui Mining & Smelting Co., Ltd.
    Inventors: Toshiaki Kimura, Hiroyuki Horimura, Takumi Yamaguchi, Takeshi Endo, Akihiro Iimuro, Ryoichi Oshima, Ohki Houshito, Yunosuke Nakahara
  • Patent number: 9737850
    Abstract: Provided is a novel palladium catalyst capable of efficiently purifying carbon monoxide (CO) and total hydrocarbons (THC) under a fuel-rich atmosphere even when palladium (Pd) is used as a catalyst active component. Proposed is a palladium monolayer catalyst for an exhaust gas from a saddle-riding-type vehicle, which is an exhaust gas purification catalyst for a saddle-riding-type vehicle to be installed in an exhaust gas passage in an internal combustion engine. The palladium monolayer catalyst includes a substrate, and a catalyst layer that has the form of a monolayer and contains palladium acting as a catalyst active component, an inorganic porous body acting as a catalyst carrier, ceria (CeO2) particles acting as a promoter component, and barium.
    Type: Grant
    Filed: September 12, 2012
    Date of Patent: August 22, 2017
    Assignees: Honda Motor Co., Ltd., Mitsui Mining & Smelting Co., Ltd.
    Inventors: Toshiaki Kimura, Hiroyuki Horimura, Akiko Koga, Motoki Ito, Masateru Tsuji, Takashi Wakabayashi, Yosuke Shibata, Yunosuke Nakahara, Kiyotaka Yasuda
  • Publication number: 20170232425
    Abstract: To reduce an OSC material, while maintaining necessary OSC capacity; and to improve heat resistance and reactivity of a precious metal. Proposed is an exhaust gas purifying catalyst which comprises a first catalyst layer that is formed on the surface of a substrate that is formed of a ceramic or a metal, and a second catalyst layer that is formed on the upper side of the first catalyst layer. The first catalyst layer comprises a precious metal, an OSC material and an alumina, and the OSC material and the alumina are comprised at a mass ratio of OSC material:alumina=1:7 to 1:3. The second catalyst layer comprises a precious metal, an OSC material and an alumina, and the OSC material and the alumina are comprised at a mass ratio of OSC material:alumina=1:1 to 10:0.
    Type: Application
    Filed: October 21, 2015
    Publication date: August 17, 2017
    Applicants: HONDA MOTOR CO., LTD., Mitsui Mining & Smelting Co., Ltd.
    Inventors: Toshiaki KIMURA, Hiroyuki HORIMURA, Takumi YAMAGUCHI, Takeshi ENDO, Akihiro IIMURO, Ryoichi OSHIMA, Ohki HOUSHITO, Yunosuke NAKAHARA
  • Publication number: 20150292125
    Abstract: A polyamide crimped yarn for clothing includes a multifilament satisfying conditions (1) to (3): (1) monofilament fineness is at least 1.5 dtex and up to 25 dtex, (2) total fineness is least 400 dtex and up to 1500 dtex, and (3) the monofilament has a multilobal cross section with three or more lobes and a degree of irregularity of at least 1.5 and up to 5.5.
    Type: Application
    Filed: October 21, 2013
    Publication date: October 15, 2015
    Inventors: Manabu Yoshida, Toshiaki Kimura, Yoshinobu Gamo
  • Patent number: 9120084
    Abstract: A heat-resistant protective layer having heat resistance than a catalyst layer and permeability which allows an exhaust gas to be supplied to the catalyst layer is formed on a surface of the catalyst layer.
    Type: Grant
    Filed: January 6, 2014
    Date of Patent: September 1, 2015
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Toshiaki Kimura, Hiroyuki Horimura, Takeshi Endo
  • Publication number: 20150086434
    Abstract: Provided is a novel palladium catalyst capable of efficiently purifying carbon monoxide (CO) and total hydrocarbons (THC) under a fuel-rich atmosphere even when palladium (Pd) is used as a catalyst active component. Proposed is a palladium monolayer catalyst for an exhaust gas from a saddle-riding-type vehicle, which is an exhaust gas purification catalyst for a saddle-riding-type vehicle to be installed in an exhaust gas passage in an internal combustion engine. The palladium monolayer catalyst includes a substrate, and a catalyst layer that has the form of a monolayer and contains palladium acting as a catalyst active component, an inorganic porous body acting as a catalyst carrier, ceria (CeO2) particles acting as a promoter component, and barium.
    Type: Application
    Filed: September 12, 2012
    Publication date: March 26, 2015
    Applicants: MITSUI MINING & SMELTING CO., LTD., HONDA MOTOR CO., LTD.
    Inventors: Toshiaki Kimura, Hiroyuki Horimura, Akiko Koga, Motoki Ito, Masateru Tsuji, Takashi Wakabayashi, Yosuke Shibata, Yunosuke Nakahara, Kiyotaka Yasuda
  • Publication number: 20140242406
    Abstract: A heat-resistant protective layer having heat resistance than a catalyst layer and permeability which allows an exhaust gas to be supplied to the catalyst layer is formed on a surface of the catalyst layer.
    Type: Application
    Filed: January 6, 2014
    Publication date: August 28, 2014
    Applicant: HONDA MOTOR CO., LTD.
    Inventors: Toshiaki KIMURA, Hiroyuki HORIMURA, Takeshi ENDO
  • Patent number: 8741625
    Abstract: Thermophilic microorganisms having a deodorizing ability for short chain fatty acids, which are the offensive odor components, are provided. Disclosed are thermophilic microorganisms having a deodorizing ability for short chain fatty acids, which belong to Bacillus licheniformis.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: June 3, 2014
    Assignee: Toyota Jidosha Kabushiki Kaisha
    Inventors: Nobuki Tada, Hibiki Matsushita, Toshiaki Kimura
  • Publication number: 20130236415
    Abstract: Thermophilic microorganisms having a deodorizing ability for short chain fatty acids, which are the offensive odor components, are provided. Disclosed are thermophilic microorganisms having a deodorizing ability for short chain fatty acids, which belong to Bacillus licheniformis.
    Type: Application
    Filed: November 9, 2011
    Publication date: September 12, 2013
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Nobuki Tada, Hibiki Matsushita, Toshiaki Kimura
  • Patent number: 8101688
    Abstract: Polylactic acid fibers excellent in wearing resistance and in the ability to smoothly pass through processing steps. The polylactic acid fibers contain a fatty acid bisamide and/or an alkyl-substituted fatty acid monoamide in an amount of 0.1 to 5 wt. % based on the whole fibers.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: January 24, 2012
    Assignee: TORAY Industries., Inc.
    Inventors: Toshiaki Kimura, Shuichi Nonaka, Takashi Ochi, Takaaki Mihara, Katsuhiko Mochizuki, Yuhei Maeda
  • Publication number: 20110165370
    Abstract: Polylactic acid fibers excellent in wearing resistance and in the ability to smoothly pass through processing steps. The polylactic acid fibers contain a fatty acid bisamide and/or an alkyl-substituted fatty acid monoamide in an amount of 0.1 to 5 wt. % based on the whole fibers.
    Type: Application
    Filed: January 3, 2011
    Publication date: July 7, 2011
    Inventors: Toshiaki Kimura, Shuichi Nonaka, Takashi Ochi, Takaaki Sakai, Katsuhiko Mochizuki, Yuhei Maeda
  • Patent number: 7749599
    Abstract: Disclosed is a cushioning material for a polishing pad, which hardly suffers swelling deformation caused by water because it is extremely low in water-absorbing characteristics and water-swelling characteristics. The cushioning material for a polishing pad includes a polyurethane foam capable of polishing even a semiconductor wafer having an undulated surface or a wafer having a local step that is formed during circuit forming process so that the undulation or step becomes smaller by uniformly polishing an entire surface of the wafer along the undulation or step. The cushioning material for a polishing pad is characterized by including a polyurethane foam obtained by reacting polyol and polyisocyanate with each other, the polyurethane foam having a contact angle with water of 90° or more. The polyurethane foam is preferably made by using hydrophobic polyol, and preferably has a self-skin layer formed thereon.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: July 6, 2010
    Assignee: NHK Spring Co., Ltd.
    Inventors: Hiromasa Kawaguchi, Toshiaki Kimura, Takeshi Kawakami