Abstract: A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 ?/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 ?/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 ?/sec relative to a 2.38 weight % TMAH aqueous solution.

Abstract: [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having a pKa of 2.0 to 15.7, a photo-polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, developed with an inorganic developer, and heated, so that a cured film can be obtained.

Abstract: [Object] To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that. [Means] The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.

Abstract: A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 ?/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 ?/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 ?/sec relative to a 2.38 weight % TMAH aqueous solution.

Abstract: [Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that. [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.

Abstract: A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000 ?/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100 ?/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent.

Abstract: [Object] To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that. [Means] The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.

Abstract: A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000 ?/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100 ?/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent.

Abstract: A liquid crystal element comprising a pair of transparent substrates, a liquid crystal layer which fills in between the pair of substrates and can form a chiral smectic C phase in homeotropic orientation, and an electrode which generates, at least, an electric field (parallel electric field) in directions parallel to a principal face of the substrate for the liquid crystal layer is provided, wherein the liquid crystal layer comprises, at least, a chiral compound of the following general formula (1-I) or a chiral compound of the following general formula (2-I) and a chiral compound of the following general formula (2 -II) in a base liquid crystal material which can provide a phase sequence of an isotropic liquid phase, a nematic phase, a smectic A phase and a smectic C phase from a higher temperature side, wherein R1, A2, Z1, Z2, m and 1 in formula (1-I), X, R1, R2, and * in formula (2-I), and X, R3, R4, R5, and * in formula (2-II) are defined in the specification.

Abstract: A liquid crystal element comprising a pair of transparent substrates, a liquid crystal layer which fills in between the pair of substrates and can form a chiral smectic C phase in homeotropic orientation, and an electrode which generates, at least, an electric field (parallel electric field) in directions parallel to a principal face of the substrate for the liquid crystal layer is provided, wherein the liquid crystal layer comprises, at least, a chiral compound of the following general formula (1-I) or a chiral compound of the following general formula (2-I) and a chiral compound of the following general formula (2-II) in a base liquid crystal material which can provide a phase sequence of an isotropic liquid phase, a nematic phase, a smectic A phase and a smectic C phase from a higher temperature side, wherein R1, A2, Z1, Z2, m and I in formula (1-I), X, R1, R2, and * in formula (2-I), and X, R3, R4, R5, and * in formula (2-II) are defined in the specification.

Abstract: Fluorinated five-membered ring compounds of the formula (I) R1—X—(A1—M1)a—(A2—M2)b—A3—Y—E ??(I) where E is a radical T—Z—R2 containing a five-membered ring and, for example, T is undirected and is 4-fluorothiophene-2,5-diyl, 3-fluorothiophene-2,5-diyl, 3-fluorothiophene-2,4-diyl, 5-fluorothiophene-2,4-diyl, furan-2,5-diyl, furan-2,4-diyl, isoxazole-3,5-diyl, thiazole-2,5-diyl, thiazole-2,4-diyl, cyclopentane-1,3-diyl or cyclopentene-1,3-diyl, R1 and R2 are hydrogen, X is a single bond, —O—, OC(?O)—, —C(?O)O— or —OC(?O)O—, Y is —OC(?O)—, —OCH2—, —CH2CH2—, Z is a single bond or —O—, A1, A2, A3 are each, independently of one another, phenylene-1,4-diyl, M1, M2 are undirected and are each, independently of one another, —OC(?O)—, —OCH2—, —CH2CH2—, —OC(?O)CH2CH2—, —OCH2CH2CH2—, —C?C—, —CH2CH2CH2CH2— or a single bond, a, b are each, independently of one another, 0 or 1, are used in FLC mixtures.

Abstract: The liquid-crystal switching or display device comprises a chiral smectic liquid-crystal mixture, where the ratio ?/? of the angle between the rubbing direction and the smectic layer normal to the tilt angle in the liquid-crystal mixture is at least 0.41. Preferably, the liquid-crystal mixture has the phase sequence I-N-C and the tilt angle ? at 25° C. is between 19° and 39°.

Abstract: Liquid crystal mixture comprising one or several compounds of formula (I) (I) wherein R1, R2, R3, R4, R5, R6, M1, M2, X, A, and m are defined herein.

Abstract: Liquid crystal mixture comprising compounds of formula (I) wherein R1: is H or a linear or branched alkyl group or branched alkenyl group R2: stands for a) H or F b) a linear or branched alkyl group or a linear or branched alkenyl group c) a radical wherein R3, R4, R5, R6: are an alkyl group M1, M2: represent independently from another a single bond, —OC(?O), —C(?O)O—, —OCH2—, —NH— A: is a) a linear or branched alkan-?,?-diylgroup or alkene-?,?-diyl group b) the group —C(?Y)— wherein Y is CH-Z with Z being phenylen-1,4-diyl, optionally substituted by one to three halogenatoms, alkyl or alkyloxy groups, c) the group —CHY wherein Y is CH2-Z with Z being phenylen-1,4-diyl, optionally substituted by one to three halogenatoms, alkyl or alkyloxy groups d) a group wherein p, q are 0, 1 or 2; M3 is a single bond or —OC(?O)—, —C(?O)O—, —OCH2—, —CH2O—, —C?C—, —CH2CH2—, —CH2CH2CH2CH2— the radicals are phenylen-1,4-diyl, X is H, OH, a linear or branched alkyl or alkyloxy group, m: is 0 or 1 X and M1-(A

Abstract: A lubrication system for a bearing of a machine. The system comprises an oil tank, and an oil supply pipe for supplying the lubricant oil from the oil tank to the bearing. The system further comprises an outlet pipe for guiding the lubricant oil from the bearing substantially vertically downward so that an outlet pipe oil level may be formed in the outlet pipe. The system further comprises an oil returning mother pipe for guiding the lubricant oil from the outlet pipe to the tank. The oil returning mother pipe includes a substantially horizontal part and a weir or a flow resistance disposed close to the tank so that substantially all portion of the substantially horizontal part may be maintained full of lubricant oil.

Abstract: A smectic liquid crystal mixture comprising a smectic liquid crystal base mixture and at least one dopant, which is either a complex ligand or an organic material, in a concentration of 0.01 to 5.0 weight percent.

Abstract: The active-matrix display contains a chiral smectic liquid-crystal mixture comprising at least one compound of the formula (I) R1—(A1—M1)a—(A2—M2)b—A3—X—B1—(B2)c—R2  (I). where the symbols are as defined in the description.

Abstract: Liquid crystal mixture comprising one or several compounds of formula (I) wherein R1: is H or a linear or branched alkyl group of 1 to 20 or a linear or branched alkenyl group of 2 to 20 C atoms, wherein in either case optionally one —CH2— group being replaced by cyclohexylen-1,4-diyl, or one or two —CH2— groups optionally being replaced by —O—, if non-adjacent to N, or by —C(═O)—, —Si(CH3)2—; and/or one or more H of the alkyl or alkenyl group optionally being replaced by F or CH3 R2: stands for a) H or F b.

Abstract: The monostable ferroelectric active matrix display contains a liquid crystal layer in from of a monodomain with an unambiguously defined direction of the normal z to the layer of the smC* phase and is characterized by the fact that the normal z to the layer and the preferential direction n of the nematic or cholesteric phase (N* phase) form an angle of more than 5°.

Abstract: The monostable ferroelectric active matrix display comprises a liquid-crystal layer in the form of a monodomain having an unambiguously defined direction of the layer normal z of the smC* phase, the liquid-crystal layer preferably having a chevron C-1, chevron C-2 or bookshelf geometry.