Patents by Inventor Toshiaki Shirasaka
Toshiaki Shirasaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10456731Abstract: Disclosed is a CO2 concentration reducing device for separating and removing CO2 from a gas containing CO2 with a CO2 adsorbent, the CO2 concentration reducing device including: an adsorbent container which contains the CO2 adsorbent; and a heating unit which heats the CO2 adsorbent by an induction heating or a dielectric heating. Thus, a ventilation quantity can be reduced when CO2 accumulated in a room is removed, and an electric power required for the ventilation and the electric power required for air conditioning can be reduced.Type: GrantFiled: February 24, 2016Date of Patent: October 29, 2019Assignee: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kohei Yoshikawa, Masato Kaneeda, Hidehiro Nakamura, Toshiaki Shirasaka
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Publication number: 20190062480Abstract: Disclosed is a curable resin composition that includes radical polymerizable monomers including a first monofunctional radical polymerizable monomer and a second monofunctional radical polymerizable monomer. The first monofunctional radical polymerizable monomer is a monomer that forms, when polymerized alone, a homopolymer having a glass transition temperature of 20° C. or lower. The second monofunctional radical polymerizable monomer is a monomer that forms, when polymerized alone, a homopolymer having a glass transition temperature of 50° C. or higher.Type: ApplicationFiled: August 12, 2016Publication date: February 28, 2019Inventors: Kosuke YOKOYAMA, Kazumasa TAKEUCHI, Toshiaki SHIRASAKA, Bungo OCHIAI, Kazuki CHIBA, Tomonari KIRYU
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Publication number: 20180237599Abstract: Disclosed is a curable resin composition that includes radical polymerizable monomers including a monofunctional radical polymerizable monomer, a linear or branched polymer containing a polyoxyalkylene chain, and a radical polymerization initiator.Type: ApplicationFiled: August 12, 2016Publication date: August 23, 2018Inventors: Toshiaki SHIRASAKA, Kosuke YOKOYAMA, Kazumasa TAKEUCHI, Bungo OCHIAI, Kazuki CHIBA, Tomonari KIRYU
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Publication number: 20180237549Abstract: Disclosed is a composite material including a metal material; and a protective material provided on the surface of the metal material, the protective material being a cured product of a curable resin composition. The curable resin composition includes radical polymerizable monomers including a first monofunctional radical polymerizable monomer and a second monofunctional radical polymerizable monomer. The first monofunctional radical polymerizable monomer is a monomer that forms, when polymerized alone, a homopolymer having a glass transition temperature of 20° C. or lower. The second monofunctional radical polymerizable monomer is a monomer that forms, when polymerized alone, a homopolymer having a glass transition temperature of 50° C. or higher.Type: ApplicationFiled: August 12, 2016Publication date: August 23, 2018Inventors: Kazumasa TAKEUCHI, Kosuke YOKOYAMA, Toshiaki SHIRASAKA, Bungo OCHIAI, Kazuki CHIBA, Tomonari KIRYU
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Patent number: 10035099Abstract: A CO2 removal device includes: a CO2 capturing material which captures H2O and CO2 in a gas; a reaction container which contains the CO2 capturing material; an H2O measuring unit for measuring the concentration of H2O in the gas; an H2O concentration adjustment device which adjusts the concentration of H2O on the basis of information obtained by the H2O measuring unit; a gas introduction path introducing the gas into the reaction container from the H2O concentration adjustment device and bringing the gas into contact with the CO2 capturing material; a first gas discharge path discharging the gas from the reaction container after the gas has been brought into contact with the CO2 capturing material; and a second gas discharge path discharging the gas that has been desorbed from the CO2 capturing material from the reaction container.Type: GrantFiled: July 8, 2015Date of Patent: July 31, 2018Assignee: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kouhei Yoshikawa, Masato Kaneeda, Hidehiro Nakamura, Toshiaki Shirasaka
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Publication number: 20180021717Abstract: Disclosed is a CO2 concentration reducing device for separating and removing CO2 from a gas containing CO2 with a CO2 adsorbent, the CO2 concentration reducing device including: an adsorbent container which contains the CO2 adsorbent; and a heating unit which heats the CO2 adsorbent by an induction heating or a dielectric heating. Thus, a ventilation quantity can be reduced when CO2 accumulated in a room is removed, and an electric power required for the ventilation and the electric power required for air conditioning can be reduced.Type: ApplicationFiled: February 24, 2016Publication date: January 25, 2018Applicant: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kohei YOSHIKAWA, Masato KANEEDA, Hidehiro NAKAMURA, Toshiaki SHIRASAKA
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Publication number: 20170014750Abstract: A CO2 removal device includes: a CO2 capturing material which captures H2O and CO2 in a gas; a reaction container which contains the CO2 capturing material; an H2O measuring unit for measuring the concentration of H2O in the gas; an H2O concentration adjustment device which adjusts the concentration of H2O on the basis of information obtained by the H2O measuring unit; a gas introduction path introducing the gas into the reaction container from the H2O concentration adjustment device and bringing the gas into contact with the CO2 capturing material; a first gas discharge path discharging the gas from the reaction container after the gas has been brought into contact with the CO2 capturing material; and a second gas discharge path discharging the gas that has been desorbed from the CO2 capturing material from the reaction container. The CO2 removal device allows for the reduction of energy consumption in removing CO2.Type: ApplicationFiled: July 8, 2015Publication date: January 19, 2017Applicant: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kouhei YOSHIKAWA, Masato KANEEDA, Hidehiro NAKAMURA, Toshiaki SHIRASAKA
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Publication number: 20160220943Abstract: In regenerating carbon dioxide capturing material, the amount of regeneration gas supplied to a carbon dioxide recovery column is reduced for higher energy efficiency and shortened regeneration time. A carbon dioxide recovery apparatus includes a carbon dioxide sorbing column, a heating unit, and first, second, and third channels. The carbon dioxide sorbing column contains a carbon dioxide capturing material. The heating unit heats the carbon dioxide capturing material. A carbon-dioxide-containing gas is introduced via the first channel into the carbon dioxide sorbing column. The regeneration gas is introduced via the second channel into the carbon dioxide sorbing column. A gaseous mixture containing a gas desorbed from the carbon dioxide capturing material is recovered via the third channel. The heating unit preheats the carbon dioxide capturing material, and then the regeneration gas is introduced into the carbon dioxide sorbing column to recover carbon dioxide from the carbon dioxide capturing material.Type: ApplicationFiled: October 15, 2014Publication date: August 4, 2016Applicant: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kouhei YOSHIKAWA, Masato KANEEDA, Hidehiro NAKAMURA, Toshiaki SHIRASAKA, Kenetsu KITAMURA, Kazuhiro ENOMOTO
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Publication number: 20160199808Abstract: Provided is a carbon dioxide capturing material that captures a large amount of carbon dioxide, less suffers from decrease in an amount of the captured carbon dioxide even after firing, and has excellent heat resistance. The carbon dioxide capturing material separates and recovers carbon dioxide from a carbon-dioxide-containing gas. The capturing material includes an oxide containing Ce and Al. The oxide contains Ce in a highest content among metal elements in the oxide and contains Al in a content of 0.01% by mole to 40% by mole.Type: ApplicationFiled: October 15, 2014Publication date: July 14, 2016Applicant: HITACHI CHEMICAL COMPANY, LTD.Inventors: Kouhei YOSHIKAWA, Hiroki SATOU, Masato KANEEDA, Hidehiro NAKAMURA, Toshiaki SHIRASAKA, Kenetsu KITAMURA, Kazuhiro ENOMOTO
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Patent number: 9349931Abstract: The present invention provides a resin composition including an epoxy resin monomer, a novolac resin containing a compound having a structural unit represented by the following general Formula (I), and a filler, in which a particle size distribution of the filler, measured using laser diffractometry, has peaks in the respective ranges of from 0.01 ?m to less than 1 ?m, from 1 ?m to less than 10 ?m, and from 10 ?m to 100 ?m, and the filler contains boron nitride particles having particle sizes of from 10 ?m to 100 ?m. In the general Formula (I), R1 represents an alkyl group, an aryl group, or an aralkyl group. Each of R2 and R3 independently represents a hydrogen atom, an alkyl group, aryl group, or an aralkyl group. m represents a number from 0 to 2; and n represents a number from 1 to 7.Type: GrantFiled: March 28, 2012Date of Patent: May 24, 2016Assignee: Hitachi Chemical Company, Ltd.Inventors: Tomoo Nishiyama, Atsushi Kuwano, Toshiaki Shirasaka, Naoki Hara, Kensuke Yoshihara, Hideyuki Katagi
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Publication number: 20140079913Abstract: The invention provides a multilayer resin sheet that includes: a resin composition layer that includes a thermosetting resin and a filler; and an adhesive layer that is disposed on at least one surface of the resin composition layer, the adhesive layer having an arithmetic average surface roughness Ra of 1.5 ?m or less at a surface that does not face the resin composition layer.Type: ApplicationFiled: February 24, 2012Publication date: March 20, 2014Inventors: Tomoo Nishiyama, Atsushi Kuwano, Toshiaki Shirasaka, Yasuhiko Awano
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Publication number: 20140015000Abstract: The present invention provides a resin composition including an epoxy resin monomer, a novolac resin containing a compound having a structural unit represented by the following general Formula (I), and a filler, in which a particle size distribution of the filler, measured using laser diffractometry, has peaks in the respective ranges of from 0.01 ?m to less than 1 ?m, from 1 ?m to less than 10 ?m, and from 10 ?m to 100 ?m, and the filler contains boron nitride particles having particle sizes of from 10 ?m to 100 ?m. In the general Formula (I), R1 represents an alkyl group, an aryl group, or an aralkyl group. Each of R2 and R3 independently represents a hydrogen atom, an alkyl group, aryl group, or an aralkyl group. m represents a number from 0 to 2; and n represents a number from 1 to 7.Type: ApplicationFiled: March 28, 2012Publication date: January 16, 2014Inventors: Tomoo Nishiyama, Atsushi Kuwano, Toshiaki Shirasaka, Naoki Hara, Kensuke Yoshihara, Hideyuki Katagi
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Patent number: 8309658Abstract: The adhesive composition of the invention comprises a thermoplastic resin, a radical polymerizing compound, a radical polymerization initiator and a radical polymerization regulator. According to the present invention it is possible to provide an adhesive composition, a circuit connecting material, a connection structure for a circuit member and a semiconductor device whereby curing treatment can be carried out with sufficient speed at low temperature, curing treatment can be carried out with a wide process margin, and adequately stable adhesive strength can be obtained.Type: GrantFiled: November 17, 2011Date of Patent: November 13, 2012Assignee: Hitachi Chemical Company, Ltd.Inventors: Shigeki Katogi, Houko Sutou, Hiroyuki Izawa, Toshiaki Shirasaka, Masami Yusa, Takanobu Kobayashi
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Patent number: 8138268Abstract: The adhesive composition of the invention comprises a thermoplastic resin, a radical polymerizing compound, a radical polymerization initiator and a radical polymerization regulator. According to the present invention it is possible to provide an adhesive composition, a circuit connecting material, a connection structure for a circuit member and a semiconductor device whereby curing treatment can be carried out with sufficient speed at low temperature, curing treatment can be carried out with a wide process margin, and adequately stable adhesive strength can be obtained.Type: GrantFiled: June 8, 2005Date of Patent: March 20, 2012Assignee: Hitachi Chemical Company, Ltd.Inventors: Shigeki Katogi, Houko Sutou, Hiroyuki Izawa, Toshiaki Shirasaka, Masami Yusa, Takanobu Kobayashi
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Publication number: 20120063109Abstract: The adhesive composition of the invention comprises a thermoplastic resin, a radical polymerizing compound, a radical polymerization initiator and a radical polymerization regulator. According to the present invention it is possible to provide an adhesive composition, a circuit connecting material, a connection structure for a circuit member and a semiconductor device whereby curing treatment can be carried out with sufficient speed at low temperature, curing treatment can be carried out with a wide process margin, and adequately stable adhesive strength can be obtained.Type: ApplicationFiled: November 17, 2011Publication date: March 15, 2012Inventors: Shigeki KATOGI, Houko SUTOU, Hiroyuki IZAWA, Toshiaki SHIRASAKA, Masami YUSA, Takanobu KOBAYASHI
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Publication number: 20120048606Abstract: The adhesive composition of the invention contains (a) organic fine particles comprising at least one selected from the group consisting of alkyl (meth)acrylate ester-butadiene-styrene copolymer or complexes thereof, alkyl (meth)acrylate ester-silicone copolymer or complexes thereof and silicone-(meth)acrylic acid copolymer or complexes thereof.Type: ApplicationFiled: July 29, 2008Publication date: March 1, 2012Applicant: HITACHI CHEMICAL COMPANY, LTD.Inventors: Hiroyuki Izawa, Toshiaki Shirasaka, Shigeki Katogi, Sunao Kudou, Keiko Tomizawa
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Publication number: 20110176288Abstract: The adhesive composition of the invention comprises a thermoplastic resin, a radical polymerizing compound, a radical polymerization initiator and a radical polymerization regulator. According to the present invention it is possible to provide an adhesive composition, a circuit connecting material, a connection structure for a circuit member and a semiconductor device whereby curing treatment can be carried out with sufficient speed at low temperature, curing treatment can be carried out with a wide process margin, and adequately stable adhesive strength can be obtained.Type: ApplicationFiled: June 8, 2005Publication date: July 21, 2011Applicant: HITACHI CHEMICAL COMPANY LTD.Inventors: Shigeki Katogi, Houko Sutou, Hiroyuki Izawa, Toshiaki Shirasaka, Masami Yusa, Takanobu Kobayashi