Patents by Inventor Toshiaki YATSUNAMI

Toshiaki YATSUNAMI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    Publication number: 20210200088
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, a total amount of a basic component including a compound represented by general formula (d0) and an acid-generator component is 25 to 60 parts by weight relative to 100 parts by weight of a base material component. In formula (d0), Rd0 represents a monovalent organic group; Xd0 represents —O—, —C(?O)—, —O—C(?O)—, —C(?O)—O—, —S— or —SO2—; Yd0 represents a single bond or a divalent hydrocarbon group which may have a substituent; Mm+ represents a m-valent organic cation; and m represents an integer of 1 or more Rd0-Xd0-Yd0-COO?(Mm?)1/m??(d0).
    Type: Application
    Filed: December 21, 2020
    Publication date: July 1, 2021
    Inventors: Toshiaki YATSUNAMI, Takaya MAEHASHI, Masahiro SHIOSAKI, Hiroshi GOHARA, Seiji TODOROKI, Koshi ONISHI, KhanhTin NGUYEN, Nobuhiro MICHIBAYASHI, Takuya IKEDA