Patents by Inventor Toshiaki Yokouchi

Toshiaki Yokouchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7411339
    Abstract: A manufacturing method of a liquid jet head having increased the durability and reliability thereof by preventing delamination of a vibration plate is provided. At least the following two steps are included: a vibration plate forming step which includes at least a step of forming a zirconium layer on one side of a passage-forming substrate by sputtering so that a degrees of orientation to a (002) plane of the surface becomes equal to 80% or more, as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.
    Type: Grant
    Filed: November 24, 2004
    Date of Patent: August 12, 2008
    Assignee: Seiko Epson Corporation
    Inventors: Li Xin-Shan, Hironobu Kazama, Masami Murai, Koji Sumi, Maki Ito, Toshiaki Yokouchi
  • Publication number: 20080034563
    Abstract: A manufacturing method of a liquid jet head having increased the durability and reliability thereof by preventing delamination of a vibration plate is provided. At least the following two steps are included: a vibration plate forming step which includes at least a step of forming a zirconium layer on one side of a passage-forming substrate by sputtering so that a degrees of orientation to a (002) plane of the surface becomes equal to 80% or more, as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.
    Type: Application
    Filed: July 18, 2007
    Publication date: February 14, 2008
    Applicant: Seiko Epson Corporation
    Inventors: Li Xin-Shan, Hironobu Kazama, Masami Murai, Koji Sumi, Maki Ito, Toshiaki Yokouchi
  • Patent number: 7137179
    Abstract: A method of forming a piezoelectric layer includes: a drying step for forming at least one ferroelectric precursor film on a lower electrode of a substrate and drying the ferroelectric precursor film; a degreasing step for carrying the substrate into a region facing a hot plate heated to a certain temperature and for degreasing the ferroelectric precursor film in a state where the substrate is supported by a proximity pin; and a baking step for further baking the degreased ferroelectric precursor film to form the degreased ferroelectric precursor film into a ferroelectric film. The piezoelectric layer is formed by repeating the drying, degreasing, and baking steps for the ferroelectric precursor film in a predetermined number of cycles. The degreasing step includes a step of adjusting a heating temperature of the ferroelectric precursor film by adjusting a distance between the hot plate and the substrate and by lowering a temperature of space on an opposite side of the substrate from the hot plate.
    Type: Grant
    Filed: July 2, 2004
    Date of Patent: November 21, 2006
    Assignee: Seiko Epson Corporation
    Inventors: Toshiaki Yokouchi, Koji Sumi
  • Publication number: 20050168524
    Abstract: A manufacturing method of a liquid jet head having increased the durability and reliability thereof by preventing delamination of a vibration plate is provided. At least the following two steps are included: a vibration plate forming step which includes at least a step of forming a zirconium layer on one side of a passage-forming substrate by sputtering so that a degrees of orientation to a (002) plane of the surface becomes equal to 80% or more, as well as forming an insulation film made of zirconium oxide and constituting a part of the vibration plate by subjecting the zirconium layer to thermal oxidation; and a piezoelectric element forming step of forming piezoelectric elements on the vibration plate.
    Type: Application
    Filed: November 24, 2004
    Publication date: August 4, 2005
    Inventors: Li Xin-Shan, Hironobu Kazama, Masami Murai, Koji Sumi, Maki Ito, Toshiaki Yokouchi
  • Publication number: 20050109456
    Abstract: A method of forming a piezoelectric layer includes: a drying step for forming at least one ferroelectric precursor film on a lower electrode of a substrate and drying the ferroelectric precursor film; a degreasing step for carrying the substrate into a region facing a hot plate heated to a certain temperature and for degreasing the ferroelectric precursor film in a state where the substrate is supported by a proximity pin; and a baking step for further baking the degreased ferroelectric precursor film to form the degreased ferroelectric precursor film into a ferroelectric film. The piezoelectric layer is formed by repeating the drying, degreasing, and baking steps for the ferroelectric precursor film in a predetermined number of cycles. The degreasing step includes a step of adjusting a heating temperature of the ferroelectric precursor film by adjusting a distance between the hot plate and the substrate and by lowering a temperature of space on an opposite side of the substrate from the hot plate.
    Type: Application
    Filed: July 2, 2004
    Publication date: May 26, 2005
    Applicant: Seiko Epson Corporation
    Inventors: Toshiaki Yokouchi, Koji Sumi