Patents by Inventor Toshiakira Andoh

Toshiakira Andoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High-Q inductor for high frequency
    Patent number: 6891462
    Abstract: A high-Q inductor for high frequency, having a plurality of inductor elements formed in a plurality of IC wiring layers with a connection formed therebetween. The directions of the magnetic fields generated by the respective inductor elements are substantially the same. With this construction, the section of the inductor is increased reducing the serial resistance component and an influence of a skin effect in a high-frequency range is eliminated increasing the Q value.
    Type: Grant
    Filed: September 23, 2003
    Date of Patent: May 10, 2005
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Toshiakira Andoh, Makoto Sakakura, Toshifumi Nakatani, Kouji Takinami, Yukio Hiraoka
  • High-Q inductor for high frequency
    Publication number: 20040041680
    Abstract: A high-Q inductor for high frequency, having a plurality of inductor elements formed in a plurality of IC wiring layers with a connection formed therebetween. The directions of the magnetic fields generated by the respective inductor elements are substantially the same. With this construction, the section of the inductor is increased reducing the serial resistance component and an influence of a skin effect in a high-frequency range is eliminated increasing the Q value.
    Type: Application
    Filed: September 23, 2003
    Publication date: March 4, 2004
    Inventors: Toshiakira Andoh, Makoto Sakakura, Toshifumi Nakatani, Kouji Takinami, Yukio Hiraoka
  • High-Q inductor for high frequency
    Patent number: 6664882
    Abstract: A high-Q inductor for high frequency, having a plurality of inductor elements formed in a plurality of IC wiring layers with a connection formed therebetween. The directions of the magnetic fields generated by the respective inductor elements are substantially the same. With this construction, the section of the inductor is increased reducing the serial resistance component and an influence of a skin effect in a high-frequency range is eliminated increasing the Q value.
    Type: Grant
    Filed: January 14, 2002
    Date of Patent: December 16, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Toshiakira Andoh, Makoto Sakakura, Toshifumi Nakatani, Kouji Takinami, Yukio Hiraoka
  • High-Q inductor for high frequency
    Publication number: 20020067236
    Abstract: A high-Q inductor for high frequency, having a plurality of inductor elements formed in a plurality of IC wiring layers with a connection formed therebetween. The directions of the magnetic fields generated by the respective inductor elements are substantially the same. With this construction, the section of the inductor is increased reducing the serial resistance component and an influence of a skin effect in a high-frequency range is eliminated increasing the Q value.
    Type: Application
    Filed: January 14, 2002
    Publication date: June 6, 2002
    Inventors: Toshiakira Andoh, Makoto Sakakura, Toshifumi Nakatani, Kouji Takinami, Yukio Hiraoka