Patents by Inventor Toshiba Kotani

Toshiba Kotani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Manufacturing method of semiconductor device
    Patent number: 7509623
    Abstract: A pattern correction method executed by a computer includes a first correction and a second correction. The first correction is executed by calculating a correction value, in consideration for an optical proximity effect, for edges (first edges) meeting a condition among the edges constituting a designed pattern. Subsequently, The second correction is executed for an edge (second edge) which does not meet the condition, by use of the correction value of any one of the edges (first edges) adjacent to the second edge among the first edges for which the first correction is executed, thus connecting the corrected first edge and the corrected second edge by a line segment. The pattern is corrected to a shape suitable for a mask drawing and a check with simple processing.
    Type: Grant
    Filed: May 2, 2006
    Date of Patent: March 24, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Sachiko Kobayasi, Toshiba Kotani, Satoshi Tanaka, Susumu Watanabe, Mitsuhiro Yano
  • Manufacturing Method of Semiconductor Device
    Publication number: 20060190921
    Abstract: A pattern correction method executed by a computer includes a first correction and a second correction. The first correction is executed by calculating a correction value, in consideration for an optical proximity effect, for edges (first edges) meeting a condition among the edges constituting a designed pattern. Subsequently, The second correction is executed for an edge (second edge) which does not meet the condition, by use of the correction value of any one of the edges (first edges) adjacent to the second edge among the first edges for which the first correction is executed, thus connecting the corrected first edge and the corrected second edge by a line segment. The pattern is corrected to a shape suitable for a mask drawing and a check with simple processing.
    Type: Application
    Filed: May 2, 2006
    Publication date: August 24, 2006
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Sachiko KOBAYASI, Toshiba KOTANI, Satoshi TANAKA, Susumu WATANABE, Mitsuhiro YANO