Patents by Inventor Toshifumi Tokumoto

Toshifumi Tokumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate defect inspection method and substrate defect inspection system
    Patent number: 6724005
    Abstract: When performing a defect inspection of a wafer W, defect observation equipment 3 first inputs defect position data from defect detection equipment 2. After a plurality of measurement points are set, the amount of position shift between the detection coordinate system and the observation coordinate system is measured for each measurement point. Then, the defect observation equipment 3 creates a first-order defect position correction formula in order to make reasonable the defect position in the detection coordinate system, based on the position shift amounts of the measurement points. This first-order defect position correction formula has three terms, for the offset component, the magnification component, and the rotation component of the observation coordinate system with respect to the detection coordinate system. Next, using the defect position correction formula, a defect position detected by the defect detection equipment 2 is corrected.
    Type: Grant
    Filed: October 17, 2001
    Date of Patent: April 20, 2004
    Assignee: Applied Materials, Inc.
    Inventor: Toshifumi Tokumoto
  • Substrate defect inspection method and substrate defect inspection system
    Publication number: 20020047098
    Abstract: When performing a defect inspection of a wafer W, defect observation equipment 3 first inputs defect position data from defect detection equipment 2. After a plurality of measurement points are set, the amount of position shift between the detection coordinate system and the observation coordinate system is measured for each measurement point. Then, the defect observation equipment 3 creates a first-order defect position correction formula in order to make reasonable the defect position in the detection coordinate system, based on the position shift amounts of the measurement points. This first-order defect position correction formula has three terms, for the offset component, the magnification component, and the rotation component of the observation coordinate system with respect to the detection coordinate system. Next, using the defect position correction formula, a defect position detected by the defect detection equipment 2 is corrected.
    Type: Application
    Filed: October 17, 2001
    Publication date: April 25, 2002
    Applicant: Applied Materials, Inc.
    Inventor: Toshifumi Tokumoto