Patents by Inventor Toshihara Eurakawa

Toshihara Eurakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for forming an oxynitride layer
    Patent number: 7501352
    Abstract: The present invention generally provides a method for preparing an oxynitride film on a substrate. A surface of the substrate is exposed to oxygen radicals formed by ultraviolet (UV) radiation induced dissociation of a first process gas comprising at least one molecular composition comprising oxygen to form an oxide film on the surface. The oxide film is exposed to nitrogen radicals formed by plasma induced dissociation of a second process gas comprising at least one molecular composition comprising nitrogen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits to nitridate the oxide film and form the oxynitride film.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: March 10, 2009
    Assignees: Tokyo Electron, Ltd., International Business Machines Corporation (“IBM”)
    Inventors: Masanobu Igeta, Cory Wajda, David L. O'Meara, Kristen Scheer, Toshihara Eurakawa
  • Method and system for forming an oxynitride layer
    Publication number: 20060228902
    Abstract: The present invention generally provides a method for preparing an oxynitride film on a substrate. A surface of the substrate is exposed to oxygen radicals formed by ultraviolet (UV) radiation induced dissociation of a first process gas comprising at least one molecular composition comprising oxygen to form an oxide film on the surface. The oxide film is exposed to nitrogen radicals formed by plasma induced dissociation of a second process gas comprising at least one molecular composition comprising nitrogen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits to nitridate the oxide film and form the oxynitride film.
    Type: Application
    Filed: March 30, 2005
    Publication date: October 12, 2006
    Inventors: Masanobu Igeta, Cory Wajda, David O'Meara, Kristen Scheer, Toshihara Eurakawa