Patents by Inventor Toshihara Furakawa

Toshihara Furakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently
    Patent number: 7517814
    Abstract: A method for preparing an oxynitride film on a substrate comprising forming the oxynitride film by exposing a surface of the substrate to oxygen radicals and nitrogen radicals formed by plasma induced dissociation of a process gas comprising nitrogen and oxygen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: April 14, 2009
    Assignees: Tokyo Electron, Ltd., International Business Machines Corporation
    Inventors: Cory S. Wajda, Kristen Scheer, Toshihara Furakawa
  • Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently
    Publication number: 20060228871
    Abstract: A method for preparing an oxynitride film on a substrate comprising forming the oxynitride film by exposing a surface of the substrate to oxygen radicals and nitrogen radicals formed by plasma induced dissociation of a process gas comprising nitrogen and oxygen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits.
    Type: Application
    Filed: March 30, 2005
    Publication date: October 12, 2006
    Inventors: Cory Wajda, Kristen Scheer, Toshihara Furakawa