Patents by Inventor Toshiharu Kikuchi

Toshiharu Kikuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EXHAUST COMPONENT CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS INCLUDING EXHAUST COMPONENT
    Publication number: 20240150894
    Abstract: Examples of a cleaning method includes supplying a cleaning gas into an exhaust duct that provides an exhaust flow passage of a gas supplied to an area above a susceptor, the exhaust duct having a shape surrounding the susceptor in plan view, and activating the cleaning gas to clean an inside of the exhaust duct.
    Type: Application
    Filed: January 16, 2024
    Publication date: May 9, 2024
    Inventors: Toshiharu Watarai, Hiroki Arai, Toshio Nakanishi, Yoshiyuki Kikuchi, Ryo Miyama
  • Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device
    Patent number: 9625807
    Abstract: Provided are a mask blank for which worsening of flatness has been inhibited, a transfer mask, a method of manufacturing a mask blank, a method of manufacturing a transfer mask, and a method of manufacturing a semiconductor device using this transfer mask. The mask blank is a mask blank provided with a thin film on a main surface of a glass substrate, wherein the glass substrate has a hydrogen content of less than 7.4×1018 molecules/cm3, the thin film is made of a material containing tantalum and being substantially free of hydrogen, and the thin film is formed in contact with the main surface of the glass substrate.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: April 18, 2017
    Assignee: HOYA CORPORATION
    Inventors: Hiroaki Shishido, Atsushi Kominato, Osamu Nozawa, Toshiharu Kikuchi
  • MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING MASK BLANK, METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    Publication number: 20150293441
    Abstract: Provided are a mask blank for which worsening of flatness has been inhibited, a transfer mask, a method of manufacturing a mask blank, a method of manufacturing a transfer mask, and a method of manufacturing a semiconductor device using this transfer mask. The mask blank is a mask blank provided with a thin film on a main surface of a glass substrate, wherein the glass substrate has a hydrogen content of less than 7.4×1018 molecules/cm3, the thin film is made of a material containing tantalum and being substantially free of hydrogen, and the thin film is formed in contact with the main surface of the glass substrate.
    Type: Application
    Filed: November 15, 2013
    Publication date: October 15, 2015
    Applicant: HOYA CORPORATION
    Inventors: Hiroaki Shishido, Atsushi Kominato, Osamu Nozawa, Toshiharu Kikuchi